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完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 楊申語(Sen-Yeu Yang) | |
dc.contributor.author | Ying-Ta Chu | en |
dc.contributor.author | 朱映達 | zh_TW |
dc.date.accessioned | 2021-05-20T20:10:55Z | - |
dc.date.available | 2010-07-30 | |
dc.date.available | 2021-05-20T20:10:55Z | - |
dc.date.copyright | 2009-07-30 | |
dc.date.issued | 2009 | |
dc.date.submitted | 2009-07-28 | |
dc.identifier.citation | 參考文獻
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Lee, “Fabrication of complex nanoscale structures on various substrates,” Applied Physics Letters, Vol. 91, 123118, 2007 [35] Po-Hsun Huang, Tzu-Chien Huang, Yi-Ting Sun, and Sen-Yeu Yang, “Large-area and thin light guide plates fabricated using UV-based imprinting”, OPTICS EXPRESS, Vol. 16, No. 19, 2008 [36] Yong Yang, Shubhayu Basu, David L. Tomasko, L. James Lee, Shang-Tian Yang, “Fabrication of well-defined PLGA scaffolds using novel microembossing and carbon dioxide bonding”, Biomaterials, 26, pp. 2585–2594, 2005 [37] S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, S. H. Lee, J. D. park, P. W. Yoon, “Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching”, Microelectronic Engineering, pp.314-318, 2005. [38] S. S. Nozaki, M. Ohshima, “A CO2 assiste nanoimprinting and cold embossing”, ANTEC, pp.2551-2555, 2006. [39] W. M. Choi, M. Y. Song, O. O. Park, “Compressed-carbon dioxide (CO2) assisted nanoimprint lithography using polymeric mold”, Microelectronic Engineering, pp.1957-1960, 2006. [40] Satoshi Fujita, Daizaburo Ono, Masahiro Ohshima, Hiroo Iwata, “Supercritical CO2-assisted embossing for studying cell behaviour on microtextured surfaces”, Biomaterials, 29, pp. 4494–4500, 2008. [41] 邱俊凱, “CO2氣體輔助微熱壓製程開發研究”,臺灣大學碩士論文,民國96年6月 [42] 談駿嵩, “超臨界流體的應用”, 科學發展, 359期, pp.12-17, 2002 [43] 劉冠含,“超臨界二氧化碳流體對聚乙烯氧/聚甲基丙烯酸甲酯摻合體之影響”, 雲林科技大學碩士論文, 民國91年6月。 [44] 吳炫聰, 李明哲, 林河木, “超臨界抗溶劑法製備次微米級blue 15:6顏料微粒”, 第三屆超臨界流體技術應用與發展研討會, pp.112-119, 2004. [45] 邱永和, 陳靜玉, 陳嘉宏, 李貴琪, “超臨界二氧化碳金屬纖維染色之研究與討論”, 第三屆超臨界流體技術應用與發展研討會, pp.174-179, 2004. [46] 連培榮, 凌永健, “超音波輔助超臨界二氧化碳去光阻研究”, 第三屆超臨界流體技術應用與發展研討會, pp.219-225, 2004. [47] E.Kondoh, “Nanostructure Formation using Supercritical Carbon Dioxide Fluids”, MNE’06 Micro-and Nano-Engineering, 2006 [48] 楊啟榮, 強玲英, 黃奇聲, “微系統LIGA 製程之精密電鑄技術”, 科儀新知, 22(1), 15 (2000). | |
dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/9149 | - |
dc.description.abstract | 本研究主要針對大面積壓印技術開發,結合二氧化碳塑化技術、氣體輔助壓印技術進行大面積壓印,提供ㄧ個低溫、快速之大面積微結構複製技術。
本論文提出利用高壓二氧化碳氣體滲入塑化塑膠基板,並利用氣體等向、等壓之施壓特性來進行壓印,可將大面積母模上之微結構於遠低於塑膠基材之玻璃轉移溫度下,完整轉印至塑膠基材上。由於傳統微熱壓製程因使用壓板加壓,壓板之不平行度導致壓力分佈不均,複製面積不大且精度受限;且脆性材料(如矽晶圓、玻璃)不宜做為熱壓模具,受壓時容易發生破裂。此外,壓板(熱盤)加熱冷卻,需將整體熱盤升溫及降溫,不僅製程費時也消耗許多能源。 本製程因利用氣體均勻施壓,並利用二氧化碳能塑化塑膠材、降低製程溫度,成功於低溫在壓克力基板上複製出大面積微結構;即使使用易脆裂之晶圓做為模具,壓印也相當完整。複製出之微結構具經量測證實均勻性與轉寫性良好。 本研究更進一步將製程應用於複製15吋增亮膜V溝結構、微透鏡陣列結構、Fresnel lens、金字塔陣列結構與彩虹全像片等微結構大面積微光學元件,證明本製程之量產應用之可行性。 | zh_TW |
dc.description.abstract | In traditional micro hot embossing, substrates are pressed by hot plates, but the pressure distribution is not uniform; Si-wafers and glasses are not proper mold material because of the non-uniform pressure distribution. Furthermore, repeated heating cycle of the conventional hot embossing was not only time wasted but also energy consumed.
This thesis is devoted to the development of an effective fabrication process for the replication of large-area microstructures with uniform pressure at room temperature. This process integrates the plasticizing capacity of carbon dioxide (CO2) and the uniform embossing pressure of gas to perform the large area imprinting. In this study, highly compressed CO2 is employed not only as the plasticing agent to soften the substrate but also the pressing medium. Gas-assisted pressurizing has been proven to provide a uniform pressure distribution over a large-area substrate. As a result, CO2-assisted embossing can be performed under lower temperatures and with lower pressure, and enhances the replication quality by reducing the residual stress in the substrates. The experimental results show that the microstructures can be successfully replicated onto the whole large area (330 mm × 196 mm) substrate with high replication uniformity. Even using brittle Si-wafer, the shapes and conformations were complete. The process has been used to replicate microstructure of V grooves for brightness enhancement films (BEF), microlens array, Fresnel lens, pyramid array and rainbow hologram structures onto PMMA substrate. The size is 330mm by 190mm. The potential of mass fabrication of large-area polymer plate/film with microstructures using CO2-assisted process has been demonstrated. | en |
dc.description.provenance | Made available in DSpace on 2021-05-20T20:10:55Z (GMT). No. of bitstreams: 1 ntu-98-R96522709-1.pdf: 12840811 bytes, checksum: 68038f8d1cf7e2a6612c3e55c07af294 (MD5) Previous issue date: 2009 | en |
dc.description.tableofcontents | 目 錄
致 謝 I 摘 要 II Abstract III 目 錄 IV 表目錄 VII 圖目錄 VIII 第一章 導 論 1 1.1 前言 1 1.2 微射出成型 2 1.3 傳統微熱壓成型 3 1.4 流體微熱壓成型 4 1.5 紫外光固化奈米壓印製程 5 1.6 二氧化碳氣體用於低溫塑化塑膠材料 5 1.7研究動機與目的 6 1.8 具體研究方向與目標 7 1.9 論文架構 8 第二章 文 獻 回 顧 15 2.1 傳統微熱壓成型文獻 15 2.2 氣輔微熱壓成型文獻 16 2.3 紫外光固化壓印成型文獻 18 2.4 二氧化碳氣體輔助熱壓成型文獻 19 2.5 超臨界二氧化碳其他應用相關文獻 21 2.6 綜合歸納 24 第三章 實驗設置與規劃 42 3.1 實驗設備 42 3.1.1 鎖模機構 42 3.1.2 溫度控制設備 42 3.1.3 氣體增壓設備 43 3.1.4壓印模腔 43 3.1.5製程用氣體 43 3.1.6壓印用模具 44 3.1.7壓印用基材 45 3.1.8隔絕氣體密封膜 45 3.2 實驗方法 46 3.2.1超臨界二氧化碳輔助壓印成型步驟 46 3.2.2製程特色與分析 47 3.2.3 壓力分佈量測 48 3.2.4 模具及壓印成品表面微結構成型觀察與量測 48 3.3 本章結論 50 第四章 大面積微結構複製之實驗探討 64 4.1 大面積二氧化碳氣體輔助壓印製程初步實驗探討 64 4.1.1 不同壓印模具探討 64 4.1.2 不同壓印基材探討 65 4.1.3 二氧化碳氣體滲入塑化效果比較 65 4.2 製程參數對微結構成型探討 66 4.2.1 二氧化碳滲入壓力對成型性之影響 66 4.2.2 二氧化碳滲入時間對成型性之影響 67 4.2.3 熱壓壓力對成型性之影響 68 4.2.4 熱壓持續時間對成型性之影響 69 4.2.5 熱壓溫度對成型性之影響 69 4.2.6 最佳製程參數壓印測試 70 4.2.7 大面積微結構複製均勻性探討 70 4.3 大面積二氧化碳氣輔熱壓製程問題探討 71 4.3.1 壓印完成後之基材翹曲問題 71 4.3.2 壓印完成後之基材微裂痕問題 73 4.4 本章結論 74 第五章 製程應用製作大面積光學元件 93 5.1 二氧化碳氣輔熱壓增亮膜元件其製作與應用 93 5.1.1 實驗設備設置 94 5.1.1.1 壓印模具 95 5.1.1.2 壓印基材 95 5.1.2 實驗參數設置 95 5.1.3 實驗參數結果探討 96 5.1.4 最佳增亮膜成品壓印嘗試 97 5.2 二氧化碳氣輔熱壓先滲後壓3製程探討 98 5.3 二氧化碳氣輔熱壓大面積微透鏡陣列 99 5.3.1 大面積微透鏡壓印結果 99 5.4 二氧化碳氣輔熱壓其他大面積微結構元件 100 5.4.1 具多重結構之矽晶圓壓印 100 5.4.2金字塔陣列結構壓印 101 5.4.3彩虹全像結構壓印 101 5.5 本章結論 103 第六章 結論與未來方向 119 6.1 研究成果總結 119 6.2 未來研究方向 121 參考文獻 122 附錄A 作者簡介 127 附錄B 個人著作列表 128 | |
dc.language.iso | zh-TW | |
dc.title | 大面積二氧化碳氣體輔助微熱壓製程開發研究 | zh_TW |
dc.title | CO2 Gas-Assisted Micro Hot Embossing Process for
Large-Area Replication of Microstructures | en |
dc.type | Thesis | |
dc.date.schoolyear | 97-2 | |
dc.description.degree | 碩士 | |
dc.contributor.oralexamcommittee | 蔡曜陽(Yao-Yang Tsai),謝國煌(Kuo-Huang Hsieh) | |
dc.subject.keyword | 大面積,二氧化碳,熱壓,增亮膜, | zh_TW |
dc.subject.keyword | large,carbon dioxide,hot embossing,BEF, | en |
dc.relation.page | 128 | |
dc.rights.note | 同意授權(全球公開) | |
dc.date.accepted | 2009-07-28 | |
dc.contributor.author-college | 工學院 | zh_TW |
dc.contributor.author-dept | 機械工程學研究所 | zh_TW |
顯示於系所單位: | 機械工程學系 |
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