請用此 Handle URI 來引用此文件:
http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/32480
完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 陳中平(Charlie Chung Ping Chen) | |
dc.contributor.author | Shih-Yung Chung | en |
dc.contributor.author | 鍾士勇 | zh_TW |
dc.date.accessioned | 2021-06-13T03:51:54Z | - |
dc.date.available | 2007-07-27 | |
dc.date.copyright | 2006-07-27 | |
dc.date.issued | 2006 | |
dc.date.submitted | 2006-07-26 | |
dc.identifier.citation | [1] J. W. Goodman, Introduction to Fourier Optics, 2nd ed. McGraw Hill, 1996,
pp.63-90. [2] E. Wolf, “Coherent-mode propagation in spatially band-limited wave fields,” Optical Society of America, 1986. [3] Y. C. Pati, A. A. Hhazanfarian, and R. F. Pease, “Exploiting structure in dast aerial image computation for integrated circuit patterns,” IEEE, 1997. [4] N. B. Cobb, “Fast optical and process proximity correction algorithms for integrated circuit manufacturing,” the University of Berkeley, 1998. [5] E. Wolf, “New theory of partial coherence in the space-frequency domain. part i and part ii,” Optical Society of America. [6] Y. C. Pati and T. Kailath, “Phase-shifting masks for microlithography : automated design and mask requirements,” Optical Society of America, 1994. [7] N. Cobb and A. Zakhor, “Fast, low-complexity mask design,” Internaitonal Society for Optical Engineering. [8] H. H. Hopkins, “On the diffraction theory of optical images,” Proc. Roy. Soc. A, 1952. [9] B. J. Lin, “The k3 coefficient in nonparaxial lambda/na scaling equations for resolution, depth of focus, and immersion lithography,” Internaitonal Society for Optical Engineering, 2002. [10] ——, “Microlithography theory andpractice,” Lectures in NTU, 2006. [11] A. K. Wong, Resolution Enhancement Technique in Optical Lithography. SPIE Press, 2001, pp.14-16. [12] L. F. Thompson, C. G.Willson, and M. J. Bowden, Introduction to Microlighography, 2nd ed. American Chemical Society, Washington, DC, 1994, pp.22-30. [13] B. J. Lin, “Phase-shifting masks gain an edge,” Circuits and Devices, 1993. [14] W. J. Smith, Modern Optical Engineering, 3rd ed. McGraw Hill, 2000, pp.33-36. [15] M. Born and E. Wolf, Principle of Optics, 7th ed. Press Syndicate of The University of Cambridge, 2005, pp.543-547. [16] ——, Principle of Optics, 7th ed. Press Syndicate of The University of Cambridge, 2005. [17] J. W. Goodman, Introduction to Fourier Optics, 2nd ed. McGraw Hill, 1996, pp.9-22. [18] ——, Introduction to Fourier Optics, 2nd ed. McGraw Hill, 1996, pp.13-16. [19] M. Abramowitz and I. A. Stegun, Handbook of Mathematical Functions with Formulas, Graphs, and Mathematical Tables. Washington, 1967. [20] M. Born and E. Wolf, Principle of Optics, 7th ed. Press Syndicate of The University of Cambridge, 2005, pp.554-557. [21] ——, Principle of Optics, 7th ed. Press Syndicate of The University of Cambridge, 2005, pp.599-606. | |
dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/32480 | - |
dc.description.abstract | 現今半導體製程中,微影是極為重要的一環。當製程低於90奈米時,為因應光學鄰近效應而修改光罩是必然的步驟,而成像模擬可利用電腦的快速運算來達到快速修正光罩的效用,故此論文著重於利用冪級數展開或是函數展開方式把光學成像公式實作於電腦程式上。 | zh_TW |
dc.description.abstract | At the present days, the key and critical part of industrial IC manufacture is
the optical lithography technology which can duplicate the design patterns at the mask onto wafer by light exposure.The most direct and accurate simulation is the imaging of patterns on wafer. Accurate imaging simulation can show exposed and unexposed regions after photolithography by computer. We propose an analytical solution for Hopkins formula that we don't need to transfer the mask patterns into frequency domain or convolve them with the kernels. Actually, we can directly compute the image intensity of each single pixel by using integration of power series or polynomials of the kernals. | en |
dc.description.provenance | Made available in DSpace on 2021-06-13T03:51:54Z (GMT). No. of bitstreams: 1 ntu-95-R93943071-1.pdf: 1555914 bytes, checksum: 4f2c7f9be0cd9eed22dcd05effb93117 (MD5) Previous issue date: 2006 | en |
dc.description.tableofcontents | 1 Introduction . . . . . . . . . . . . . . . .1
1.1 Motivation . . . . . . . . . . . . . . . .1 1.2 Optical lithography . . .. . . . . . . . .3 1.2.1 Principle . . . . . . .. . . . . . . . .3 1.2.2 Photoresist . . . . . . . . .. . . . . .5 1.2.3 Types of Photolithography . .. . . . . .6 1.3 Resolution Enhancement Technique . . . . .7 1.4 Goal . . . . . . . . . . . . . . . . .. . 8 2 Coherent Imaging Simulation . . . . . . . . 9 2.1 Coherence . . . . . . . . . . . . . . . 9 2.1.1 Temporal Coherence . . . . . . .. . . . 10 2.1.2 Spatial coherence . . . . . . . . . . . 10 2.2 Coherent Illumination . . . . . . . . . . 10 2.2.1 Image Equation . . . . . . . . . . . . 11 2.2.2 Convolution Form. . . . . . . . . . . . 11 2.2.3 Transmission Function . . . . . . . . . 13 2.2.4 Imaging Formula in Spectral Domain . . 15 2.3 Previous work . . . . . . . . . . . . . . 15 2.3.1 Direct Convolution . . . .. . . . . . . 16 2.3.2 Fourier TransformApplied . . . . . . . 16 2.4 Analytical Formof Solution . . .. . . . . 17 2.4.1 Mask Decomposition . . . . . . . . . . 17 2.4.2 Change of Variable . . . . . .. . . . . 19 2.4.3 Rectangular Pupil and Imaging Equation .20 2.4.4 Circular Pupil and Imaging Equation . . 23 2.5 Simulation Flow . . . . . . . . . . . . . 26 3 Partially Coherent Imaging . . . . . . . . 29 3.1 Introduction . . . .. . . . . . . . . . . 29 3.1.1 Real Source . . . . . . . . . . . . . . 30 3.1.2 Quasi-monochromatic Source . . . . . . 30 3.1.3 Partial Coherence . . . . . . . . . . . 31 3.2 Imaging with Partial Coherence . . . . . 31 3.2.1 Imaging Equation . . .. . . . . . . . . 32 3.2.2 Imaging Formula in Spectral Domain . . 33 3.2.3 Mutual Intensity Specification . . . . 34 3.3 Analytical Formof Solution . . .. . . . . 35 3.3.1 Preparations . . .. . . . . . . . . . . 35 3.3.2 Change of Variables . . . . . . . . . . 36 3.3.3 Power Series Applied . . . . . . . . . 37 3.3.4 Taylor Expansion Applied . . . . . .. . 39 3.3.5 Simulation Flow. . . . . . . . . . . . 42 3.4 GoingWork (Curve FittingMethod) . . . . . 43 4 Simulation Result . . . . . . . . . . . . . 44 4.1 Coherent Simulation . . . . . . . . . . . 44 4.1.1 Imaging of Different processes . . .. . 45 4.1.2 Test Cases . . . . .. . . . . . . . . . 46 4.1.3 Timing Comparison . . . . . . . . . . 46 4.2 Partially Coherent Simulation . . . . . . 47 5 Conclusion . . . . . . . . . . . . . . . . .55 | |
dc.language.iso | en | |
dc.title | 微影成像模擬使用同調與部份同調光源 | zh_TW |
dc.title | Microlithography Imaging Simulation with Coherent and Partially Coherent Light Sources | en |
dc.type | Thesis | |
dc.date.schoolyear | 94-2 | |
dc.description.degree | 碩士 | |
dc.contributor.oralexamcommittee | 吳瑞北(Ruey-Beei Wu),張宏鈞(Hung-Chun Chang),林本堅(Burn-Jeng Lin) | |
dc.subject.keyword | 微影成像,部份同調光源, | zh_TW |
dc.subject.keyword | microlithography simulation,partially coherent, | en |
dc.relation.page | 57 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2006-07-26 | |
dc.contributor.author-college | 電機資訊學院 | zh_TW |
dc.contributor.author-dept | 電子工程學研究所 | zh_TW |
顯示於系所單位: | 電子工程學研究所 |
文件中的檔案:
檔案 | 大小 | 格式 | |
---|---|---|---|
ntu-95-1.pdf 目前未授權公開取用 | 1.52 MB | Adobe PDF |
系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。