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完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 林招松(Chao-Sung Lin) | |
dc.contributor.author | Chih-Wei Chien | en |
dc.contributor.author | 簡志瑋 | zh_TW |
dc.date.accessioned | 2021-06-15T04:54:40Z | - |
dc.date.available | 2011-07-30 | |
dc.date.copyright | 2010-07-30 | |
dc.date.issued | 2010 | |
dc.date.submitted | 2010-07-29 | |
dc.identifier.citation | Reference
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dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/46122 | - |
dc.description.abstract | 三價鉻電鍍製程是具有前瞻性的替代六價鉻方案之一。本研究為解析硫化物對三價鉻電鍍行為的影響,藉由添加幾種型式的硫化物於三價鉻電鍍液中進行電鍍,以釐清硫化物於電鍍行為中所扮演的角色。利用光學顯微鏡、掃描式電子顯微鏡觀察鍍層表面之形貌,再利用X光繞射分析儀、穿透式電子顯微鏡和X射線光電子能譜儀解析鍍層的結晶性和元素分佈;為了進一步探討電鍍行為的影響以及鍍層的抗蝕性質,使用電化學極化分析以及交流阻抗法進行研究,最後根據實驗結果的比較跟統整,解析硫化物對三價鉻電鍍行為,以及鍍層微結構、結晶性和抗蝕性的影響。
實驗結果顯示,硫化物的添加會導致鍍層表面形貌的改變,並且併入些許的硫,而抑制了錯合劑中碳的大量共鍍,進而改善了鍍層的結晶性。由於從原先較具脆性的非晶質轉變成結晶性鍍層,使得鍍層的內應力下降,裂紋數明顯減少,進一步改善了鍍層的抗蝕性。因此,藉由控制鍍液中的硫化物濃度,可以調整三價鉻鍍層組成元素、結晶形貌、內應力以及抗腐蝕的能力。 | zh_TW |
dc.description.abstract | The electrodeposition process of trivalent chromium is one of the promising replacements of hexavalent chromium electrodeposition. In this study, some organic or inorganic sulfides have been added to the trivalent chromium solution to study how the sulfides in the solution affect the microstructure and properties of the deposits, as characterized by SEM, XRD, TEM, EDS, XPS, respectively. Furthermore, owing to analyzing the sulfide influences to corrosion resistance and reduction mechanism of trivalent chromium system, polarization curve and EIS measurement were further applied.
The experimental results reveal that the sulfide addition changes the morphology and co-deposits S in the deposits. Furthermore, the C co-deposition from the complexant is inhibited; therefore, the crystallinity of deposits changes apparently. Owing to the transformation from amorphous to crystalline, the internal stress and cracks of the deposits decrease. Therefore, the corrosion resistance is highly improved. By controlling the concentration of sulfide in the solution, the composition, crystallinity, internal stress, and corrosion resistance of the deposits can be modified. | en |
dc.description.provenance | Made available in DSpace on 2021-06-15T04:54:40Z (GMT). No. of bitstreams: 1 ntu-99-R97527022-1.pdf: 7312079 bytes, checksum: ce272f847d0d5914743fc97b6cfaf39e (MD5) Previous issue date: 2010 | en |
dc.description.tableofcontents | Contents
誌謝 i Abstract ii 摘要 iii Figure Caption vii Table Caption xi Chapter 1 Introduction 1 1.1 About Chromium Electrodeposition 1 1.2 Need of Research Theme 2 Chapter 2 Literature Review 3 2.1 Electrochemical Deposition Theory 3 2.2 Faraday’s Theory and Current Efficiency 6 2.3 Absorption Theory 7 2.4 Trivalent Chromium Electrodeposition System 8 2.5 Properties of Chromium Deposits 12 2.6 Challenges of Trivalent Chromium Electrodeposition 12 2.7 Mechanisms of Additives Actions 14 2.8 Effects of sulfide addition in the trivalent chromium system 19 2.9 EIS (Electrochemical Impedance Spectroscopy) Analysis 20 Chapter 3 Materials and Methods 27 3.1 Experimental Design 27 3.2 Experimental Processes 28 3.2.1 Electrolyte of the trivalent chromium 28 3.2.2 Electrodeposition Cell 29 3.2.3 Specimen Preparation 30 3.2.4 Electrodeposition Process 30 3.3 Specimen Analysis 31 3.3.1 Calculation of thickness and current efficiency 31 3.3.2 Optical Microscope Observation 32 3.3.3 Scanning Electron Microscope Characterization 33 3.3.4 Transmission Electron Microscope Characterization 33 3.3.5 X-ray Diffraction 33 3.3.6 EDS and ESCA Analysis 34 3.3.7 Contact Angle Measurement 34 3.3.8 Internal Stress Measurement 35 3.3.9 Polarization Curve Measurement 37 3.3.10 EIS (Electrochemical Impedance Spectroscopy) Analysis 38 Chapter 4 Results 39 4.1 Trivalent Chromium System (non-sulfide) vs. Traditional Hexavalent Chromium System 39 4.1.1 OM Observation 39 4.1.2 SEM Observation of Surface Morphology 40 4.1.3 Crystallinity Analysis of Deposits 41 4.1.4 Cross-Sectional Observation 42 4.1.5 XPS Analysis 45 4.1.6 Polarization Curve Measurement 47 4.1.7 EIS Analysis 48 4.2 Thiosalicylic Acid Addition System 51 4.2.1 Calculation of the Current Efficiency 51 4.2.2 OM Observation of Surface Morphology 53 4.2.3 SEM Observation of the Surface Morphology 55 4.2.4 Crystallinity Analysis of the Deposits 56 4.2.5 Cross-Sectional Observation of the Deposits 57 4.2.6 Composition of the Deposits 59 4.2.7 Contact Angle Measurement 61 4.2.8 Internal Stress Measurement 62 4.2.9 Polarization Curve Measurement 63 4.2.10 EIS Analysis 64 4.3 Sodium Sulfide Addition System 66 4.3.1 Current Efficiency 66 4.3.2 OM Observation of Surface Morphology 67 4.3.3 SEM Observation of the Surface Morphology 69 4.3.4 Crystallinity Analysis of Deposits 70 4.3.5 Cross-Sectional Observation of the Deposits 70 4.3.6 Composition of the Deposits 72 4.3.7 Contact Angle Measurement 74 4.3.8 Internal Stress Measurement 74 4.3.9 Polarization Curve Measurement 75 4.3.10 EIS Analysis 77 4.4 Other Sulfide Addition System 79 4.4.1 Current Efficiency 79 4.4.2 OM Observation of Surface Morphology 80 4.4.3 SEM Observation of Surface Morphology 87 4.4.4 Crystallinity Analysis of Deposits 91 4.4.5 Composition of the Deposits 95 4.4.6 Polarization Curve Measurement 98 4.4.7 EIS Analysis 102 Chapter 5 Discussion 108 5.1 Surface Morphologies of Chromium Deposits 108 5.2 The Influence on the Current Efficiency 109 5.3 Crystallinity of the Chromium Deposits 110 5.4 Cross-sectional Observation of the Deposits 111 5.5 Element Distribution of the Deposits 112 5.6 Electrochemical Analyses 116 5.7 Mechanisms of Sulfur Co-deposition 117 Chapter 6 Conclusions 124 Chapter 7 Future Work 126 Reference 127 | |
dc.language.iso | en | |
dc.title | 硫化物對三價鉻電鍍行為的影響 | zh_TW |
dc.title | Effect of Sulfur Compound on Trivalent Chromium Electrodeposition Behavior | en |
dc.type | Thesis | |
dc.date.schoolyear | 98-2 | |
dc.description.degree | 碩士 | |
dc.contributor.oralexamcommittee | 葛明德(Ming-Der Ger),林景崎(Jing-Chie Lin),楊聰仁(Tsong-Jen Yang),黃清安(Ching-An Huang) | |
dc.subject.keyword | 三價鉻電鍍,硫化物,結晶性,EIS, | zh_TW |
dc.subject.keyword | Trivalent Chromium Electrodeposition,Sulfide,Crystallinity,EIS, | en |
dc.relation.page | 133 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2010-07-30 | |
dc.contributor.author-college | 工學院 | zh_TW |
dc.contributor.author-dept | 材料科學與工程學研究所 | zh_TW |
顯示於系所單位: | 材料科學與工程學系 |
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