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Title: | 獨領風騷、突破極限—半導體微影設備廠商的經營發展策略分析:以 ASML 為例 The Corporate Strategy Analysis of Semiconductor Lithography Equipment Industry: A Case Study of ASML |
Authors: | 鄭荃心 Chuan-Hsin Cheng |
Advisor: | 陳忠仁 Chung-Jen Chen |
Co-Advisor: | 陳玠甫 Jei-Fuu Chen |
Keyword: | ASML,EUV,DUV,五力分析,BCG矩陣, ASML,EUV,DUV,Five Force Analysis,BCG Matrix, |
Publication Year : | 2024 |
Degree: | 碩士 |
Abstract: | ASML是一家全球領先的半導體微影設備公司,總部位於荷蘭。成立於1984年,為飛利浦和ASMI共同成立的公司,專注於半導體微影光刻技術。其業務主要分為EUV 光刻系統、DUV光刻系統和其他運算式微影等服務。因ASML為全球唯一擁有EUV 光刻技術的廠商,因此堪稱半導體微影設備行業的領頭羊。本研究以個案分析的方式,先由產業分析了解ASML所屬產業之產業概況、技術趨勢、競爭者,並藉由五力分析評估產業吸引力及辨識產業關鍵指標,以定義競爭態勢。接著,探討ASML如何利用其優勢建立競爭優勢與護城河,並利用BCG 矩陣定義ASML的產品事業組合,分析其成長與競爭策略。最後,總結ASML的發展情況及優劣勢,提出未來在經營發展策略上的研究建議。根據本研究之研究結果,ASML最大的競爭優勢在於其組成的策略聯盟所帶來強大的技術優勢,不但對於下游市場的需求有精準的掌握,也聯合上游廠商、客戶、學校、及政府研究單位強化自身研發動能。此外,ASML也強調提供客戶完整的微影全方位解決方案,不只銷售硬體,對於測試服務、運算式微影、重組機台等服務亦十分完備,鞏固其強大的競爭優勢。而本研究對ASML之研究建議為以下三點,一、積極推動 High-NA EUV量產以鞏固EUV光刻領域強勢地位;二、確保DUV光刻機市場訂單的穩定度;三、將測試服務和軟體服務進行單獨銷售,在變動快速的半導體產業中站穩腳步,展望未來。 ASML is a global leader in semiconductor lithography equipment, headquartered in the Netherlands. Founded in 1984 as a joint venture between Philips and ASMI, it focuses on semiconductor lithography technology. Its business primarily includes EUV lithography systems, DUV lithography systems, and other computational lithography services. ASML is notable as the only manufacturer with EUV lithography technology, making it a frontrunner in the semiconductor lithography equipment industry. This study employs a case analysis approach. It begins with an industry analysis to understand the overview, technological trends, and competitors of the industry in which ASML operates. Using Porter’s Five Forces analysis, the study evaluates the attractiveness of the industry and identifies key industry metrics to define the competitive landscape. Next, it explores how ASML leverages its strengths to establish competitive advantages and moats. The study also uses the BCG matrix to define ASML's product and business portfolio, analyzing its growth and competitive strategies. Finally, the study summarizes ASML's development, strengths, and weaknesses, and offers suggestions for future business development strategies. According to the research findings, ASML's greatest competitive advantage lies in the strategic alliances it forms, which bring significant technological benefits. Not only does it have a precise understanding of downstream market demand, but it also collaborates with upstream manufacturers, customers, academic institutions, and government research units to strengthen its R&D capabilities. Additionally, ASML emphasizes providing customers with comprehensive lithography solutions, not just selling hardware. Its services in testing, computational lithography, and equipment refurbishment are also well-developed, solidifying its strong competitive edge. This study offers three suggestions for ASML: 1) Actively enable the mass production of High-NA EUV to consolidate its dominant position in the EUV lithography field; 2) Ensure the stability of DUV lithography system orders; 3) Independently market testing and software services to maintain a stable footing in the rapidly changing semiconductor industry. |
URI: | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/92042 |
DOI: | 10.6342/NTU202400513 |
Fulltext Rights: | 同意授權(限校園內公開) |
Appears in Collections: | 商學研究所 |
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ntu-112-1.pdf Access limited in NTU ip range | 10.28 MB | Adobe PDF | View/Open |
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