以分子動力學模擬極紫外光微影的化學放大光阻

Abstract

這篇論文透過分子動力學 (MD) 模擬研究了用於極紫外光 (EUV) 微影技術的化學增幅光阻 (CAR) 中聚合物架構與光致產酸劑 (PAG) 分佈的行為。通過對四種不同的CAR系統進行建模（包括自由和鍵合陰離子類型），本研究探討了不同聚合物結構如何影響化學分佈的均勻性。通過對徑向分佈函數 (RDF)、數密度分佈和離子的空間分群的分析，其結果顯示鍵合陰離子能夠減少陰離子和陽離子的聚集，從而提高技術的穩定性。此外，對聚合物剛性和可動性的研究表明，較剛性的聚合物單元會限制整個系統的可動性。這些發現為優化下一代半導體製造中的CAR配方提供了重要的見解，特別是在圖形解析度的方面。

This thesis investigates the behavior of polymer architecture and PAG distribution in CARs for EUV photolithography through MD simulations. By modeling four distinct CAR systems, including free and bonded-anion types, this study explores how different polymer structures influence the uniformity of chemical distribution. Through the analysis of RDFs, number density distributions, and ion clustering behavior, the results show that bonded anions reduce aggregation in both anions and cations, enhancing material stability. Additionally, studies of polymer rigidity and mobility reveal that more rigid polymer units limit the mobility of overall system. These findings offer critical insights into the optimization of CAR formulations for next-generation semiconductor manufacturing, especially in feature resolution and pattern fidelity.