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完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 楊申語 | |
dc.contributor.author | Meng-Sheng Wu | en |
dc.contributor.author | 吳孟昇 | zh_TW |
dc.date.accessioned | 2021-06-13T05:47:01Z | - |
dc.date.issued | 2006 | |
dc.date.submitted | 2006-07-10 | |
dc.identifier.citation | C.-Y. Chang, S.-Y. Yang, L.-S. Huang, J.-H. Chang,“Fabrication of plastic microlens array using gas-assisted micro-hot-embossing with a silicon mold”, Infrared Physics and Technology, Vol.48, Issue 2, pp.163-173 (2006).
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Whitesides,“Connectivity of features in microlens array reduction photolithography: Generation of various patterns with single photomask”, J. AM. CHEM. SOC., Vol. 124, pp.7288-7289 (2002). H. Wu, T. W. Odom, G. M. Whitesides,“Reduction photolithography using microlens arrays: Applications in gray scale photolithography”, Anal. Chem., Vol. 74, pp.3267-3273 (2002). Henry I. Smith,“A proposal for maskless, zone-plate-array nanolithography”, J. Vac. Sci. Technol., B 14(6), pp.4318-4322 (1996). J. A. Rogers, K. E. Paul., R. J. Jackman, and G. M. Whitesides,“Generating ~90nm features using near-field contact-mode photolithography with an elastomeric phase mask”, J. Vac. Sci. Technol., B 16(1), pp.59-68 (1997). J.-H. Chang, S.-Y. Yang,“Gas pressurized hot embossing for transcription of micro-feartures”, Microsystem Technologies, Vol. 10, No. 1, pp.76-80 (2003). L.-W. Pan, L. Lin and J. Ni,“Cylindrical plastic lens array fabricated by a micro intrusion process”, IEEE Micro Electro Mechanical Systems (MEMS), pp.217-221 (1999). M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson,“Step and flash imprint lithography : A new approach to high-resolution patterning”, Proc. SPIE 3676(I): 379 (1999). M. D. Austin, H. Ge, W. Wu, M. Li, Z. Yu, D. Wasserman, S. A. Lyon, and S. Y. Chou,“Fabrication of 5nm linewidth and 14nm pitch features by nanoimprint lithography”, Applied Physical Letters, Vol. 84, No. 26, pp.5299-5301 (2004). M.-H. Wu, K. E. Paul, and G. M. Whitesides,“Patterning flooding illumination with microlens arrays”, Applied Optics, Vol. 41, No. 13, pp. 2575-2585 (2002). M.-H. Wu and G. M. Whitesides,“Fabrication of arrays of two-dimensional micropatterns using microspheres as lenses for projection photolithography”, Applied Physical Letters, Vol. 78, No. 16, pp.2273-2278 (2002). M.-H. Wu and G. M. Whitesides,“Fabrication of two-dimensional arrays of microlenses and their applications in photolithography”, Journal of Micromechanics and Microengineering, Vol. 12, pp.747-758 (2002). M.-H. Wu and G. M. Whitesides,“Fabrication of diffractive and micro-optical elements using microlens projection lithography”, Advanced Materials, Vol. 14, No. 20, pp.1502-1506 (2002). M. He, X.-C. Yuan, N. Q. Ngo, J. Bu, and V. Kudryashov,“Simple reflow technique for fabrication of a microlens array in solgel glass”, Optics Letters, Vol. 28, No. 9, pp.731-733 (2003). M. L. Schattenburg, C. Chen, P. N. Everett, J. Ferrera, P. Konkola, and Henry I. Smith,“Sub-100nm metrology using interferometrically produced fiducials”, J. Vac. Sci. Technol., B 17(6), pp.2692-2697 (1999). M. D. Levenson, N. S. Viswanathan, R. A. Simpson,“Improving resolution in Photolithography with a phase-shifting mask”, IEEE Trans. Electron Devices, ED-29, No. 12, pp.1828-1836 (1982). P. Nussbaum, R. Volkel, H. P. Herzing, M. Eisner, and S. Haselbeck,“Design, fabrication and testing of microlens arrays for sensors and microsystem”, Pure and Applied Optics, Vol. 6, No. 6, pp.617-636 (1997). R. Volkel, H. P. Herzig, Ph. Nussbaum, W. Singer, R. Dandliker, W. B. Hugle,“Microlens lithography: A new approach for large display fabrication”, Microelectronic Engineering, Vol. 30, pp.107-110 (1996). S. Y. Chou, P. R. Krauss, and P. J. Renstrom,“Nanoimprint lithography”, J. Vac. Sci. Technol., B 14(6), pp.4129-4133 (1996). S. Y. Chou, C. Keimel, and J. Gu,“Ultrafast and direct imprint of nanostructures in silicon”, Nature, Vol. 417, pp. 835-837 (2002). S. Owa and H. Nagasaka,“Advantage and feasibility of immersion lithography”, Journal of Microlithography, Microfabrication and Microsystem, Vol. 3, No. 1, pp.97-103 (2004). T. Hesjedal and W. Seidel,“Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers”, Nanotechnology, Vol. 14, No. 1, pp.91-94 (2003). T.-K. Shin, J.-R. Ho, and J.-W. Chang,“A new approach to polymeric microlens array fabrication using soft replica molding”, IEEE Photonics TechnologyLletters, Vol. 16, No. 9, pp.2078-2080 (2004). Y.-Q. Fu, N. Kok, and A. Bryan,“Microfabrication of microlens array by focused ion beam technology”, Microelectronic Engineering, Vol. 54, pp.211-221 (2000). Y. Xia, and G. M. Whitesides,“Soft lithography”, Angew. Chem. Int. Ed., Vol. 37, pp.550-575 (1998). 莊達仁, VLSI製造技術, 高立圖書有限公司 (1995). 龍文安, 半導體微影技術, 五南圖書有限公司 (2004). 趙啟仲,“軟模氣體熱壓應用於大面積微奈米壓印製程研究”, 臺灣大學碩士論文, 民國93年6月 張致遠, “創新型微奈米軟模轉印技術之研發與應用”, 臺灣大學博士論文, 民國95年6月 | |
dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/33831 | - |
dc.description.abstract | 微透鏡微影技術(Microlens Lithography)是非接觸的投影式微影技術,主要是以微透鏡陣列元件做為投影透鏡,在光阻薄膜上製作出大面積陣列式微結構圖形,可製作平面顯示器、彩色濾光片及微機械元件。此技術需在微透鏡陣列元件之非透鏡部分擋光,傳統作法是以對位曝光及電鍍處理,不僅需要精密的對位設備,且製程耗時、成本高昂。
本研究以創新方法來製作微透鏡陣列,利用具微圓孔陣列的不銹鋼片當作母模,將透明塑膠薄膜與微圓孔陣列母模堆疊放置入密閉腔體中,在加溫至塑膠的玻璃轉換溫度以上後,通入適當高壓氮氣於腔體中。軟化的塑膠薄膜受氣壓而填入圓孔模穴中,並因表面張力形成半球狀的微透鏡,待材料與模具冷卻後,即可得到微透鏡元件在圓孔母模上,是具備擋光效果之微透鏡陣列元件,其表面粗糙度(Ra)可達6.601nm。此外,不同曲率及焦距的微透鏡,可調整熱壓溫度、氣體壓力與加壓時間來得到,本創新製程具快速與成本低廉之優點。 本研究接著以此具擋光效果微透鏡陣列做為投影透鏡,搭配光學擴散膜、菲涅爾透鏡與厘米等級的單一圖形光罩,建構出微透鏡陣列投影式微影光學系統。厘米光罩是使用一般雷射印表機配合繪圖軟體製作而成,透過微透鏡陣列投影曝光與顯影製程後,成功地在光阻層上製作出微米等級的圖形陣列。並可藉由改變光罩幾何尺寸、微透鏡焦距、微透鏡陣列與光罩及光阻間之距離來控制圖形線寬大小。 另外微透鏡微影技術可配合矽膠(PDMS)造模與紫外光快速固化成型機制,大量複製微結構元件。利用此光學投影系統製作出陣列式微結構母模,接著以PDMS進行精密翻鑄,採用PDMS軟模當作模具,執行後續複製量產。在複製量產微成型技術方面,本研究使用紫外光固化光阻,以氣體熱壓及紫外光快速固化來進行低溫低壓複製,結果與原始母模比對,發現微結構完整被複製,初步證明瞭整套系統可行性,相較於傳統LIGA技術,大幅縮短製程時間及設備成本,具備極大的微成型量產複製發展潛力。 | zh_TW |
dc.description.abstract | Microlens lithography is a contactless lithographic method that uses a smart mask which consists of an array of spherical microlens to project the pattern on transparent mask onto a photo-resist layer. The array of microstructures can be fabricated in a single exposure step. This technique provides a simple route for the large area, parallel fabrication of microstructures. However, the fabrication of polymer microlens array with aperture stops involves alignment and electroplating processes. They are complicated, time consuming and require expensive facilities.
In this study, we report an innovative method for fabrication of plastic microlens arrays with aperture stops. By using gas pressure, thermoplastic film is pressed onto the stainless steel, which has micro-holes array. The polymer material is partially filled into the circular holes, and forms hemispherical surface due to surface tension. After cooling, a plastic microlens array with stainless steel shadow mask can be obtained. The aperture stops of microlens array can be directly fabricated without complicated alignment and electroplating processes. With the fabrication plastic microlens array with aperture stop, a microlens lithography facility has been designed, constructed and tested. Arrays of microstructure has been successfully fabricated. The feature sizes of microstructures produced by this method can be changed by adjusting the size, shape of the lenses, the figure size of the mask, and the image distance between the lens array and photo-resist. In addition, the array of microstructures produced by this method can be transferred to other materials using PDMS casting, electroforming and micro-molding. We believe this type of technology will be useful for the fabrication of optoelectronics and bio-devices that consist of repetitive microstructures. | en |
dc.description.provenance | Made available in DSpace on 2021-06-13T05:47:01Z (GMT). No. of bitstreams: 1 ntu-95-R93522712-1.pdf: 4443291 bytes, checksum: c472646c5b43cfa0ccfe5c8bd15bd8e1 (MD5) Previous issue date: 2006 | en |
dc.description.tableofcontents | 誌 謝 I
中文摘要 II 英文摘要 III 目 錄 IV 表 目 錄 VII 圖 目 錄 VIII 第一章 導論 1.1 前言 .............................................1 1.2 微影技術.........................................1 1.3 微透鏡陣列投影式微影技術.........................3 1.4 微透鏡陣列元件製作...............................5 1.5 研究動機與目的...................................6 1.6 論文內容架構.....................................6 第二章 文獻回顧 2.1 微影技術文獻回顧................................16 2.2 微透鏡陣列投影式微影技術文獻回顧................19 2.3 文獻總結........................................20 第三章 實驗設置與規劃 3.1 母模製作........................................29 3.2 實驗材料........................................29 3.2.1 微透鏡陣列材料................................29 3.2.2 光阻劑性質....................................30 3.3 實驗設備與步驟..................................30 3.3.1 微透鏡陣列熱壓設備及製程步驟..................30 3.3.2 投影式微影設備及製程步驟......................32 3.4 檢測設備........................................34 3.4.1 表面輪廓量測設備..............................34 3.4.2 微透鏡焦距量測系統架設........................35 3.5 實驗流程規劃....................................35 第四章 微透鏡陣列投影式微影實驗 4.1 新型擋光微透鏡陣列製作..........................49 4.2 氣體熱壓製程參數對微透鏡陣列成型影響............50 4.2.1 氣體壓力對微透鏡陣列成型探討..................50 4.2.2 熱壓溫度對微透鏡陣列成型探討..................50 4.2.3 加壓時間對微透鏡陣列成型探討..................51 4.2.4 氣體熱壓製程參數對微透鏡成型影響結論..........51 4.3 微透鏡焦距對微影結果探討........................52 4.3.1 氣體壓力對微透鏡焦距之影響及微影結果..........53 4.3.2 熱壓溫度對微透鏡焦距之影響及微影結果..........53 4.3.3 加壓時間對微透鏡焦距之影響及微影結果..........53 4.3.4 氣體熱壓製程參數對微透鏡焦距影響結論..........54 4.4 微透鏡陣列投影式微影結果........................54 4.5 微透鏡陣列投影式微影製程參數探討................55 4.5.1 不同幾何尺寸光罩之影響........................55 4.5.2 微透鏡陣列與光罩距離之影響....................56 4.5.3 微透鏡焦距之影響..............................56 4.5.3.1 由氣體壓力產生不同焦距......................56 4.5.3.2 由微透鏡直徑產生不同焦距....................57 4.5.4 微透鏡陣列與光阻間隙之影響....................57 4.5.5 不同微透鏡直徑與不同幾何尺寸光罩交叉比對探討..58 4.5.6 微透鏡陣列投影式微影結論......................58 4.6 本章結論........................................59 第五章 微透鏡陣列投影式微影技術製程應用 5.1 微結構模具製作..................................79 5.2 PDMS快速翻模轉印................................79 5.3 微結構複製成型技術..............................81 5.3.1 氣體熱壓微成型................................81 5.3.2 紫外光快速固化微成型..........................81 5.4 本章結論........................................82 第六章 結論與未來研究方向 6.1 結論............................................85 6.2 未來研究方向....................................86 參考文獻.............................................87 | |
dc.language.iso | zh-TW | |
dc.title | 創新型微透鏡陣列製作應用於投影式微影技術開發之研究 | zh_TW |
dc.title | A Novel Fabrication Method of Microlens Array with Aperture Stop for Projection Photolithography | en |
dc.type | Thesis | |
dc.date.schoolyear | 94-2 | |
dc.description.degree | 碩士 | |
dc.contributor.oralexamcommittee | 王倫,楊啟榮 | |
dc.subject.keyword | 微透鏡陣列,投影式微影,氣體熱壓,類LIGA,軟模,紫外光固化, | zh_TW |
dc.subject.keyword | microlens array,projection photolithography,hot embossing,LIGA-like,PDMS soft mold,UV curing, | en |
dc.relation.page | 90 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2006-07-12 | |
dc.contributor.author-college | 工學院 | zh_TW |
dc.contributor.author-dept | 機械工程學研究所 | zh_TW |
顯示於系所單位: | 機械工程學系 |
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