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  1. NTU Theses and Dissertations Repository
  2. 電機資訊學院
  3. 光電工程學研究所
Please use this identifier to cite or link to this item: http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/77266
Title: 使用雷射雕刻製作高分子分散型液晶多段式同心圓固體光圈
Multiple-Step Diaphragm of Concentric Apertures Fabricated with the Polymer-Dispersed Liquid Crystal (PDLC) and by Laser Engraving
Authors: 李偉傑
Wei-Chieh Lee
Advisor: 蔡睿哲
Keyword: 固體微型光圈,高分子分散型液晶,液晶,雷射雕刻,氧化銦錫,
solid-state aperture,polymer dispersed liquid crystal (PDLC),liquid crystal,laser engraving,indium tin oxide,
Publication Year : 2019
Degree: 碩士
Abstract: 隨著過去十年含有相機的手持式裝置快速發展,光圈越來越重要,其中也因為全球有許多團隊在研究光圈,像是微機電刀刃式光圈、光流體式光圈,不過就是沒有PDLC相關的研究,所以本團隊提出了一個PDLC為主的多段式同心圓固體光圈。本研究中的元件利用兩片鍍有ITO的玻璃,中間夾了一個PDLC薄膜,其中有一片ITO玻璃經過雷射雕刻加工,雷射雕刻圖案設計上有三個獨立電極,好讓本元件在調變上可以有三個階段性的模式,其工作原理利用施加電壓在上下兩電極之間,好讓PDLC內部液晶轉向,使光軸折射率匹配,達到光圈開關的效果。元件製作方面,本論文首先利用不同雷射參數實際地雕刻在玻璃上,接下來利用形狀量測儀量測雕刻的深度及寬度,再來選擇要使用的雷射參數,第二部分探討PDLC不同比例和厚度對於電壓和穿透率的影響,最後在經過組裝以及封裝即完成元件製作。而在本論文中最後則使用了此光圈,將其應用於實體商業鏡頭驗證本研究設計之元件。
With rapid development of mobile devices with a camera, the aperture in the camera becomes more important. Therefore, this work proposes multiple-step diaphragm of concentric apertures with the polymer-dispersed liquid crystal (PDLC) and by laser engraving. The device consists of two electrodes made of ITO glass between which is filled with PDLC. In our design, one of the glass was patterned with electrode structures comprising concentric apertures by a CO2 laser engraving system.
The fabrication process starts with an empty PDLC cell formed with 5- -thick spacers and two ITO glass substrates, and there is concentric apertures pattern on one of the substrates. Afterwards, we drop the PDLC mixture into the cell gap and wait for the PDLC to completely fill the cell. After the cell is thoroughly filled, the PDLC was cured by UV illumination. Finally, the device is packaged with a 3D-printing shell.
In the end, the device is embedded into the modified camera lenses to verify the performance.
URI: http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/77266
DOI: 10.6342/NTU201903277
Fulltext Rights: 未授權
Appears in Collections:光電工程學研究所

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