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http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/63180完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 蘇國棟 | |
| dc.contributor.author | Wei-Chih Chen | en |
| dc.contributor.author | 陳威志 | zh_TW |
| dc.date.accessioned | 2021-06-16T16:26:41Z | - |
| dc.date.available | 2018-02-01 | |
| dc.date.copyright | 2013-02-01 | |
| dc.date.issued | 2013 | |
| dc.date.submitted | 2013-01-18 | |
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| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/63180 | - |
| dc.description.abstract | 本論文介紹兩種以噴墨方式製作之SU-8光阻之微透鏡的方法，這兩種方法皆證明了其製作可調控之接觸角之微透鏡的可行性。方法一使用蔽蔭遮罩和紫外線�臭氧機進行SU-8基層表面的改質，使之變為親水性，在已改質(親水)區域和未改質(疏水)區域之間形成了親水性的差異，這提供了侷限的效應，這同時也定義了微透鏡在基層上的位置。皮升大小的稀釋SU-8光阻液滴以噴墨方式滴在已改質的親水區域上來製作微透鏡陣列。方法二以矽基板作為基板，此矽基板不經過任何氧化物蝕刻，因為原生氧化層提供了良好的親水性。接著旋轉塗佈一層約5.8微米厚的SU-8光阻來定義他的疏水區域，也因為它的厚度也同時提供了邊界侷限效應，接者滴SU-8光阻液滴在親水區域上。方法二比方法一能達到的微透鏡之接觸角更高。兩種方法皆提供了簡單、符合成本效益、且無蝕刻轉換的微透鏡製程。 | zh_TW |
| dc.description.abstract | In this thesis, two methods of fabricating inkjet-printed SU-8 photoresist microlens arrays using hydrophilic confinement are introduced. Both methods have proved the feasibility of microlens array fabrication with controllable contact angles. Method 1 used UV/ozone treatment using a film of 10-μm-thick SU-8 shadow mask to modify SU-8 photoresist base layer surface (which is on glass substrate) making it become hydrophilic. Therefore, a hydrophilicity difference between treated (hydrophilic) and non-treated (hydrophobic) zones formed, which provides confinement effect. Picoliter sized diluted SU-8 photoresist drops were ink-jetted onto treated zones with different diameters to fabricate microlens arrays using a piezoelectric print head. Method 2 used silicon base layer without oxide etching because of good hydrophilicity of native oxide. A layer of SU-8 photoresist was spin-coated to form hydrophobic areas on the silicon base layer, also providing a boundary-confined effect due to its 5.8 μm thickness. Then SU-8 photoresist drops were also ink-jetted onto hydrophilic zones to form microlens array. Method 2 reached larger maximum contact angle than Method 1. Both methods provide simple, cost-effective fabrication process without need for etch transfer. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-16T16:26:41Z (GMT). No. of bitstreams: 1 ntu-102-R99941045-1.pdf: 6138804 bytes, checksum: 386ff6d3c601d3133750b72fba9fe267 (MD5) Previous issue date: 2013 | en |
| dc.description.tableofcontents | 口試委員會審定書 #
誌謝 i 中文摘要 ii ABSTRACT iii CONTENTS iv LIST OF FIGURES vi LIST OF TABLES xi Chapter 1 Introduction 1 1.1 Review of fabrication technologies of microlens arrays 1 1.1.1 Thermal reflow of photoresist [2] 3 1.1.2 Laser beam writing [4] 4 1.1.3 Deep lithography with protons (DLP) [5] 5 1.1.4 Laser ablation [6] 6 1.1.5 Inkjet (or microjet) printing process 7 Chapter 2 Working Principles and Fabrication Process 13 2.1 Principles of hydrophilicity and hydrophobicity 13 2.2 SU-8 photoresist 16 2.3 Ultra-violet (UV)/ozone treatment 16 2.4 Fabrication Process of Method 1 17 2.4.1 SU-8 photoresist base layer 17 2.4.2 Shadow mask 18 2.4.3 UV/ozone treatment 21 2.4.4 Positioning before inkjet printing by self-assembly 21 2.4.5 Inkjet printing of microlens arrays 22 2.4.6 UV exposure of microlens arrays 22 2.5 Fabrication Process of Method 2 23 2.5.1 Silicon substrate (base layer) 24 2.5.2 SU-8 Photoresist Layer with Circular Holes on Silicon Base Layer 24 2.5.3 Self-assembling 25 Chapter 3 Inkjet printing fabrication system 26 3.1 Inkjet Printer Framework 26 3.2 The gas pressure and ink supply control system 28 3.3 The drop monitoring system 30 3.4 The dual-axis motion platform system 31 3.5 Program controlling system 32 3.5.1 Patterning Program 33 3.5.2 Drop testing program 34 3.5.3 Fabricating program 36 3.5.4 Positioning program 36 Chapter 4 Experimental results by Method 1 – using hydrophilic confinement through UV/ozone treatment to SU-8 photoresist base layer 39 Chapter 5 Experimental results by Method 2 – using hydrophilic confinement and boundary-confined effect on silicon base layer 55 Chapter 6 Conclusion 70 REFERENCE 73 | |
| dc.language.iso | en | |
| dc.subject | 噴墨 | zh_TW |
| dc.subject | 侷限效應 | zh_TW |
| dc.subject | 親水性 | zh_TW |
| dc.subject | 微透鏡 | zh_TW |
| dc.subject | 接觸角 | zh_TW |
| dc.subject | microlens | en |
| dc.subject | hydrophilicity | en |
| dc.subject | hydrophilic confinement | en |
| dc.subject | inkjet printing | en |
| dc.subject | contact angles | en |
| dc.title | 在玻璃基板與矽基板上應用噴墨方式製造之SU-8微透鏡陣列 | zh_TW |
| dc.title | Fabrication of inkjet-printed SU-8 photoresist microlens arrays on glass and silicon substrate using hydrophilic confinement | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 101-1 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 蔡睿哲,黃鼎偉 | |
| dc.subject.keyword | 微透鏡,親水性,侷限效應,噴墨,接觸角, | zh_TW |
| dc.subject.keyword | microlens,hydrophilicity,hydrophilic confinement,inkjet printing,contact angles, | en |
| dc.relation.page | 76 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2013-01-18 | |
| dc.contributor.author-college | 電機資訊學院 | zh_TW |
| dc.contributor.author-dept | 光電工程學研究所 | zh_TW |
| 顯示於系所單位： | 光電工程學研究所 | |
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