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http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/81727完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 林晃巖(Hoang-Yan Lin) | |
| dc.contributor.author | Meng-Hsin Chen | en |
| dc.contributor.author | 陳孟忻 | zh_TW |
| dc.date.accessioned | 2022-11-24T09:26:22Z | - |
| dc.date.available | 2022-11-24T09:26:22Z | - |
| dc.date.copyright | 2022-01-17 | |
| dc.date.issued | 2021 | |
| dc.date.submitted | 2021-12-08 | |
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| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/81727 | - |
| dc.description.abstract | 超穎透鏡是超穎表面開發中最重要的應用之一。目前各式各樣的材料已被應用於製作超穎透鏡，使其在某些特定頻帶中達到高效率與低製造成本的需求。在這些材料中，考量材料的各項優點，尤其是在半導體製造的量產能力，寬能隙氮化鎵屬最具潛力的材料之一。在本論文中，氮化鎵被選為製造在可見光波段工作的高性能超穎透鏡的關鍵材料，而其超穎透鏡的設計原理乃基於幾何相位或傳播相位之概念。 幾何相位設計原理亦稱為 Pancharatnam-Berry (PB) 相位法。基於 PB 相位概念設計的超穎透鏡需要圓偏振平面波作為入射光。如實驗結果所示，在 405、532 與 633 奈米之可見光波長下，依PB 相位法設計的氮化鎵超穎透鏡，其繞射極限聚焦效率分別高達 79%、84% 和 89%。另一方面，以傳播相位設計之超穎透鏡具偏振方向不敏感之特性，得以聚焦任意線性偏振方向之入射光。在此研究中，更進一步提出新開發的高效能六邊形共振元件，搭配精心挑選之次波長周期，以構建具偏振方向不敏感之高性能超穎透鏡。經實驗證明這些具偏振方向不敏感的超穎透鏡在 405、532 與 633奈米之三個不同波長下，其繞射極限聚焦效率分別為 93%、86% 和 92%。 有關超穎透鏡的成像能力，我們選擇美國空軍於1951年所制定符合美國空軍定義的分辨率測試軍用標準的分辨率測試圖(1951 USAF)作為驗證，惟目前市售的 1951 美國空軍分辨率測試圖，其最小線寬為2.19 微米。為了補足市售分辨率測試圖的不足，我們選擇自製 1951 USAF 分辨率測試圖，以利驗證超穎透鏡得以識別更小線寬之能力。依據成像實驗結果顯示，以405 奈米為波長所設計的PB相位法以及具偏振方向不敏感的氮化鎵超穎透鏡皆能實現極高的分辨率，得以分辨自製之分辨率測試圖中奈米等級之線寬，而我們可以觀察到的最小線寬為 870 奈米。這些非凡的實驗結果來自於我們在設計方面的成功，以及製程上成功製作以接近垂直側壁的高深寬比氮化鎵奈米共振器所組成的超穎透鏡。 在實際應用方面，本論文提出一個開創性的概念，即透過超穎透鏡檢測發光二極體的圖案化藍寶石基板。為了實施概念驗證，分別選擇不具有磊晶層以及具有磊晶層的市售圖案化藍寶石基板作為待檢測物，以執行超穎透鏡的檢測能力。透過適當選擇所需波長所設計的超穎透鏡，可以在圖中清楚地觀察到圖案化藍寶石基板中結構的頂點。以數值孔徑為 0.3 的超薄輕量超穎透鏡所拍攝的圖案化藍寶石基板成像，其品質與以數值孔徑為 0.4 的物鏡所拍攝之成像相當。 本研究為以寬能隙氮化鎵製作的超穎表面之應用展現了一道曙光。預計在不久的將來，超薄氮化鎵超穎透鏡將取代厚重的光學元件，成為未來光學的主流。 | zh_TW |
| dc.description.provenance | Made available in DSpace on 2022-11-24T09:26:22Z (GMT). No. of bitstreams: 1 U0001-0812202112501400.pdf: 6387141 bytes, checksum: 8439a8c4cd4cc450f59ea81885bc3096 (MD5) Previous issue date: 2021 | en |
| dc.description.tableofcontents | 口試委員會審定書 i 誌 謝…… ii 中文摘要…. iii ABSTRACT v CONTENTS viii LIST OF FIGURES x LIST OF TABLES xix Chapter 1 Introduction to Metasurfaces 1 1.1 Overview 1 1.2 Plasmonic Metasurfaces 8 1.3 Dielectric Metasurfaces and Metalenses 10 1.4 Motivation 13 1.5 Dissertation Organization 16 Chapter 2 GaN Metalens Fabrication and Experimental Setup 18 2.1 Overview 18 2.2 GaN Metalens Fabrication Processes and Inspection Equipment 19 2.3 A Commercially Available 1951 USAF Resolution Test Chart 21 2.4 The Fabrication for the 1951 USAF with smaller features 24 Chapter 3 The Pancharatnam-Berry (PB) Phase GaN Metalenses 26 3.1 The Concept of the PB Phase Method 26 3.2 The Phase Profiles of the PB Metalenses 29 3.3 The Fabricated PB Metalenses 33 3.4 The Diffraction-limited Focal Spot and Efficiency Measurements 37 3.5 Commercially Available and Homemade 1951 USAF Measurements 42 3.6 Summary of the PB Metalenses 47 Chapter 4 The Polarization-Insensitive (PI) GaN Metalenses 48 4.1 The Symmetric Resonators for PI Metalenses 48 4.2 The Highly Efficient Hexagon-Resonated Elements (HREs) 51 4.3 The Fabricated PI Metalenses 57 4.4 The Diffraction-limited Focusing Performance of the PI Metalenses 60 4.5 1951 USAF Imaging Capability of the PI Metalenses 67 4.6 Imaging Capability on a Commercialized Patterned Substrate 72 4.7 Summary of the PI Metalenses 77 Chapter 5 Conclusions and Future Prospects 79 5.1 Conclusions 79 5.2 Future Prospects on Metalenses 82 REFERENCES 86 | |
| dc.language.iso | en | |
| dc.subject | 超穎透鏡 | zh_TW |
| dc.subject | meta-lenses | en |
| dc.title | 可見光氮化鎵超穎透鏡之研究 | zh_TW |
| dc.title | Investigation of GaN Metalenses at Visible Wavelengths | en |
| dc.date.schoolyear | 110-1 | |
| dc.description.degree | 博士 | |
| dc.contributor.oralexamcommittee | 蘇炎坤(Hsin-Tsai Liu),洪瑞華(Chih-Yang Tseng),黃定洧,吳肇欣 | |
| dc.subject.keyword | 超穎透鏡, | zh_TW |
| dc.subject.keyword | meta-lenses, | en |
| dc.relation.page | 90 | |
| dc.identifier.doi | 10.6342/NTU202104522 | |
| dc.rights.note | 未授權 | |
| dc.date.accepted | 2021-12-09 | |
| dc.contributor.author-college | 電機資訊學院 | zh_TW |
| dc.contributor.author-dept | 光電工程學研究所 | zh_TW |
| 顯示於系所單位： | 光電工程學研究所 | |
文件中的檔案：
| 檔案 | 大小 | 格式 | |
|---|---|---|---|
| U0001-0812202112501400.pdf 未授權公開取用 | 6.24 MB | Adobe PDF |
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