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標題: | 微影成像模擬使用同調與部份同調光源 Microlithography Imaging Simulation with Coherent and Partially Coherent Light Sources |
作者: | Shih-Yung Chung 鍾士勇 |
指導教授: | 陳中平(Charlie Chung Ping Chen) |
關鍵字: | 微影成像,部份同調光源, microlithography simulation,partially coherent, |
出版年 : | 2006 |
學位: | 碩士 |
摘要: | 現今半導體製程中,微影是極為重要的一環。當製程低於90奈米時,為因應光學鄰近效應而修改光罩是必然的步驟,而成像模擬可利用電腦的快速運算來達到快速修正光罩的效用,故此論文著重於利用冪級數展開或是函數展開方式把光學成像公式實作於電腦程式上。 At the present days, the key and critical part of industrial IC manufacture is the optical lithography technology which can duplicate the design patterns at the mask onto wafer by light exposure.The most direct and accurate simulation is the imaging of patterns on wafer. Accurate imaging simulation can show exposed and unexposed regions after photolithography by computer. We propose an analytical solution for Hopkins formula that we don't need to transfer the mask patterns into frequency domain or convolve them with the kernels. Actually, we can directly compute the image intensity of each single pixel by using integration of power series or polynomials of the kernals. |
URI: | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/32480 |
全文授權: | 有償授權 |
顯示於系所單位: | 電子工程學研究所 |
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