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  1. NTU Theses and Dissertations Repository
  2. 電機資訊學院
  3. 光電工程學研究所
Please use this identifier to cite or link to this item: http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/76946
Title: 使用黑色遮罩優化高分子分散型液晶固體光圈之取像
Optimization of the Images Obtained Through a PDLC-Based Tunable Aperture by a Masking Technique
Authors: Po-Ying Chou
周柏穎
Advisor: 蔡睿哲(Jui-Che Tsai)
Keyword: 高分子分散型液晶,微型固體光圈,氧化銦錫,3D列印,雷射雕刻,遮罩技術,
Polymer-Dispersed Liquid Crystal (PDLC),Tunable Aperture,Indium Tin Oxide (ITO),3D Printing,Masking technique,Laser engraving,
Publication Year : 2020
Degree: 碩士
Abstract: 本研究提出一個簡易、低成本且不須套用程式後處理的方式,來優化高分子分散型液晶固體光圈之成像。高分子分散型液晶(Polymer-Dispersed Liquid Crystal, PDLC)可以透過施加電壓來控制液晶分子的偏轉,和傳統機械式光圈相比,不須外加馬達控制縮放,因此有更好的微型化潛力。
在元件設計中,光圈結構是以雷射調刻出電極的氧化銦錫(Indium Tin Oxide, ITO)導電玻璃作為外層,中間填入液晶E7與高分子聚合物NOA65混合成的PDLC薄膜,最後紫外光曝光固化,形成一個可分成三階段調變的固體光圈。
光圈元件固化完成後,在未加電壓時呈現乳白色,由於遮光效果不盡理想,造成拍攝成像有霧狀模糊問題,因此再以3D列印輔助製作黑色遮罩,遮蔽除了拍攝物體方向以外的環境光線,以此優化拍攝成像,解決霧狀模糊缺點,並以程式分析量化優化幅度。

In this thesis, we use a simple solution to optimize a PDLC-Based Tunable Aperture without post processing. Polymer-Dispersed Liquid Crystal (PDLC) is able to deflect by applied voltage. Comparing traditional mechanical aperture, PDLC aperture needs no motor to drive and has more potential to miniaturize.
In the design, the outer layer of the aperture is made by two pieces of Indium Tin Oxide (ITO) conductive glass, one of them is patterned with electrode structures by laser engraving technique. Between two ITO glasses is filled with PDLC which is mixed by E7 liquid crystal and NOA65. Last step is exposing it with UV light to solidify PDLC. A 3-step tunable solid aperture is fabricated.
After all, the aperture is milky white without applied voltage, so it’s shading effect is not ideal, which makes picture foggy. To solve this problem, we made a black mask by 3D-printing technique. Cover light except from subject to optimize the imaging. Then test optimization range by program.
URI: http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/76946
DOI: 10.6342/NTU202002452
Fulltext Rights: 未授權
Appears in Collections:光電工程學研究所

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