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  1. NTU Theses and Dissertations Repository
  2. 工學院
  3. 應用力學研究所
Please use this identifier to cite or link to this item: http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/4574
Title: 快速大氣噴射電漿燒結奈米孔隙氧化釔/奈米碳管複合材料
Rapid Atmospheric-Pressure-Plasma-Jet Sintered Nanoporous Y2O3/Carbon Nanotube Composites
Authors: Chih-Hung Wu
吳志鴻
Advisor: 陳建彰
Keyword: 氧化釔,奈米碳管,大氣電漿,
Y2O3,Carbon nanotube,APPJ,
Publication Year : 2015
Degree: 碩士
Abstract: 本研究利用快速大氣電漿燒結製程,製作氧化釔/奈米碳管複合材料,其具有導電性和抵抗低壓電漿侵蝕的能力。快速大氣電漿燒結製程所需的時間只需要3秒至5秒,即可燒結完成。在摻入奈米碳管後的複合材料,其電導率也會因此顯著的增加。用網印法製作而成的試片,試片裡所組成的奈米碳管和含碳物質會與氮氣大氣電漿產生劇烈反應在快速燒結的過程中。然而,此複合材料在低壓三氟甲烷感應耦合電漿(CHF3 ICP)的蝕刻下,表現很好的抗電漿侵蝕能力。並在低壓三氟甲烷感應耦合電漿侵蝕30分鐘後,複合材料的電導率維持在同一個級距。說明這個塗層可做為保護層在低壓電漿裝置中,且在低壓電漿系統中,有高電導率的材料有利於防止電弧發生與累積電荷。
We developed an ultrafast sintering process for a conductive low-pressure-plasma-resistant Y2O3/carbon-nanotube composite using an atmospheric pressure plasma jet. The processing time can be as short as 3 to 5 s. The incorporation of carbon nanotubes (CNTs) significantly improves the conductivity. N2 APPJ reacts violently with the CNTs and carbonaceous materials in the screen-printed pastes, rendering ultra-short processing. However, the synthesized films show great erosion resistance to low-pressure CHF3 inductively coupled plasma (ICP). The conductivity remains in similar level after exposing to the CHF3 ICP for 30 min. This coating can serve as a protection layer in low-pressure plasma environment. The high conductivity (>0.01 S cm-1) is advantageous in preventing arcing or charging effects in the low-pressure plasma environment.
URI: http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/4574
Fulltext Rights: 同意授權(全球公開)
Appears in Collections:應用力學研究所

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