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  1. NTU Theses and Dissertations Repository
  2. 管理學院
  3. 商學研究所
請用此 Handle URI 來引用此文件: http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/70787
完整後設資料紀錄
DC 欄位值語言
dc.contributor.advisor郭瑞祥,陳忠仁
dc.contributor.authorSSU-HSUAN HUANGen
dc.contributor.author黃嗣璿zh_TW
dc.date.accessioned2021-06-17T04:38:29Z-
dc.date.available2023-08-10
dc.date.copyright2018-08-10
dc.date.issued2018
dc.date.submitted2018-08-07
dc.identifier.citation英文文獻
1. Porter, M. E. (2008). The five competitive forces that shape strategy. Harvard business review, 86(1), 25-40.
2. Bain, J. S. (1951). Relation of profit rate to industry concentration: American manufacturing, 1936–1940. The Quarterly Journal of Economics, 65(3), 293-324.
3. Barney, J. (1991). Firm resources and sustained competitive advantage. Journal of management, 17(1), 99-120.
4. Barney, J. B., & Hesterly, W. S. (2010). VRIO Framework. In Strategic Management and Competitive Advantage (pp. 68–86). New Jersey: Pearson.
5. Coase, R. H. (1937). The nature of the firm. economica, 4(16), 386-405.
6. Collins, C. J., Hanges, P., & Locke, E. A. (2004). The relationship of need for achievement to entrepreneurship: A meta-analysis. Human Performance, 17, 95–117.
7. Domowitz, I., Hubbard, R. G., & Petersen, B. C. (1986). Business cycles and the relationship between concentration and price-cost margins. The RAND Journal of Economics, 1-17.
8. Dyer, J. H., & Chu, W. (2003). The role of trustworthiness in reducing transaction costs and improving performance: Empirical evidence from the United States, Japan, and Korea. Organization science, 14(1), 57-68.
9. e-review, 2013, Immersion Extension and the Transition to 450 mm,
10. Scott Jones, 2017,Getting Moore out of Chips, AlixPartners
11. 2012, Can Nikon Or Canon Ever Catch ASML, Silicon Semiconductor
12. Bryon Moyer, 2017, Nikon vs. ASML, EE Journal Daily Newsletter
13. Shaun Nichols, 2017, Zeiss, ASML hit back at Nikon in chip-printing
14. Will Wade, 2000, ASML acquires SVG, becomes largest litho supplier,
15. Press, 2006, ASML to acquire Brion Technologies, ASML
16. Roberta Cowan, 2012, Chip gear maker ASML buys Cymer, Reuters
17. Marcel Michelson, ASML To Buy Taiwan's HMI At Steep Price To Boost
18. Press Releases, 2016, ZEISS and ASML Strengthen Partnership for Next
19. Joel Hruska, 2016, TSMC will begin 10nm production this year, claims
20. 2004,First commercial immersion lithography chip is from IBM
21. Jeff Dorsch,2015,Proponents of EUV,immersion lithography face off
22. Ramish Zafar,2017,TSMC’s 7nm Risk Production Will Start In April,
23. Rick Merritt,2017,Chip Execs More Bullish on EUV,EE times
24. Mark LaPedus,2002,ASML,Canon,Nikon present new 157-nm roadmaps
25. David Lammers,2010,E-Beam Lithography Seeks Investment Boost,SEMI
26. Ed Korczynski,2017,EUVL Materials
27. Peter J. Silverman,2002,The Intel Lithography Roadmap,Intel
28. 2017,The Truth Behind Intel's Manufacturing Lead,seekingalpha.com
29. 2015,TSMC Selling Sold ASML Stake,CDRInfo.com
30. Anton Shilov, 2016, EUV Lithography Makes Good Progress, Still Not Ready for Prime Time, AnandTech
中文文獻
1. 摩爾定律,維基百科。
2. Judith Cheng,2017,當摩爾定律走入歷史然後呢,電子工程專輯
3. Moore Ren,2016,先進半導體工藝帶來晶片成本的變化,半導體行業觀察
4. 半導體行業觀察,2016,賣掉ASML股份,三星在工藝競爭中會落後麼,
5. 尼康,維基百科
6. 佳能,維基百科
7. Atkinson,2017,Nikon 狀告 ASML 與夥伴 Carl Zeiss 侵權,TechNews
8. 公司資訊,台積公司
9. liu milo,2017,台積電、三星 EUV 新技術競賽,Tech News
10. Atkinson, 2017, Nikon 狀告 ASML 與夥伴 Carl Zeiss 侵權, TechNews
11. 王智弘,2009,台積電與IMEC/SVTC攜手超越摩爾,新電子
12. 張家瑋,2016,台積拚製程 研發支出創高,經濟日報
13. 鄭東旭,2012,從後摩爾時代的產業特性探討高階晶圓代工未來的競爭策略-以T個案公司為例,碩士論文
14. 羅際興,2017,半導體設備產業廠商經營策略分析--以漢微科公司為例,碩士論文
15. 嚴永松,2018,半導體晶圓代工廠商微影製程開發策略之分析:T公司個案研究,碩士論文
16. Atkinson, 2018, 2017 年全球半導體市場成長創新高,2018 年持續樂觀發展, TechNews
17. 2018, 2017 年全球前十大晶圓代工業者排名,台積電市占 55.9% 居第一, TechNews
dc.identifier.urihttp://tdr.lib.ntu.edu.tw/jspui/handle/123456789/70787-
dc.description.abstract隨著半導體元件尺寸逼近物理極限,摩爾定律正面臨停止的危險,ASML肩負著關鍵技術研發,也同時面對如何調整本身資源並將讓三位彼此視為競爭對手的客戶一同坐下討論,下一階段製程脈絡。
從1984年ASML萌芽開始,這三十多年內,所作決策,即是不斷的提高自身價值鏈,並且也拉起周遭夥伴培養出一套獨有的生態系,保持著低自製率,高外包率,並且讓合作產業可以保持長久關係,讓主要專利給合作夥伴持有,對於關鍵需要挹注資源或技術,同時因低固定資產緣故,使ASML具備彈性應變,在產業面對寒冬時,可以有效因應,並在景氣復甦時,有能力立即拓展,進可以透過併購與入股來加強產品深度與廣度,退可以重新將資金銀彈投注在市場轉折下變化。
先進微影技術已經不是單一產業可以獨立發展,業界的共同合作成為一個可行的發展途徑,以ASML從過去與供應鏈合作,彼此分散風險,共創雙贏,到後期邀請各巨頭入股以分散研發風險,不僅使大家技術再次往前推進,ASML發展出獨家的EUV技術,其他客戶也能保證在下一代製程出現時,能獲得重要研發資訊與優先機台選擇權。
在客戶端上,台積電、三星和英代爾,這三家公司的半導體製程開發實力,不分軒輊,不過,高成本是造成英特爾進入代工領域的障礙,此外英特爾和客戶有可能是終端產品的競爭對手,三星將其系統LSI部門獨立成為公司,其目的就是給新公司更多的獨立性,但企業主體仍以DRAM為主。ASML抓準彼此雖然競爭,但在關鍵點上,仍互有選擇,透過客戶聯合投資,去使每家廠商表態,避免每家在製程發展上分散資源,亦可以因全部投注資源在ASML之上,維持其龍頭的時間與地位。
期待 ASML多朝持續電子束領域持續耕耘,避免在EUV面對技術瓶頸下能保持技術儲備並持續突破;並戮力發展18吋晶圓設備,確保客戶生產成本下降。同時也期許台灣半導體設備產業能有更多破壞式創新,並整合在台灣的資源整合,提升進口替代比重。
zh_TW
dc.description.abstractWith semiconductor components approaching the physical limits, Moore’s Law is in danger of stopping. ASML have a responsibility for key technology research and development, and at the same time faces how to adjust its own resources and let three customers who consider each other as competitors to sit down and discuss together.
First, in the past 30 years, ASML has been to constantly improve its own value chain, and it has also pulled up its cooporated partners to cultivate a unique ecosystem, and maintaining a low non-current asset rate and high outsourcing rate. Moreover ASML allow the cooperation industry own the core patent for maintaining long-term relationship and motivated to pay attention to resources or technology.
The advanced lithography technology is not a single industry that can develop independently. The cooperation of the industry has become a viable development approach. ASML used the cooperation with the supply chain in the past to diversify risks and create a win-win situation. In the later period, ASML was defined the best partner as its ability to create value chain by merge and accusation of other technology companies.
Thirdly, ASML created a new win-win model by inviting its core clients, including TSMC, Samsung and Intel to core development on next generation foundry scanner. This new customer co-investment program split high R&D cost and create new EUV technology which strengthen ASML’s leading position among another foundry scanner manufactures. ASML’s clients, such as TSMC, also benefits from this program to enjoy better scanners and gain money return via investing ASML’s co investment program.
On the client side, TSMC, Samsung and Intel, the strengths of the semiconductor process development of these three companies. However, the high cost is an obstacle to Intel's entry into the foundry industry. In addition, Intel and its customers may compete with the end product. Opponents, Samsung will be independent of the system LSI department as a company, its purpose is to give the new company more independence, but the main business is still dominated by DRAM. Although ASML is able to grasp each other's competition, at the key point, there are still mutual choices. Through joint investment by customers, each company is required to stand out, avoiding the dispersion of resources in the development of each process, and can also rely on all betting resources on top of ASML. , maintain leading position each other.
Finally, It is expected that ASML will continue its efforts in the field of continuous electron beam to avoid technical reserve bottleneck. At the same time, it will strive to develop 18-inch wafer equipment to ensure lower production costs for its customers. It also expects that Taiwan's semiconductor equipment industry can have more destructive innovations, integrate its resources in Taiwan, and increase the proportion of import substitution.
en
dc.description.provenanceMade available in DSpace on 2021-06-17T04:38:29Z (GMT). No. of bitstreams: 1
ntu-107-R05741050-1.pdf: 3854004 bytes, checksum: 5144d6c0aef89f84563f485197f0ce92 (MD5)
Previous issue date: 2018
en
dc.description.tableofcontents目錄
口試委員會審定書 i
摘要 ii
ABSTRACT iii
圖目錄 viii
表目錄 xi
第一章 緒論 1
1.1 研究動機 1
1.2 研究問題與目的 1
1.3 研究方法及限制 2
1.4 研究流程 3
第二章 文獻探討 4
2.1 Boston Consulting Group的BCG矩陣 4
2.2 產業五力分析 6
2.3 產業結構及產業集中度 8
2.3.1產業結構(Industry structure) 8
2.3.2產業集中度(Industrial Concentration) 9
2.3.3市場集中度和利潤率的關係(concentration-margins relationship) 10
2.4 資源與能力分析 11
2.5 購併策略分析: 14
第三章 半導體微影設備產業分析 15
3.1 半導體產業概況 15
3.1.1半導體歷史沿革 15
3.1.2半導體發展現況 20
3.1.3半導體晶圓代工產業分析 24
3.2 半導體設備產業概況與市場分析 28
3.2.1 半導體設備產業概況 28
3.2.2 半導體設備業的市場區隔: 31
3.2.3全球前五大半導體設備商 33
3.2.4 半導體設備產業 五力分析 37
3.3 微影設備產業結構與技術分析 39
3.3.1 微影設備歷史沿革 39
3.3.2 現階段產品成本結構與技術 41
3.3.3 次時代微影技術 EUV 44
3.3.4 潛在技術取代 49
3.4 產業競合分析與客戶行為 51
3.4.1 同業競爭者 51
3.4.2微影設備主要客戶 56
3.4.3 關鍵零組件供應商 60
3.5 產業關鍵競爭要素 62
第四章 個案分析: ASML艾司摩爾 68
4.1 個案公司介紹 68
4.1.1個案公司歷史沿革 68
4.1.2 個案公司財務狀況分析 76
4.1.3個案公司產品與銷售 83
4.2 資源與能力 88
萌芽初期 (1984~1999) 88
攫取市占取得技術領先 (2000~2012) 89
寡頭合作、技術、資源聯盟 (2012- 90
資源與能力評價 91
4.3 個案公司競合、併購與聯合投資分析 94
4.3.1併購與聯合投資分析 94
第五章 結論與建議 101
5.1 研究結論 101
5.2 研究建議 102
第六章 參考文獻 103
英文文獻 103
中文文獻 104
dc.language.isozh-TW
dc.subjectEUVzh_TW
dc.subjectBCG 矩陣zh_TW
dc.subject五力分析zh_TW
dc.subject微影設備zh_TW
dc.subject專利戰zh_TW
dc.subject客戶共同投資zh_TW
dc.subject蔡司zh_TW
dc.subject台積電zh_TW
dc.subjectEUVen
dc.subjectBCG matrixen
dc.subjectFive force analysisen
dc.subjectlithography equipmenten
dc.subjectZeissen
dc.subjectTSMCen
dc.subjectpatent warfareen
dc.subjectcustomer investmenten
dc.title半導體微影設備產業競合與併購:以ASML為例zh_TW
dc.titleAnalysis of growth, competition and M & A in the semiconductor lithography equipment industry: the case of ASMLen
dc.typeThesis
dc.date.schoolyear106-2
dc.description.degree碩士
dc.contributor.oralexamcommittee林博文,林俊裕
dc.subject.keywordBCG 矩陣,五力分析,微影設備,專利戰,客戶共同投資,EUV,蔡司,台積電,zh_TW
dc.subject.keywordBCG matrix,Five force analysis,lithography equipment,patent warfare,customer investment,EUV,Zeiss,TSMC,en
dc.relation.page105
dc.identifier.doi10.6342/NTU201802735
dc.rights.note有償授權
dc.date.accepted2018-08-08
dc.contributor.author-college管理學院zh_TW
dc.contributor.author-dept商學研究所zh_TW
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