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  1. NTU Theses and Dissertations Repository
  2. 理學院
  3. 物理學系
Please use this identifier to cite or link to this item: http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/87959
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dc.contributor.advisor謝馬利歐zh_TW
dc.contributor.advisorMario Hofmannen
dc.contributor.author吳文華zh_TW
dc.contributor.authorWen-Hua Wuen
dc.date.accessioned2023-08-01T16:05:08Z-
dc.date.available2023-11-10-
dc.date.copyright2023-08-01-
dc.date.issued2023-
dc.date.submitted2023-06-30-
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dc.identifier.urihttp://tdr.lib.ntu.edu.tw/jspui/handle/123456789/87959-
dc.description.abstract二維材料由於其銳利的界面和原子厚度,是當今自旋閥元件中,金屬或金屬氧化物材質的間隔層最有希望的替代材料。本論文通過數值模擬和實驗研究了二維材料在自旋閥元件中的應用。
我們開發了Co/Gr/Co元件的製程,期間我們使用拉曼光譜學來確認石墨烯成功轉移。在電阻隨溫度變化的測量中,我們觀察到在低於150K的溫度下,隨著溫度降低,電阻上升,這對應了在波茲曼模型中一個0.1 meV的能隙,顯示了元件中能帶結構的扭曲。
為因應這現象,我們使用了密度泛函理論模擬軟件QuantumATK來研究Co/Gr/Co元件的能帶結構,觀察到鈷和石墨烯之間存在著強烈的耦合和軌道混合。我們還將這類計算擴展到其他二維材料,如二硫化鉬和六方氮化硼。此外,我們還透過模擬觀察到,氧化的鐵磁層會大大降低磁阻比。
在磁阻測量中,我們未能觀察到在平面磁場中,元件有顯著的磁阻信號。這可能是由於轉印二維材料的過程中,元件底部電極層的氧化。相比之下,我們觀察到在我們實驗室另一位同事開發的更先進的元件(其內沒有氧化層)中,觀察到顯著的磁阻信號,這證實了氧化層的確破壞了磁阻。這個結果與我們之前的數值計算結果一致。這個先進的元件還具有其他優勢,比如更低的阻面值(阻力乘以面積)和更好的介面面質量。
最後,我們在垂直磁場中的元件中觀察到了由塞曼效應和漢勒效應引起的磁阻信號。這樣的觀察結果表明在我們的元件中具有自旋極化,並有助於未來設計具有顯著自旋信號的自旋電子元件。
zh_TW
dc.description.abstractTwo-dimensional material is a promising alternative to metal or metal oxides as the spacer in nowadays spinvalve devices due to its sharp interface and atomic thickness. This thesis investigates the application of two-dimensional material to spinvalve by means of numerical simulation and experiment.
We developed the fabrication method to build up a Co/Gr/Co device, during which we used Raman spectroscopy to confirm a successful transfer of graphene. In temperature-dependent measurement of electrical resistance, we observed a rise of resistance as the temperature is lowered under 150K, corresponding to a band gap of 0.1 meV in Boltzman model, suggesting a distortion of bandstructure in the device.
In response, we used QuantumATK, a DFT-simulation software, to investigate the bandstructure of Co/Gr/Co device and observed a strong coupling and orbital hybridization between cobalt and graphene. We also extended such calculation to other 2D materials such as molybdenum disulfide and hexagonal boron nitride. In addition, we also observed that oxidized FM layer can decrease the magnetoresistance ratio dramatically in the simulation.
For the magnetoresistance measurement, we failed to observe significant magnetoresistance signals in the in-plane magnetic field. This may be due to the oxidized bottom electrode layer from the transfer process. In comparison, we observed significant magnetoresistance signal of a more advanced fabrication device, which is without oxidation layer and developed by another colleague in our laboratory, confirming that oxidation destroys the magnetoresistance. This result is consistent with our previous numerical calculation. The advanced device also has other advantages, such as lower resistance-area value (resistance×area) and better interface quality.
Lastly, we observed magnetoresistance signals from Zeeman effect and Hanle effect in the devices in the perpendicular magnetic field. Such observation suggests that the spin polarization is retained in our device, and benefit future design of spintronic devices with strong spin signals.
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dc.description.tableofcontentsAcknowledgements i
摘要iii
Abstract v
Contents vii
List of Figures xi
List of Tables xiii
Denotation xv
Chapter 1 Introduction 1
Chapter 2 Theory 5
2.1 Magnetoresistance and spinvalve devices . . . . . . . . . . . . . . . 5
2.2 Two dimensional material . . . . . . . . . . . . . . . . . . . . . . . 8
Chapter 3 Methods 9
3.1 Numerical simulation . . . . . . . . . . . . . . . . . . . . . . . . . . 9
3.1.1 Configuration of the simulated devices . . . . . . . . . . . . . . . . 9
3.1.2 Setting up a DFT calculation . . . . . . . . . . . . . . . . . . . . . 10
3.1.3 Transmission spectrum analysis . . . . . . . . . . . . . . . . . . . . 15
3.1.4 Surface band structure analysis . . . . . . . . . . . . . . . . . . . . 18
3.2 Fabrication . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 18
3.2.1 Material selection . . . . . . . . . . . . . . . . . . . . . . . . . . . 18
3.2.2 Bottom electrode deposition . . . . . . . . . . . . . . . . . . . . . 19
3.2.3 Transferring graphene . . . . . . . . . . . . . . . . . . . . . . . . . 20
3.2.4 Photolithography and top electrode deposition . . . . . . . . . . . . 22
3.2.5 Oxygen plasma . . . . . . . . . . . . . . . . . . . . . . . . . . . . 23
3.2.6 Electrical contact deposition . . . . . . . . . . . . . . . . . . . . . 24
3.3 Characterization . . . . . . . . . . . . . . . . . . . . . . . . . . . . 24
3.3.1 Raman spectroscopy . . . . . . . . . . . . . . . . . . . . . . . . . 27
3.3.2 Preparations to place samples in MR measurement machine . . . . . 27
3.3.3 Resistance versus temperature measurement . . . . . . . . . . . . . 27
3.3.4 IV measurement . . . . . . . . . . . . . . . . . . . . . . . . . . . . 28
3.3.5 MR measurement . . . . . . . . . . . . . . . . . . . . . . . . . . . 28
Chapter 4 Results and Discussions 29
4.1 Raman spectroscopy . . . . . . . . . . . . . . . . . . . . . . . . . . 29
4.1.1 IV measurement . . . . . . . . . . . . . . . . . . . . . . . . . . . . 29
4.2 Strong coupling between FM 2D materials . . . . . . . . . . . . . . 31
4.2.1 Temperature dependent measurement of resistance . . . . . . . . . 31
4.2.2 Numerical simulation of graphene-based SV . . . . . . . . . . . . . 33
4.2.3 Numerical simulation of MoS2-based SV . . . . . . . . . . . . . . . 36
4.2.4 Numerical simulation of h-BN-based SV . . . . . . . . . . . . . . . 46
4.2.5 Summary of numerical simulation . . . . . . . . . . . . . . . . . . 47
4.3 Influence of oxidation . . . . . . . . . . . . . . . . . . . . . . . . . 50
4.4 MR measurement in the in-plane magnetic field . . . . . . . . . . . . 51
4.5 MR measurement in the out-of-plane magnetic field . . . . . . . . . 54
4.5.1 MR measurement of advanced fabrication samples . . . . . . . . . 57
Chapter 5 Conclusion and Outlook 63
References 65
Appendix A — Typical MTJ behavior 73
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dc.language.isoen-
dc.subject磁隧道结zh_TW
dc.subject巨磁阻zh_TW
dc.subject磁阻zh_TW
dc.subject二维材料zh_TW
dc.subject自旋電子學zh_TW
dc.subject塞曼效應zh_TW
dc.subject隧道磁電阻zh_TW
dc.subject二硫化鉬zh_TW
dc.subject六方氮化硼zh_TW
dc.subject鈷zh_TW
dc.subject漢勒效應zh_TW
dc.subject石墨烯zh_TW
dc.subjectZeeman effecten
dc.subjectSpintronicsen
dc.subjectTwo-dimensional materialen
dc.subjectMagnetoresistanceen
dc.subjectGiant Magnetoresistanceen
dc.subjectMagnetic tunnel junctionen
dc.subjectTunneling magnetoresistanceen
dc.subjectGrapheneen
dc.subjectMolybdenum disulfideen
dc.subjectHexagonal boron nitrideen
dc.subjectCobalten
dc.subjectHanle effecten
dc.title二維材料於自旋電子學之應用zh_TW
dc.titleApplication of 2D Materials to Spintronicsen
dc.typeThesis-
dc.date.schoolyear111-2-
dc.description.degree碩士-
dc.contributor.oralexamcommittee藍彥文;陳永芳;謝雅萍;莊家翔zh_TW
dc.contributor.oralexamcommitteeYann-Wen Lan;Yang-Fang Chen;Ya-Ping Hsieh;Chiashain Chuangen
dc.subject.keyword自旋電子學,二维材料,磁阻,巨磁阻,磁隧道结,隧道磁電阻,石墨烯,二硫化鉬,六方氮化硼,鈷,漢勒效應,塞曼效應,zh_TW
dc.subject.keywordSpintronics,Two-dimensional material,Magnetoresistance,Giant Magnetoresistance,Magnetic tunnel junction,Tunneling magnetoresistance,Graphene,Molybdenum disulfide,Hexagonal boron nitride,Cobalt,Hanle effect,Zeeman effect,en
dc.relation.page74-
dc.identifier.doi10.6342/NTU202301254-
dc.rights.note同意授權(全球公開)-
dc.date.accepted2023-07-04-
dc.contributor.author-college理學院-
dc.contributor.author-dept物理學系-
Appears in Collections:物理學系

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