請用此 Handle URI 來引用此文件:
http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/29639
標題: | 以電子束微影製作奈米石墨薄膜 Fabrication of Nano Graphite Thin Film by Electron Beam Lithography |
作者: | Yung-Hsu Lin 林詠絮 |
指導教授: | 張顏暉 |
關鍵字: | 電子束,石墨,薄膜, Electron Beam Lithography,Graphite, |
出版年 : | 2007 |
學位: | 碩士 |
摘要: | Monolayer graphite thin film (graphene) has attracted much attention recently because of its many unique properties and potential applications. In this thesis, we describe the method we developed to fabricate graphene-based device. Mechanical proliferation was used to create thin graphite fakes on the surface of SiO2 which was grown on top of n+ silicon substrate. Optical and Atomic force microscope were then used to identify the position and thickness of the graphene flakes. Electron beam lithography was then employed to make contacts to these graphene flakes. The problems that were encountered and solved in these processes will be are presented and discussed in this thesis. |
URI: | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/29639 |
全文授權: | 有償授權 |
顯示於系所單位: | 物理學系 |
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ntu-96-1.pdf 目前未授權公開取用 | 1.81 MB | Adobe PDF |
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