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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 張陸滿(Luh-Maan Chang) | |
| dc.contributor.author | Tzu-Sou Chuang | en |
| dc.contributor.author | 莊子壽 | zh_TW |
| dc.date.accessioned | 2021-06-16T16:14:15Z | - |
| dc.date.available | 2013-03-15 | |
| dc.date.copyright | 2013-03-15 | |
| dc.date.issued | 2013 | |
| dc.date.submitted | 2013-02-07 | |
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| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/62901 | - |
| dc.description.abstract | 氣懸分子污染物 (AMC) 指的是空氣中分子型態的污染物質，這些污染物質以氣體或蒸氣等形式存在，並且能夠穿透潔淨室中傳統的高效率微粒空氣濾網，對製程良率產生全面性的衝擊。以半導體晶圓廠為例，潔淨室中 AMC 的主要來源包括：潔淨室內的工作人員、設備或維修使用的化學品、管線的異常洩漏或排放、工程材料釋放的微量氣體、和從外氣帶進來的各種污染物質。
當半導體製程進展到奈米技術以後，「氣懸分子污染」對製程之危害已經超越「氣懸微粒污染」問題，成為奈米技術研發及奈米製程環境控制的首要難題。為了完全控制高科技廠房潔淨室之 AMC 問題，本研究提出以「超純氣 (UPA) 系統」取代現有潔淨室空氣淨化系統的解決方案，最終的目標在建構可以達到 10 ppt 潔淨等級的 UPA 系統，提供奈米技術研發和奈米製程所需要的微污染控制環境，期望完全解決高科技研發及製程環境所面臨的 AMC 問題。 UPA 系統的概念是整合超純水 (UPW) 製程和微型潔淨環境的創新構想，由於空氣和水都是典型的流體。所以 UPA 系統的原始模型嘗試引用 UPW 系統的超純水處理流程，將空氣中的污染物質類比為水中的污染物質，模擬不同污染物質在水處理系統中的反應機制，以類似超純水處理的流程，將空氣中的污染物質分為三個程序、分段去除，以達到超純淨等級的 UPA。最後；再將 UPA 以高純淨管線輸送到微型潔淨環境提供製程設備使用。 UPA 系統規劃由三個模組所構成，針對空氣中較難去除的可凝結矽化合物或碳氫化合物，以下列三個程序分段處理：(1). 首先讓氣懸分子污染物流經充滿氣膠水霧的空間，然後以UV185+254nm 提供的能量將部分污染物直接轉換為水或二氧化碳，或是將部分污染物的化學鍵結打斷，重新和氫氧自由基結合而形成親水性物質。(2). 經過前項光氧化反應後的殘餘親水性污染物接著進入第二階段的壓縮及冷凝製程，利用氣膠的成核、凝結、和成長的過程，使這些微量的氣懸分子污染物在壓縮空氣的環境中增加和液滴氣膠碰撞的機率而成長為小水滴，然後再利用除濕裝置去除空氣中的小水滴。冷凝的過程中，可溶於水的氣懸分子污染物也將隨著冷凝水的排放而一併自空氣中移除。(3). 最後那些無法經由上述兩個階段處理的微量氣懸分子污染物，則可以選擇合適的分子篩及終端過濾器去除。 另外在應用的構想上，UPA 產品是以專用的高純淨管線直接供應到微型潔淨環境給製程設備使用，這樣的方法完全排除 UPA 和潔淨室空氣接觸而受到污染的機會，因此可以為奈米技術研發及製程環境提供穩定的超高品質空氣。 本研究目前已經完成 UPA 前處理及後處理系統的驗證實驗，依據 29 次重複實驗的結果顯示：UPA 系統可以在 8 秒內，將二甲苯 (xylene) 由187 ppb 降低至 0.1 ppb，這個結果在幾乎無統計誤差的情況下，其 (xylene) 去除效率達 99.97%。 | zh_TW |
| dc.description.abstract | As semiconductor processes advance into the nano-technology era, Airborne Molecular Contamination (AMC) has become a major problem in nano-technology development and manufacturing facilities. To deal with this problem, a prototype Ultra-Pure Air (UPA) system with a targeted air quality impurity level of 10 ppt was experimentally developed.
The prototype UPA system presently comprises two process modules; pre-treatment and post-treatment. In order to deal with hard-to-remove organic molecular substances within the air, UV185+254nm is used in the pre-treatment module to provide the energy required to reduce the molecules into broken-up pieces of transitional compounds. Aerosol water droplets are introduced at the same time, combining with transitional compounds to form hydrophilic substances. After the “immersing photochemical oxidation” reaction, the hydrophilic contaminants go through the compression and condensation processes which make up the post-treatment module. During the air compression and condensation processes, the collision probability of the aerosols is highly increased between the contaminants and water droplets. Later, a dehumidification process removes the water droplets from within the condensed air; at this point, the contaminants have dissolved in the water and so they are removed at the same time. These pre-treatment and post-treatment processes yield air quality levels of less than 1 ppb of volatile organic compound, the minimum detection limit for a measuring analyzer. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-16T16:14:15Z (GMT). No. of bitstreams: 1 ntu-102-D96521028-1.pdf: 5171951 bytes, checksum: 57f0446e8bffb3c6e553dbd9219db085 (MD5) Previous issue date: 2013 | en |
| dc.description.tableofcontents | 口試委員會審定書 ... i
誌謝 ... ii ABSTRACT ... iii 中文摘要 ... iv TABLE OF CONTENTS ... vi LIST OF FIGURES ... ix LIST OF TABLES ... xii CHAPTER 1: INTRODUCTION ... 1 1.1 AMC AND CHEMICAL FILTERS ... 4 1.2 RESEARCH OBJECTIVES ... 11 1.3 RESEARCH APPROACH ... 12 1.4 ORGANIZATION OF THIS DISSERTATION ... 14 1.5 SUMMARY ... 15 CHAPTER 2: RESEARCH BACKGROUND ... 17 2.1 AMC STANDARDS AND CONTROL REQUIREMENTS ... 18 2.2 AIR QUALITY STANDARDS ... 24 2.3 INDOOR CONTAMINATION EVALUATION MODEL ... 28 2.4 UPA HYPOTHESIS ... 35 2.5 AMBIENT AIR QUALITY SURVEY ... 37 2.6 CLEAN AIR STRATEGIES ... 39 2.7 UPA SYSTEM CONFIGURATION ... 45 CHAPTER 3: UPA METHODOLOGY ... 47 3.1 UPA PRE-TREATMENT MODULE ... 48 3.2 UPA POST-TREATMENT MODULE ... 52 3.3 UPA POLISH MODULE ... 55 3.4 SUMMARY OF UPA METHODOLOGY ... 59 CHAPTER 4: PRELIMINARY STUDIES AND FINDINGS ... 61 4.1 EARLY STAGE FINDINGS ... 63 4.2 PRELIMINARY STUDY – ROUND 1&2 ... 67 4.3 PRELIMINARY STUDY – ROUND 3&4 ... 69 4.4 PRELIMINARY STUDY – ROUND 5 ... 71 4.5 SUMMARY ... 73 CHAPTER 5: PRE-TREATMENT EXPERIMENTS ... 77 5.1 EXPERIMENT APPARATUS AND PROCESSES ... 78 5.2 EXPERIMENT CONDITIONS ... 81 5.3 RESULTS OF iUV EXPERIMENTS ... 83 5.4 SUMMARY ... 88 CHAPTER 6: PRE AND POST-TREATMENT EXPERIMENTS ... 89 6.1 SETUP OF EXPERIMENT EQUIPMENT ... 90 6.2 CHEMICAL MEASURED AND ITS WATER SOLUBILITY ... 93 6.3 RESULTS OF BASELINE EXAMINATION ... 95 6.4 RESULTS OF XYLENE EXPERIMENTS ... 97 6.5 SUMMARY ... 103 CHAPTER 7: CONCLUSIONS AND RECOMMENDATIONS ... 105 7.1 CONCLUSIONS ... 106 7.2 CONTRIBUTIONS ... 107 7.3 LIMITATIONS ... 108 7.4 RECOMMENDATIONS ... 109 REFERCNCES ... 113 APPENDICES ... 121 | |
| dc.language.iso | en | |
| dc.title | 奈米製程研發暨製造環境之超純氣系統研究 | zh_TW |
| dc.title | Ultra-Pure Air (UPA) System Research for Nano-Processing Environments | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 101-1 | |
| dc.description.degree | 博士 | |
| dc.contributor.oralexamcommittee | 郭斯傑(Sy-Jye Guo),曾惠斌(Hui-Ping Tserng),陳柏翰(Po-Han Chen),王維志(Wei-Chih Wang),胡石政(Shih-Cheng Hu) | |
| dc.subject.keyword | 奈米技術,氣懸分子污染,超純氣,光化學氧化,微型潔淨環境, | zh_TW |
| dc.subject.keyword | AMC,nano-technology,UPA,ultra-pure air,immersing photochemical oxidation, | en |
| dc.relation.page | 133 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2013-02-07 | |
| dc.contributor.author-college | 工學院 | zh_TW |
| dc.contributor.author-dept | 土木工程學研究所 | zh_TW |
| 顯示於系所單位： | 土木工程學系 | |
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