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完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 楊申語 | |
dc.contributor.author | Yu-Yuan Huang | en |
dc.contributor.author | 黃友元 | zh_TW |
dc.date.accessioned | 2021-06-16T23:45:53Z | - |
dc.date.available | 2022-12-31 | |
dc.date.copyright | 2012-08-01 | |
dc.date.issued | 2012 | |
dc.date.submitted | 2012-07-24 | |
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Of SPIE, Vol. 6517, pp.6517161-6517168, (2007). [22] H. Gao, H. Tan, W. Zhang, K. Morton and S. Y. Chou, “Air Cushion Press for Excellent Uniformity, High Yield, and Fast Nanoimprint Across a 100 mm Field” Nano Lett., Vol. 6(11), pp.2438 -2441, (2006). [23] F. S. Cheng, S. Y. Yang and C. C. Chen, “Novel hydrostatic pressuring mechanism for soft UV-inprinting processes” Journal of Vacuum Science and Technology B, Vol. 26, pp.132-136, (2008). [24] B. Heidari, I. Maximov, E. L. Sarwe and L. Montelius, “Large scale nanolithography using nanoimprint lithography” J. Vac. Sci. Technol. B, Vol. 17(6), pp.2961-2964, (1999). [25] H. Lee and G. Y. Jung, “Wafer to wafer nano-imprint lithography with monomer based thermally curable resin” Microelectronic Eng, Vol. 77, pp.168-174, (2005). [26] X. D. Huang, L. R. Bao, X. Cheng, L. J. Guo, S. W. Pang and A. F. Yee, “Reversal imprinting by transferring polymer from mold to substrate” J. Vac. Sci. Technol. B, Vol. 20(6), pp.2872-2876, (2002). [27] http://www.asi-team.com/asi%20team/Obducat/Product_Catalog_2006_ver1.pdf [28] W. Hu, B. Yang, C. Peng and S. W. Pang, “Three-dimensional SU-8 structures by reversal UV imprint” J. Vac. Sci. Technol. B, Vol. 24, pp.2225-2229, (2006). [29] B. Yang, C. Peng and S. W. Pang, “Multiple level nanochannels fabricated using reversal UV nanoimprint” J. Vac. Sci. Technol. B, Vol. 24, pp.2984-2987, (2006). [30] N. Kehagias, V. Rebound, G. Chansin, M. Zelsmann, C. Jeppeses, C. Schuster, M. Kubenz, F. Reuther, G. Gruetzner and C. M. Sotomayor Torres, “Reverse-contact UV nanoimprint lithography for multilayered structure fabrication” Nanotechnology, Vol. 18, pp.2954-2957, (2005). [31] K. S. Han, S. H. Hong and H. Lee, “Fabrication of complex nanoscale structures on various substrates” Applied Physics Letters, Vol. 91, pp.123118, (2007). [32] H. Hiroshima, S. Inoue, N. Kasahara, J. Taniguchi, I. Miyamoto and M. Komoro, “Uniformity in patterns imprinted using photo-curable liquid polymer” Jpn. J. Appl. Phys., Vol. 41, pp.4173-4177, (2002). [33] A. Fuchs, M. Bender, U. Plachetka, U. Hermanns and H. Kurz, “Ultraviolet-based nanoimprint at reduced environment pressure” J. Vac. Sci. Technol. B, Vol. 23, pp.2925-2928, (2005). [34] P. Ruchhoeft, M. Colburn, B. Choi, H. Nounu, S. Johnson, T. Bailey, S. Damle, M. Stewart, J. Ekerdt, S. V. Sreenivasan, J. C. Wolfe and C. G. Willson, “Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography” J. Vac. Sci. Technol. B, Vol. 17, pp.2965-2969, (1999). [35] D. J. Resnick, S. V. Sreenivasan and C. G. Wilison, “Step & flash imprint lithography” Mater. Today, Vol. 8, pp.34-42, (2005). [36] X. Liang, H. Tan, Z. Fu and S. Y. Chou, “Air bubble formation and dissolution in dispensing nanoimprint” Nanotechnology, Vol. 18, pp.25303-25309, (2007). [37] H. Hiroshima, M. Komuro, N. Kasahara, Y. Kurashima and J. Taniguchi, “Elimination of pattern defects of nanoimprint under atmospheric conditions” Jpn. J. Appl. Phys., Vol. 42, pp.3849-3853, (2003). [38] H. Hiroshima and M. Komuro, “Control of bubble defects in UV nanoimprint” Jpn. J. Appl. Phys., Vol. 46, pp.6391-6394, (2007). [39] H. Hiroshima and M. Komuro, “UV-nanoimprint with the assistance of gas condensation at atmospheric environment pressure” J. Vac. Sci. Technol. B, Vol. 25, pp.2333-2336, (2007). [40] G. Y. Jung, S. Ganapathiappan, A. A. Ohlberg, L. O. Deirdre, Y. Chen, W. M. Tong and R. W. Stanley, “Fabrication of a 34 × 34 Crossbar Structure at 50 nm Half-pitch by UV-based Nanoimprint Lithography” Nano Letters, Vol 4(7), pp1225–1229, (2004) [41] http://www.tri.org.tw/unfccc/Unfccc/UNFCCC02.htm | |
dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/65484 | - |
dc.description.abstract | 一般UV樹脂微結構複製製程的曝光採直下式,耗能且壓印面積受限,本研究致力於開發側入式光源大面積微結構複製技術,並結合紫外光固化成型技術、反轉式壓印成型技術及氣囊輔助壓印製程,提供一個室溫成型、節能且快速的微結構轉寫製程。本系統有下列優點:全新側入式光源的導入,不僅於能源使用上降低成本,且解決了大面積微結構複製之限制;本製程亦使樹脂固化過程緩和,使黏模及微結構破壞等問題獲得改善;並配合紫外光固化成型技術,使製程於室溫下進行,減少因升降溫過程所造成之材料翹曲及殘留應力等問題;反轉式壓印成型技術,則藉由樹脂塗佈於模具上,使樹脂先行流入模穴,以提高微結構轉寫率;氣囊輔助壓印技術具流體施壓均勻之物理特性,使全區域之壓印壓力分布均勻,並提高各區域微結構之轉寫情形。
實驗結果顯示,使用大面積側入式光源配合反轉式塗佈氣輔壓印複製,能成功在大面積(380 mm × 230mm)之壓克力基板上,複製出V-cut微結構,複製均勻性及轉寫率均佳。所壓印出之微結構藉由光輝度值量測,証實其成品已具備使用價值。經由PDMS軟模配合側入式光源及氣囊輔助壓印機制,也成功複製出具高轉寫率之菲涅爾透鏡,及微透鏡陣列結構。本研究證實結合全新側入式光源、紫外光固化壓印成型、反轉式壓印成型並配合氣囊輔助壓印,成功開發出一大面積光學元件製程技術,可應用於大面積表面微結構之光學及生醫元件量產上。 | zh_TW |
dc.description.abstract | The conventional UV resin is cured by direct irradiation from the bottom. High energy consumption and limited imprint area are problems. In this study, an innovative side-emitting UV-curing imprinting process is developed for large area microstructure replication. In this study, we integrate the ultraviolet-curing imprint, reversal imprinting and gasbag-assisted imprinting to fabricated microstructures. The side-emitting gasbag-assisted UV-curing imprint process yields energy saving, short cycle time, uniform pressure and room temperature processing. The process not only reduces the waste but also enlarges the fabrication area. The moderate UV curing with UV emitting from sides prevent mold sticking and microstructure damage. The reversal imprinting coating and gasbag-assisted embossing provides the uniform pressure over the whole substrate.
The process has been successfully used for fabricating V-cut microstructures on the whole area of 380mm by 230mm. The imprinted plates shows that the micro-structures have its brightness enhancement function. The facility and process has also been used to fabricate Fresnel lens and micro lens structures successfully. The process integrating gasbag-assisted pressuring, UV-emitting from sides, reversal UV imprinting shows great potential for replication of large-area microstructures for optical and biomedical application. | en |
dc.description.provenance | Made available in DSpace on 2021-06-16T23:45:53Z (GMT). No. of bitstreams: 1 ntu-101-R99522736-1.pdf: 12926761 bytes, checksum: 5e4141c7034846cd247a7910c9166b1a (MD5) Previous issue date: 2012 | en |
dc.description.tableofcontents | 致謝 I
摘要 II Abstract III 目錄 IV 圖目錄 VIII 表目錄 XIII 第一章 導論 1 1.1前言 1 1.2微熱壓製程及其相關技術 2 1.3氣體輔助微熱壓成型製程 3 1.4紫外光硬化樹脂奈米壓印 4 1.5現有問題與挑戰 4 1.6論文內容與架構 5 第二章 文獻回顧 9 2.1紫外光固化成型 9 2.2壓力傳遞型式 11 2.2.1壓印的起源 11 2.2.2軟板輔助壓印製程 11 2.2.3軟模輔助壓印製程 12 2.2.4流體輔助壓印製程 13 2.3反轉式壓印成型技術 14 2.4氣泡成型缺陷問題與改善 15 2.5文獻總結 16 第三章 實驗設置與實驗方法 34 3.1實驗目的及整體流程規劃 34 3.1.1實驗目的說明 34 3.1.2設備設置與整體實驗流程規劃 35 3.2設備設置 36 3.2.1大面積微結構機台能力說明 36 3.2.2模治具設計說明 37 3.2.3油壓閥件更換說明 37 3.2.4電控設備更換說明 37 3.2.5人機介面更新說明 37 3.2.6製程用之基材(PMMA) 38 3.2.7製程用模具 38 3.2.8紫外光固化壓印製程步驟 38 3.3周邊輔助設備 39 3.4小面積壓印結果與討論 40 3.5節能效果與討論 41 3.6本章結論 42 第四章 側入式光源大面積微結構周邊設備開發 52 4.1製程特性分析 52 4.2壓印模具與相關製程設備 53 4.2.1壓印模具 53 4.2.2自製之LED燈具 53 4.2.3氣泡包封及模具沾黏 54 4.3具自動化能力之實驗機台 54 4.4檢測儀器 55 4.5本章結論 56 第五章 側入式紫外光硬板壓印製程參數探討 63 5.1機台能力與實驗項目規劃 63 5.1.1實驗機台能力說明 63 5.1.2實驗項目規劃 64 5.1.3製程流程說明 65 5.2壓印壓力與入光時間操作窗建立 65 5.2.1改變照光時間與改變壓印壓力下之實驗結果 65 5.2.2黏模問題處理 66 5.3改變基材厚度與改變壓印壓力微結構成型參數 67 5.4基材厚度對於固化時間之影響 68 5.4.1實驗規劃說明 68 5.4.2不同基材厚度下最短製程時間討論 68 5.4.3實驗試片於巨觀下之光學效果 69 5.5本章結論 69 第六章 側入式光源氣囊輔助壓印機台設置與實驗 79 6.1側入式光源氣囊輔助壓印機台設計與實驗步驟說明 79 6.1.1側入式光源氣囊輔助壓印機台設計說明 79 6.1.2氣囊輔助壓印實驗流程說明 80 6.2機台能力與側入式氣囊壓印實驗 81 6.2.1機台能力說明 81 6.2.2改變壓印壓力與不同基材厚度之成型參數 82 6.3硬板壓印與氣輔壓印之均勻性量測 82 6.3.1富士感壓軟片之原理說明 82 6.3.2硬板壓印與氣輔壓印之力量分佈 83 6.4兩壓印方式之優缺點分析 84 6.4.1兩壓印方式之優缺點比較 84 6.4.2不同壓印方式對微結構成型之分析 85 6.5本章結論 86 第七章 側入式紫外光微結構成型比較與檢測 96 7.1兩壓印方式下成品均勻性與殘留層厚度比較與檢測 96 7.1.1均勻性量測方式說明以及參數挑選 96 7.1.2微結構轉寫之均勻性量測 97 7.1.3殘留層量測方式說明以及參數挑選 97 7.1.4殘留層厚度量測與改善說明 98 7.2微結構應用於光學量測與殘留應力檢測 99 7.2.1光輝度值量測與光學分析 99 7.2.2壓印成品殘留應力檢測 100 7.3使用PDMS軟模進行菲涅爾透鏡微結構複製 100 7.3.1軟模翻鑄 100 7.3.2菲涅爾透鏡微結構複製 102 7.4PDMS軟模壓印微透鏡與其光學檢測 102 7.5本製程所使用之能源計算 104 7.6本章結論 106 第八章 結論與未來研究方向 130 8.1研究成果總結 130 8.2原始貢獻 131 8.3未來發展方向 132 參考文獻 136 | |
dc.language.iso | zh-TW | |
dc.title | 側入式UV光固化壓印複製大面積微結構製程研發 | zh_TW |
dc.title | Development of Side-Emitting UV-curing Imprinting Process for Large-Area Replication of Microstructures | en |
dc.type | Thesis | |
dc.date.schoolyear | 100-2 | |
dc.description.degree | 碩士 | |
dc.contributor.oralexamcommittee | 沈永康,黃子健,劉士榮 | |
dc.subject.keyword | 微結構複製,紫外光固化,大面積壓印, | zh_TW |
dc.subject.keyword | microstructures replication,UV-curing,large-area imprinting, | en |
dc.relation.page | 140 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2012-07-24 | |
dc.contributor.author-college | 工學院 | zh_TW |
dc.contributor.author-dept | 機械工程學研究所 | zh_TW |
顯示於系所單位: | 機械工程學系 |
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