奈米壓印之印器與壓印

Abstract

奈米壓印(Nanoimprint lithography, NIL)是一種低成本且具有高生產力的非傳統微影技術。奈米印器（即母模）之製造上，將採用電子束微影技術及電感式耦合電漿乾蝕刻的製程進行，製造出高深寬比之母模結構。壓印設備系統上，將採用熱壓印技術，進行奈米結構之圖形轉移。

The project is aimed at developing the mold fabrication and the imprinting recipe for nano-imprint (NIL). For fabrication of a nano-imprinting mold, the electron beam lithography and ICP(Inductively Coupled Plasma) dry etching will be mainly employed to structure the mold of high aspect ratio. As for the nano-imprinting process, the hot-embossing will be employed, and the molds will be tested to form the nanopatterns, and then replicate the pattern to the polymer on the substrate.