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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 蔡坤諭(Kuen-Yu Tsai) | |
| dc.contributor.author | Chih-Yu Chen | en |
| dc.contributor.author | 陳志宇 | zh_TW |
| dc.date.accessioned | 2021-06-16T17:15:55Z | - |
| dc.date.available | 2022-08-19 | |
| dc.date.copyright | 2012-08-27 | |
| dc.date.issued | 2012 | |
| dc.date.submitted | 2012-08-19 | |
| dc.identifier.citation | [1] Kaustuve Bhattacharyya, Noelle Wright, Maurits van der Schaar, Arie den Boef, Paul Hinnen, Mir Shahrjerdy, Vivien Wang, Spencer Lin, Cathy Wang, Chih-Ming Ke, Jacky Huang and Willie Wang, 'New approaches for scatterometry-based metrology for critical distance and overlay measurement and process control', J. Micro/Nanolith. MEMS MOEMS 10, 013013 (Jan 25, 2011)
[2] Alok Vaid, Matthew Sendelbach, Daniel Moore, Timothy A. Brunner, Nelson Felix, Pawan Rawat, Cornel Bozdog, Hyang Kyun Helen Kim, Michael Sendler, Stanislav Stepanov and Victor Kucerov, 'Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry targets', J. Micro/Nanolith. MEMS MOEMS 9, 041306 (Dec 09, 2010) [3] Prasad Dasari, Jiangtao Hu, Zhuan Liu, Asher Tan, Oleg Kritsun, Catherine Volkman and Chris Bencher, 'Scatterometry characterization of spacer double patterning structures', J. Micro/Nanolith. MEMS MOEMS 9, 041309 (Dec 30, 2010) [4] Anne-Laure Charley, Philippe Leray, Koen D'have, Shaunee Cheng, Paul Hinnen, Fahong Li, Peter Vanoppen and Mircea Dusa, '3D features measurement using YieldStar, an angle resolved polarized scatterometer', Proc. SPIE 7971, 79712E (2011) [5] H. Gross, R. Model, M. Bar, M. Wurm, B. Bodermann, A. Rathsfeld, Mathematical modelling of indirect measurements in scatterometry, Measurement, Volume 39, Issue 9, Advanced Mathematical Tools for Measurement in Metrology and Testing, November 2006, Pages 782-794, ISSN 0263-2241 [6] Jos Maas, Martin Ebert, Kaustuve Bhattacharyya, Hugo Cramer, Arthur Becht, Stefan Keij, Reinder Plug, Andreas Fuchs, Michael Kubis, Tom Hoogenboom and Vidya Vaenkatesan, 'YieldStar: a new metrology platform for advanced lithography control', Proc. SPIE 7985, 79850H (2011) [7] Sentaurus Lithography (Synopsis, Inc.) version D-2010.06 [8] Itaru Kamohara, Vitaliy Domnenko and Alexander Philippou, 'Role of ellipsometry in DPT process characterization and impact of performance for contact holes', Proc. SPIE 8081, 80810R (2011) [9] Bryan J. Rice, Heidi Cao, Michael Grumski, Jeanette Roberts, “The limits of CD metrology,” Microelectronic Engineering, 83 (4-9), p.1023 (2006). [10] Yoel Cohen, Barak Yaakobovitz, Yoed Tsur, David Scheiner, “A novel method for pushing the limits of line edge roughness detection by scatterometry,” Proc. SPIE 6922, 692220 (2008) [11] Barak Yaakobovitz, Yoel Cohen, Yoed Tsur, “Line edge roughness detection using deep UV light scatterometry,” Microelectronic Engineering, 84 (4), p.619 (2007). [12] G. Vera Zhuang, Steven Spielman, John Fielden, Daniel C. Wack, Leonid Poslavsky and Benjamin D. Bunday, 'Dark-field optical scatterometry for line-width-roughness metrology', Proc. SPIE 7272, 72720L (2009). [13] Bill Banke, Jr., Charles N. Archie, Matthew Sendelbach, Jim Robert, James A. Slinkman, Phil Kaszuba, Rick Kontra, Mick DeVries and Eric P. Solecky, 'Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology', Proc. SPIE 5375, 133 (2004). [14] Oleg Kritsun, Bruno La Fontaine, Yongdong Liu and Chandra S. Saravanan, 'Extending scatterometry to the measurements of sub 40 nm features, double patterning structures, and 3D OPC patterns', Proc. SPIE 6924, 69241M (2008). [15] Laszlo Szikszai, Philipp Jaschinsky, Katja Keil, Marc Hauptmann, Manfred Mort, Uwe Seifert, Christoph Hohle, Kang-Hoon Choi, Frank Thrum, Johannes Kretz, Vaeriano Ferreras Paz and Arie den Boef, 'Fabrication of metrology test structures for future technology nodes using high-resolution variable-shaped e-beam direct write', Proc. SPIE 7271, 72712M (2009). [16] Mitsuo Hiroyama, Tsutomu Murakawa, Masayuki Kuribara, Toshimichi Iwai, Minoru Soma, Ikuo Iko, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka and Kenji Komoto, 'Addressing 3D metrology challenges by using a multiple detector CDSEM', Proc. SPIE 8166, 81661R (2011) [17] Chris Bencher, Jo Finders, Ilan Englard, Yaron Cohen, Amir Sagiv, Michael Ben-Yishai, Shmoolik Mangan, Huixiong Dai, Chris Ngai, Kfir Dotan, Roel Knops, Orion Mouraille, Evert Mos and Alexander Kremer, 'Toward 22 nm: fast and effective intrafield monitoring and optimization of process windows and critical dimension uniformity', J. Micro/Nanolith. MEMS MOEMS 10, 043003 (Oct 06, 2011) [18] Timothy A. Brunner and Richard A. Ferguson, 'Approximate models for resist processing effects', Proc. SPIE 2726, 198 (1996); doi:10.1117/12.240906 [19] International Technology Roadmap for Semiconductor, Table LITH3A Resist Requirements, Lithography, 7 (2011). [20] Martin Ebert, Hugo Cramer, Wim Tel, Michael Kubis and Henry Megens, 'Combined overlay, focus and CD metrology for leading edge lithography', Proc. SPIE 7973, 797311 (2011) [21] Christopher J. Raymond, Michael E. Littau, Andrei Chuprin and Simon Ward, 'Comparison of solutions to the scatterometry inverse problem', Proc. SPIE 5375, 564 (2004) [22] A. Yamaguchi, H. Koyanagi, J. Tanaka, O. Inoue and H. Kawada, 'Robust edge detection with considering three-dimensional sidewall feature by CD-SEM', Proc. SPIE 7971, 79710A (2011) [23] Czeslaw Lukianowicz, 'Direct and inverse problem in scatterometry of rough surfaces', Proc. SPIE 4517, 120 (2001) [24] Chris Mack, Fundamental Principles of Optical Lithography: The Science of Microfabrication, John Wiley & Sons Ltd, The Atrium, Southern Gate, Chichester, West Sussex PO19 8SQ, England, 57-59 (2007). [25] Thomas Young, “Experimental Demonstration of the General Law of the Interference of Light”, Philosophical Transactions of the Royal Society of London 94, (1804) [26] Frank Staals, Alena Andryzhyieuskaya, Hans Bakker, Marcel Beems, Jo Finders, Thijs Hollink, Jan Mulkens, Angelique Nachtwein, Rob Willekers, Peter Engblom, Toralf Gruner and Youping Zhang, 'Advanced wavefront engineering for improved imaging and overlay applications on a 1.35 NA immersion scanner', Proc. SPIE 7973, 79731G (2011) | |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/63663 | - |
| dc.description.abstract | Optical scatterometry is crucial to advanced nodes due to its ability of non-destructively and rapidly retrieving accurate 3D profile information. In recent years, an angle-resolved polarized reflectometry-based scatterometry which can measure critical dimensions, overlay, and focus in single shot has been developed. In principle, a microscope objective collects diffracted light, and pupil images are collected by a detector. For its application of calibrating lithography models, the pupil images are fit to a database pre-characterized usually by rigorous electromagnetic simulation to estimate dimensional parameters of developed resist profiles. The estimated dimensional parameters can then be used for lithography model calibration. In this work, we propose a new method to calibrate lithography models without needing dimensional parameter estimation. This method can be used to calibrate both rigorous physical models for process and equipment development and monitoring, and fast kernel-based models for full-chip proximity effect simulation and correction. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-16T17:15:55Z (GMT). No. of bitstreams: 1 ntu-101-P99921004-1.pdf: 3210801 bytes, checksum: 6cac27f131f2ed4274b9e104e3c3d81a (MD5) Previous issue date: 2012 | en |
| dc.description.tableofcontents | Acknowledgements I
Abstract II 摘要 IV Statement of Contributions V Table of Contents VI List of Tables VII List of Figures VIII Chapter 1 Introduction 1 Chapter 2 Diffraction and coherence of optical systems 4 Chapter 3 Methodology 8 Chapter 4 Calibration and Validation of DSE-LMC 14 Chapter 5 Conclusions and future works 27 References 28 | |
| dc.language.iso | en | |
| dc.subject | 微影 | zh_TW |
| dc.subject | 散射術 | zh_TW |
| dc.subject | 瞳像 | zh_TW |
| dc.subject | 鄰近效應 | zh_TW |
| dc.subject | 程序模型校正 | zh_TW |
| dc.subject | pupil image | en |
| dc.subject | process model calibration | en |
| dc.subject | proximity effect | en |
| dc.subject | lithography | en |
| dc.subject | scatterometry | en |
| dc.title | 直接散射術微影模型校正 | zh_TW |
| dc.title | Direct-Scatterometry-Enabled Lithography Model Calibration | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 100-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 李佳翰(Jia-Han Li),陳繼恆(Alek C. Chen) | |
| dc.subject.keyword | 微影,散射術,瞳像,程序模型校正,鄰近效應, | zh_TW |
| dc.subject.keyword | lithography,scatterometry,pupil image,process model calibration,proximity effect, | en |
| dc.relation.page | 37 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2012-08-19 | |
| dc.contributor.author-college | 電機資訊學院 | zh_TW |
| dc.contributor.author-dept | 電機工程學研究所 | zh_TW |
| 顯示於系所單位： | 電機工程學系 | |
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