在玻璃基板與矽基板上應用噴墨方式製造之SU-8微透鏡陣列

Abstract

本論文介紹兩種以噴墨方式製作之SU-8光阻之微透鏡的方法，這兩種方法皆證明了其製作可調控之接觸角之微透鏡的可行性。方法一使用蔽蔭遮罩和紫外線�臭氧機進行SU-8基層表面的改質，使之變為親水性，在已改質(親水)區域和未改質(疏水)區域之間形成了親水性的差異，這提供了侷限的效應，這同時也定義了微透鏡在基層上的位置。皮升大小的稀釋SU-8光阻液滴以噴墨方式滴在已改質的親水區域上來製作微透鏡陣列。方法二以矽基板作為基板，此矽基板不經過任何氧化物蝕刻，因為原生氧化層提供了良好的親水性。接著旋轉塗佈一層約5.8微米厚的SU-8光阻來定義他的疏水區域，也因為它的厚度也同時提供了邊界侷限效應，接者滴SU-8光阻液滴在親水區域上。方法二比方法一能達到的微透鏡之接觸角更高。兩種方法皆提供了簡單、符合成本效益、且無蝕刻轉換的微透鏡製程。

In this thesis, two methods of fabricating inkjet-printed SU-8 photoresist microlens arrays using hydrophilic confinement are introduced. Both methods have proved the feasibility of microlens array fabrication with controllable contact angles. Method 1 used UV/ozone treatment using a film of 10-μm-thick SU-8 shadow mask to modify SU-8 photoresist base layer surface (which is on glass substrate) making it become hydrophilic. Therefore, a hydrophilicity difference between treated (hydrophilic) and non-treated (hydrophobic) zones formed, which provides confinement effect. Picoliter sized diluted SU-8 photoresist drops were ink-jetted onto treated zones with different diameters to fabricate microlens arrays using a piezoelectric print head. Method 2 used silicon base layer without oxide etching because of good hydrophilicity of native oxide. A layer of SU-8 photoresist was spin-coated to form hydrophobic areas on the silicon base layer, also providing a boundary-confined effect due to its 5.8 μm thickness. Then SU-8 photoresist drops were also ink-jetted onto hydrophilic zones to form microlens array. Method 2 reached larger maximum contact angle than Method 1. Both methods provide simple, cost-effective fabrication process without need for etch transfer.