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標題: | 創新型微透鏡陣列製作應用於投影式微影技術開發之研究 A Novel Fabrication Method of Microlens Array with Aperture Stop for Projection Photolithography |
作者: | Meng-Sheng Wu 吳孟昇 |
指導教授: | 楊申語 |
關鍵字: | 微透鏡陣列,投影式微影,氣體熱壓,類LIGA,軟模,紫外光固化, microlens array,projection photolithography,hot embossing,LIGA-like,PDMS soft mold,UV curing, |
出版年 : | 2006 |
學位: | 碩士 |
摘要: | 微透鏡微影技術(Microlens Lithography)是非接觸的投影式微影技術,主要是以微透鏡陣列元件做為投影透鏡,在光阻薄膜上製作出大面積陣列式微結構圖形,可製作平面顯示器、彩色濾光片及微機械元件。此技術需在微透鏡陣列元件之非透鏡部分擋光,傳統作法是以對位曝光及電鍍處理,不僅需要精密的對位設備,且製程耗時、成本高昂。
本研究以創新方法來製作微透鏡陣列,利用具微圓孔陣列的不銹鋼片當作母模,將透明塑膠薄膜與微圓孔陣列母模堆疊放置入密閉腔體中,在加溫至塑膠的玻璃轉換溫度以上後,通入適當高壓氮氣於腔體中。軟化的塑膠薄膜受氣壓而填入圓孔模穴中,並因表面張力形成半球狀的微透鏡,待材料與模具冷卻後,即可得到微透鏡元件在圓孔母模上,是具備擋光效果之微透鏡陣列元件,其表面粗糙度(Ra)可達6.601nm。此外,不同曲率及焦距的微透鏡,可調整熱壓溫度、氣體壓力與加壓時間來得到,本創新製程具快速與成本低廉之優點。 本研究接著以此具擋光效果微透鏡陣列做為投影透鏡,搭配光學擴散膜、菲涅爾透鏡與厘米等級的單一圖形光罩,建構出微透鏡陣列投影式微影光學系統。厘米光罩是使用一般雷射印表機配合繪圖軟體製作而成,透過微透鏡陣列投影曝光與顯影製程後,成功地在光阻層上製作出微米等級的圖形陣列。並可藉由改變光罩幾何尺寸、微透鏡焦距、微透鏡陣列與光罩及光阻間之距離來控制圖形線寬大小。 另外微透鏡微影技術可配合矽膠(PDMS)造模與紫外光快速固化成型機制,大量複製微結構元件。利用此光學投影系統製作出陣列式微結構母模,接著以PDMS進行精密翻鑄,採用PDMS軟模當作模具,執行後續複製量產。在複製量產微成型技術方面,本研究使用紫外光固化光阻,以氣體熱壓及紫外光快速固化來進行低溫低壓複製,結果與原始母模比對,發現微結構完整被複製,初步證明瞭整套系統可行性,相較於傳統LIGA技術,大幅縮短製程時間及設備成本,具備極大的微成型量產複製發展潛力。 Microlens lithography is a contactless lithographic method that uses a smart mask which consists of an array of spherical microlens to project the pattern on transparent mask onto a photo-resist layer. The array of microstructures can be fabricated in a single exposure step. This technique provides a simple route for the large area, parallel fabrication of microstructures. However, the fabrication of polymer microlens array with aperture stops involves alignment and electroplating processes. They are complicated, time consuming and require expensive facilities. In this study, we report an innovative method for fabrication of plastic microlens arrays with aperture stops. By using gas pressure, thermoplastic film is pressed onto the stainless steel, which has micro-holes array. The polymer material is partially filled into the circular holes, and forms hemispherical surface due to surface tension. After cooling, a plastic microlens array with stainless steel shadow mask can be obtained. The aperture stops of microlens array can be directly fabricated without complicated alignment and electroplating processes. With the fabrication plastic microlens array with aperture stop, a microlens lithography facility has been designed, constructed and tested. Arrays of microstructure has been successfully fabricated. The feature sizes of microstructures produced by this method can be changed by adjusting the size, shape of the lenses, the figure size of the mask, and the image distance between the lens array and photo-resist. In addition, the array of microstructures produced by this method can be transferred to other materials using PDMS casting, electroforming and micro-molding. We believe this type of technology will be useful for the fabrication of optoelectronics and bio-devices that consist of repetitive microstructures. |
URI: | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/33831 |
全文授權: | 有償授權 |
顯示於系所單位: | 機械工程學系 |
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