請用此 Handle URI 來引用此文件：
http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/64208完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 周傳心 | |
| dc.contributor.author | Chia-Ming Chen | en |
| dc.contributor.author | 陳嘉明 | zh_TW |
| dc.date.accessioned | 2021-06-16T17:34:54Z | - |
| dc.date.available | 2015-08-19 | |
| dc.date.copyright | 2012-08-19 | |
| dc.date.issued | 2012 | |
| dc.date.submitted | 2012-08-15 | |
| dc.identifier.citation | 1. Klass Hjort, Greger Thornell, Reimar Spohr, and Jan-A ke Schweitz, “Heavy ion induced etch anisotropy in single crystalline quartz”, Proc. IEEE, MENS Workshop, San Diego, pp.267-271, 1996
2. Greger Thornell, Klass Hjort, Bruno Studer, and Jan-A ke Schweitz, “Anisotropy- Independent Through Micromachining of Quartz Resonators by Ion Track Etching”, IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control, Vol. 44, No.4, pp.829-838, 1997 3. Greger Thornell, Hakan Rapp, and Klas Hjort, “X-cut Miniature Tuning Forks Realized by Ion Track Lithography”, IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control, Vol. 47, No.1 , pp.8-15, January , 2000 4. Christer Hedlund, Ulf Lindberg, Urban Bucht, and Jan Soderkvist, “Anisotropic etching of Z-cut quartz”, J. Micromech. Microeng. Vol. 3, pp.65-73, 1993 5. Sungkyu LEE, “Photolithography and Selective Eetching of an Aarray of Quartz Tuning fork Resonators with Improved Impact Resistance Characteristics”, The Japan Society of Applied Physics, Vol. 40, Part. 1, No.8, pp.5164-5167, 2001 6. Sungkyu LEE, “Photolithography and Selective Etching of an Array of Surface Mount Device 32.768kHz Quartz Tuning fork Resonators: Definition of Side-Wall Electrodes and Interconnections Using Stencil Mask”, The Japan Society of Applied Physics, Vol. 40, Part. 1, No.9A, pp.5480-5484, 2001 7. Sungkyu LEE, “Frbrication of an Array of Surface Mount Device 32.768kHz Quartz Tuning Fork-Type Crystal: Photolithography and Selective Eetching of an Aarray of Quartz Tuning fork Resonators with Subsequent Photoresist Spray coating”, Elsevier, Vacuum, Vol. 65, pp.161-168, 2002 8. R. M. Langdon, “Resonator Sensors- a review”, J. Phys. E: Sci. Instrum. , Vol. 18, pp.103-115, 1985 9. E. D. Reedy, JR., W. J. Kass, “Finite-element Analysis of a Quartz Digital Accelerometer,” IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control, Vol.37, No. 5, pp.464-474, 1990 10. Albert Killen, David Tarrant, David Jensen, “High acceleration, high performance solid state accelerometer development,’’ IEEE AES Systems Magazine, pp.20-25, 1994 11. John W. Anthony, Richard A. Bideaux, Kenneth W. Bladh, and Monte C. Nichols, “Handbook of Mineralogy” Mineral Data Publishing,2001 12. Christer Hedlund, Ulf Lindberg, Urban Bucht, Jan Soderkvist, “Anisotropic etching of Z-cut quartz,” J. Micromech. Microeng 3, pp.65-73, 1993 13. Charles Kittel, Introduction to Solid State Physics, 8th ed., Wiley, 2005 14. “IEEE Standard on Piezoelectricity,” Institute of Electrical and Electronics Engineers, Inc,1987 15. 張沛霖等, “壓電材料與器件物理,” 山東科學技術出版社 16. 述本正美, 廖詩文, “高頻通訊用晶體振盪器的技術及發展,” 電子與材料雜誌, 第13期, pp.126-131, 2002 17. 張簡文添，「單晶體濕式蝕刻理論」，國立台灣大學博士論文，2000 18. 黃柏勳，「單晶石英加速規自然頻率之有限元素法分析」，國立台灣大學應用力學所碩士論文，2009 19. 葉幸芳，「石英單晶蝕刻行為研究與振盪器設計」，國立台灣大學應用力學 所碩士論文，2010 20. 翁璟豪，「石英音叉振盪器研製」，國立台灣大學應用力學所碩士論文，2011 | |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/64208 | - |
| dc.description.abstract | 本文所探討的是以微機電製程在Z-cut低溫石英晶圓(α-Quartz)製作石英振盪器，並設計石英振盪器所需的光罩尺寸，以及電極層的陰影光罩，再利用微機電製程在石英振盪器上鍍上電極，並測量頻率，最後再討論如何改良製程以及減少可能發生的問題。 | zh_TW |
| dc.description.abstract | The purpose of this thesis is to study Z-cut α-Quartz by using MEMS process technology to finish the quartz oscillator. We can design the size of mask for quartz oscillator and the shadow mask for electrode layer. We use MEMS process technology to evaporate metal on quartz oscillator ,and we test the frequency. Finally ,we will discuss how to improve our processes and reduce the problems which may be occur. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-16T17:34:54Z (GMT). No. of bitstreams: 1 ntu-101-R99543040-1.pdf: 5499868 bytes, checksum: 3e51d82931dc9351ee3667d2d30f6b71 (MD5) Previous issue date: 2012 | en |
| dc.description.tableofcontents | 口試委員審定書………………………………………………………………………i
致謝………………………………………………………………………………… ii 摘要………………………………………………………………………………… iii ABSTRACT…………………………………………………………………………iv 目錄…………………………………………………………………………………… v 圖目錄……………………………………………………………………………vii 表目錄……………………………………………………………………………ix 第壹章、導論 1 1.1前言 1 1.2文獻回顧 2 1.3石英加速規原理 6 1.4本文目的與章節概要 8 第貳章、石英材料特性 9 2.1 石英基本性質 9 2.2 石英晶體種類與特性 10 2.3 石英晶體切角 12 第參章、石英振盪器製程步驟 14 3.1 石英振盪器製程概要 14 3.2 石英振盪器外型製作 15 3.3 石英振盪器驅動電極製作 19 3.3.1正反面電極層製作 19 3.3.2側向電極層製作 21 第肆章、石英振盪器實驗結果 26 4.1石英振盪器本體 26 4.2 石英振盪器電極層阻擋罩 31 4.3於石英振盪器本體蒸鍍電極層 39 第伍章、問題與討論 44 第陸章、結論與未來展望 49 參考文獻…………………………………………………………………………… 50 附錄A 實驗材料及儀器……………………………………………………………52 附錄B 實驗參數(石英振盪器本體)………………………………………………53 附錄C 實驗參數(電極阻擋罩)……………………………………………………54 附錄D 實驗光罩圖…………………………………………………………………55 附錄E 石英振盪器尺寸圖…………………………………………………………57 附錄F 石英振盪器正反電極尺寸圖………………………………………………58 附錄G 石英振盪器側向電極尺寸圖………………………………………………59 作者簡歷……………………………………………………………………………60 | |
| dc.language.iso | zh-TW | |
| dc.subject | 蝕刻速率 | zh_TW |
| dc.subject | 低溫石英 | zh_TW |
| dc.subject | 石英振盪器 | zh_TW |
| dc.subject | α-quartz | en |
| dc.subject | etch rates | en |
| dc.subject | quartz oscillator | en |
| dc.title | 雙端固定石英振盪器研製 | zh_TW |
| dc.title | Study on the Fabrication of Double-ended Quartz Resonator | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 100-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.coadvisor | 張簡文添 | |
| dc.contributor.oralexamcommittee | 張家歐,謝發華 | |
| dc.subject.keyword | 低溫石英,蝕刻速率,石英振盪器, | zh_TW |
| dc.subject.keyword | α-quartz,etch rates,quartz oscillator, | en |
| dc.relation.page | 60 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2012-08-15 | |
| dc.contributor.author-college | 工學院 | zh_TW |
| dc.contributor.author-dept | 應用力學研究所 | zh_TW |
| 顯示於系所單位： | 應用力學研究所 | |
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