真空系統之電腦輔助設計軟體開發及抽氣流程

Abstract

本論文發展了一套真空系統之電腦輔助設計軟體，並利用此軟體來設計一套用於用於電子束直寫微影的超高真空系統。此軟體的內容包含：真空零件資料庫、真空系統的參數化設計、對話框架構的使用者介面。真空零件資料庫將零件的外觀尺寸儲存在Excel，而使用者介面是利用Visual studio 2010 C++所建立的。真空系統的參數化設計則是使用了AutoLISP語言來撰寫。設計者在使用者介面中設計完真空系統，就可以呼叫AutoCAD來輸出所設計的真空系統實體模型，並利用先前已發展過的抽氣分析軟體來評估效率。最後，本論文利用此一軟體設計了一套超高真空系統，並提出其最佳抽氣流程。

This thesis develops a computer aided design (CAD) tool for vacuum system dessign, and uses it to design an ultra-high vacuum (UHV) system for electron beam diret-write lithography (EBDL). The CAD tool for vacuum system includes the vacuum components liabray, the parametric design of vacuum system, and the dialog-based user interface. The vacuum component library stores the feature dimensions and is saved in an Excel file. The user interface is developed by Visual C++, and the parametric design of vacuum system is developed by AutoLISP language. Designers design the vacuum system through the user interface, and the CAD tool will then link to AutoCAD to generate the solid model of the desired vacuum system automatically. The pump-down efficiency of the vacuum system could be estimated by the developed pump-down curve simulation program. Finally, an ultra-high vacuum system for EBDL is designed by the CAD tool, and the pumping procedure is developed.