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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 李佳翰(Jia-Han Li) | |
| dc.contributor.author | Li-Hsuan Chung | en |
| dc.contributor.author | 鍾溧媗 | zh_TW |
| dc.date.accessioned | 2021-07-10T21:41:05Z | - |
| dc.date.available | 2021-07-10T21:41:05Z | - |
| dc.date.copyright | 2020-08-14 | |
| dc.date.issued | 2020 | |
| dc.date.submitted | 2020-08-06 | |
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| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/76940 | - |
| dc.description.abstract | 在0.1μm的精準度之下，使用紅外光直接對準法所進行奈米級的光學檢測，光學系統可以通過條紋的放大特性直接檢測到莫瑞條紋。以直線型光柵分析x方向的偏移量、繞 z 軸的偏轉角，以方形中心對稱光柵分析 x、y 方向的偏移量，使用低通濾波器及快速傅立葉變換的方法來分析圖像的頻域項。在測量兩條紋的峰值的位置後，計算出兩個晶圓之間的偏移誤差量。 建構同調散射顯微鏡在 EUV 光罩檢測系統及雙軸平台的研發，以光點500μm之下量測到訊號光源及缺陷的繞射圖形，提供日後快速與高解析光罩之缺陷檢測。 | zh_TW |
| dc.description.abstract | Under the accurate alignment of 0.1μm, The optical system is used to infrared light directly alignment method which can be used for nano-level detection. The optical system can directly detect the Moiré fringes through the amplification characteristics of the fringes. Linear grating is for analyzing deviation of x and z. The square center symmetric grating is for analyzing deviation of x and y. We apply a low-pass filter to take out the high-frequency terms with using approach of fast Fourier transform to analyze the frequency terms of the gray value. After measuring the positions of peaks and valleys, we can calculate the practical displacement of two wafers. The construction of a coherent scattering microscope was developed in the EUV mask inspection system and dual-axis platform. The diffraction pattern of the signal light source and the defect were measured under a light spot of 500μm, providing rapid and high-resolution mask defect detection in the future. The construction of a coherent scattering microscope was developed in the EUV mask inspection system and dual-axis platform. The diffraction pattern of the signal light source and the defect were measured under a light spot of 500μm, providing rapid and high-resolution mask defect detection in the future. | en |
| dc.description.provenance | Made available in DSpace on 2021-07-10T21:41:05Z (GMT). No. of bitstreams: 1 U0001-0508202015195700.pdf: 6483603 bytes, checksum: 8241d7c2b72a10f56963ffd01b124370 (MD5) Previous issue date: 2020 | en |
| dc.description.tableofcontents | 致謝----------------------------------------I 摘要----------------------------------------II ABSTRACT-----------------------------------III 目錄----------------------------------------IV 圖目錄--------------------------------------VI 表目錄--------------------------------------X 第一章 緒論----------------------------------1 1.1研究背景----------------------------------1 1.2文獻回顧----------------------------------5 1.3研究目的----------------------------------11 第二章 基礎理論-------------------------------12 2.1光學繞射波理論-----------------------------12 1.基本原理-----------------------------------12 2.頻譜條紋-----------------------------------15 3.偏移所造成的相位差---------------------------16 4.傾斜所造成的條紋偏轉-------------------------17 5.光柵自成像效應------------------------------18 第三章 架構系統-------------------------------22 3.1光學系統架構-------------------------------22 3.2光學元件表---------------------------------24 1.光源系統-----------------------------------24 2.物鏡及感測器評估 ----------------------------24 3.平台控制系統軟體 ----------------------------26 4.訊號擷取及分析系統---------------------------27 3.3光柵週期評估-------------------------------29 1.繞射效應-----------------------------------30 2.最低要解析到0.1μm---------------------------30 3.繞射極限下的週期數---------------------------31 4.光柵大小的限制-------------------------------31 5.CCD的條紋數擷取-----------------------------31 6.Talbot自成像-------------------------------32 第四章 模擬結果與討論--------------------------34 4.1 x方向的偏移量-----------------------------35 4.2 兩平行光柵繞Z軸偏轉------------------------46 第五章 極紫外光光罩缺陷系統---------------------51 5.1文獻回顧----------------------------------51 5.2同調性散射式顯微鏡--------------------------53 5.3繞射光學理論-------------------------------56 5.4多層膜反射率與折射率理論---------------------57 第六章 控制軟體與其影像結果---------------------62 6.1.位移平台及控制器設備-----------------------62 6.2.傳輸協定---------------------------------63 6.3.控制平台之程式架構-------------------------65 1.程式架構-----------------------------------65 2.程式流程-----------------------------------66 6.4模擬與實驗結果-----------------------------69 1.實驗結果-----------------------------------69 2.缺陷繞射模擬結果-----------------------------72 第七章 結論與未來展望---------------------------73 7.1 結論-------------------------------------73 7.2 未來展望----------------------------------74 參考資料--------------------------------------76 | |
| dc.language.iso | zh-TW | |
| dc.title | 100nm精密對位之莫瑞條紋分析及13.5nm極紫外光光罩缺陷檢測 | zh_TW |
| dc.title | Accurate alignment of Moiré fringe within 100 nm and photomask defect detection by 13.5 nm extreme ultraviolet | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 108-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 蔡坤諭(Kuen-Yu Tsai),李坤彥(Kung-Yen Lee),李昭德(Chao-Te Lee),林俊宏(Chun-Hung Lin) | |
| dc.subject.keyword | 莫瑞條紋,晶圓對位,傅立葉轉換,訊號處理,極紫外光光罩,同調繞射影像術,同調性散射顯微鏡, | zh_TW |
| dc.subject.keyword | Moiré fringe,Wafer alignment,Fourier transform,Signal process,Extreme ultraviolet(EUV) mask,Coherent scattering microscopy, | en |
| dc.relation.page | 79 | |
| dc.identifier.doi | 10.6342/NTU202002471 | |
| dc.rights.note | 未授權 | |
| dc.date.accepted | 2020-08-06 | |
| dc.contributor.author-college | 工學院 | zh_TW |
| dc.contributor.author-dept | 工程科學及海洋工程學研究所 | zh_TW |
| 顯示於系所單位： | 工程科學及海洋工程學系 | |
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