利用奈米顆粒球微影術及反應性離子蝕刻技術製作大面積金孔洞陣列與其光學性質之研究

Abstract

我們提供一個簡單的方法，即利用奈米球微影術與反應性離子蝕刻術來製作大面積金屬孔洞陣列，目前大面積的金孔洞陣列已經成功地製作出來，而且其面積可達1 cm2，這是至目前為止可以利用類似的技術來製作出面積最大的金孔洞陣列結構。由實驗我們已經證明週期金孔洞陣列在紅外光波段有等效的電漿頻率存在，這個現象與Pendry的理論預測可以說是非常吻合的，亦即金屬細線的網狀結構可用來調控電將頻率的位置。除此之外，我們也發現了在遠紅外光波段，光的穿透率會增強，這其中的機制乃是由於金屬的表面電漿子與入射光之間的作用有關，這一連串有關大面積孔洞金屬陣列之光學性質的發現對於光電元件的應用可說是非常的重要。

We present here a very simple technique to produce a large area gold nanohole array with the combination of nanosphere lithography and reactive ion etching. A large domain size of gold nanohole arrays up to about 1 cm2 has been successfully fabricated, which represents the largest reported area using the similar techniques. We show that the fabricated Au hole arrays have effective plasma frequencies at infrared region, which confirms the Pendry’s prediction that metallic wire structures can be used to tune the plasma frequency. In addition, we also found that the optical transmission through periodic structures can be enhanced according to the interaction of surface plasmon and the incident light. The novel properties found here for a large-area of periodic array should be important for the application of optoelectronic devices.