應用具有電漿子效應之金屬奈米結構於極紫外光光源系統開發

Abstract

我們藉由二維時域有限差分法模擬倒Ω結構與閃電結構的表面電漿性質，並透過改變其共振腔體長度，尋找其局域電漿電場強度最強的參數後，經由微機電製程及電子束微影技術進行製造，將其應用至產生極紫外光光源系統之研究。此外，我們也針對極紫外光光源產生的高階諧波產生法進行討論，並且在超快光學與物理光學的基礎上建立規畫整個實驗架構，以及判斷整個實驗系統可能產生之結果，並預測極紫外光光源產生之強度。

In this decade, extreme ultraviolet (EUV) light source is wildly discussed for the next generation lithographic light source. In order to develop the tabletop EUV light source system, we study the 2D surface plasmonic polaritons by applying the commercial software finite-difference time domain (FDTD). Though the process of varying the nanostructure cavity length, the best resonance parameter is found. So that the strongest localized surface plasmonic (LSP) field enhancement nanostructure will be applied to the extreme ultraviolet (EUV) experimental system. The plasmonic metallic nanostructure will be fabricated by nano-electro-mechanical system (NEMS) and E-beam lithography. We also discuss the high order harmonic generation (HHG) to radiate EUV light source, and build the experimental structure based on the physical optics. Therefore, we can estimate the results of EUV experimental setup and predict the EUV intensity in advance.