可階梯式調變固體微型光圈設計與製作

Abstract

本研究融合前代製作光圈的方式製作光圈，經實驗後成功製作出可階段性調變之光圈元件，且元件厚度較上ㄧ代光圈薄了一半。 元件設計與製作上，我們使用了高分子分散型液晶(Polymer-dispersed liquid crystal, PDLC)與利用高分子光學膠NOA65所製作的階梯狀結構為主要的兩大部分。NOA65結構層係由透過高分子聚二甲基矽氧烷(Polydimethylsiloxane, PDMS)所做的母模翻模製作，而原始的元件結構使用黃光微影製程製作(Photolithography)，利用塗佈兩層光阻製作而成。 元件的調變機制，是利用電場與兩平行電容板間的距離成反比的原理調變。通入電壓時，在不同位置的PDLC感受到不同大小的電場，產生不同程度上的偏轉，而由平形板間距離最短的部分先偏轉，使光通過。隨著電壓的上升，最終使所有區域內的PDLC都成功偏轉。 量測方面，我們使用CMOS搭配鹵素燈觀察等效的光圈通光孔徑，並透過MATLAB將影像做灰階轉換得到光圈開孔大小與電壓升降之間的關係。

This thesis mixes the previous process of fabrication about the tunable non-mechanical iris. And we can successfully fabricate the discretely tunable iris with step structure. Moreover, we successfully make the thinner thickness than the iris previously made. The material of the experiment is polymer-dispersed liquid crystal, PDLC, and the optical cement, NOA65. The concept of iris design is from the parallel board capacitor. The electric field is inversely with the gap between the capacitor. Thus, we injected the PDLC in our sample. With the different thickness of the substrate made from NOA65, the PDLC will switch to transparent from the thin gap to thick gap. Therefore, we can use this phenomenon to achieve the iris tunable. The fabrication of sample we use photolithography. Using the same or different photoresist produced the structure we wanted. Then using the polydimethylsiloxane(PDMS) make the mold for NOA65. Finally, the experiment used CMOS to capture the iris photography to know whether the aperture size can tune or not. After that, we used software, MATLAB, to realize the relationship between the aperture size and voltage.