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http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/52317完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 藍崇文(Chung-Wen Lan) | |
| dc.contributor.author | Chin-Chun Chen | en |
| dc.contributor.author | 陳治均 | zh_TW |
| dc.date.accessioned | 2021-06-15T16:11:44Z | - |
| dc.date.available | 2020-08-20 | |
| dc.date.copyright | 2015-08-20 | |
| dc.date.issued | 2015 | |
| dc.date.submitted | 2015-08-18 | |
| dc.identifier.citation | [1] EPIA,Global Market Outlook for Photovoltaics 2014-2018, (2014).
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Yoshida, Crystallization on dipped substrate wafer technology for crystalline silicon solar cells reduces wafer costs. Photovoltaic International (2008). [24]T.F. Ciszek, Photovoltaic materials and crystal growth research and development in the Gigawatt era. Journal of Crystal Growth, 393, 2-6 (2014). [25]W.G. Pfann, Zone melting, Wiley, New York, London, Sydney, (1966). [26]A. Vallêra, J. Serra, J.M. Alves, M. Brito, R. Gamboa, J. Henriques, U.S. Patent No. 7,799,131. Washington, DC: U.S. Patent and Trademark Office (2010). [27]S. Kimura, K. Terashima, A review of measurement of thermophysical properties of silicon melt. Journal of crystal growth, 180(3), 323-333 (1997). [28] D.M. Pera, Linear electric molten zone stimulated by laser, 7th International Workshop on Crystalline Silicon Solar Cells (CSSC7) Oct. 22-25, 2013, Fukuoka, Japan, (2013). [29]F.S. Daragona, Dislocation etch for (100) planes in silicon. Journal of the Electrochemical Society, 119(7), 948-951 (1972). [30]J. Chen, B. Chen, T. Sekiguchi, M. Fukuzawa, and M. Yamada, Correlation between residual strain and electrically active grain boundaries in multicrystalline silicon. Applied Physics Letters, 93(11), 112105 (2008). [31]H.Y. Wang, N. Usami, K. Fujiwara, K. Kutsukake, K. Nakajima, Microstructures of Si multicrystals and their impact on minority carrier diffusion length. Acta Materialia, 57(11), 3268-3276 (2009). [32]M. Trempaa, C. Reimann, J. Friedrich, G. Müller, D. Oriwol, Mono-crystalline growth in directional solidification of silicon with different orientation and splitting of seed crystals. Journal of Crystal Growth, 351(1), 131-140 (2012). [33]K. Fujiwara, Y. Obinata, T. Ujihara, N. Usami, G. Sazaki, K. Nakajima, Grain growth behaviors of polycrystalline silicon during melt growth processes. Journal of crystal growth, 266(4), 441-448 (2004). [34]H.A. Atwater, C.V. Thompson, and H.I. Smith, Mechanisms for crystallographic orientation in the crystallization of thin silicon films from the melt. Journal of Materials Research, 3(06), 1232-1237 (1988). [35]T. Duffar, and A. Nadri, The grain–grain–liquid triple phase line during solidification of multi-crystalline silicon. Comptes Rendus Physique, 14(2), 185-191 (2013). [36]T. Duffar, C.T. Nwosu, I.M. Asuo, J. Muzy, N.D.Q. Chau, Y. Du Terrail-Couvat, F. Robaut, Experimental study of grain boundary orientations in multi-crystalline silicon. Journal of Crystal Growth, 401, 404-408 (2014). [37]T. Duffar, and A. Nadri, On the twinning occurrence in bulk semiconductor crystal growth. Scripta Materialia, 62(12), 955-960 (2010). [38]K. Fujiwara, K. Maeda, N. Usami, and K. Nakajima, Fujiwara, K., Maeda, K., Usami, N., & Nakajima, K. (2008). Growth mechanism of Si-faceted dendrites. Physical review letters, 101(5), 055503 (2008). [39] A. Frary, and C.A. Schuh, Combination rule for deviant CSL grain boundaries at triple junctions. Acta materialia, 51(13), 3731-3743 (2003). [40]K. Fujiwara, W. Pan, N. Usami, K. Sawada, M. Tokairin, Y. Nose, A. Nomura, T. Shishido, K. Nakajima, Growth of structure-controlled polycrystalline silicon ingots for solar cells by casting. Acta Materialia, 54(12), 3191-3197 (2006). [41]Y.T. Wong, C. Hsu, and C.W. Lan, Development of grain structures of multi-crystalline silicon from randomly orientated seeds in directional solidification. Journal of Crystal Growth, 387, 10-15 (2014). [42] F. Wilhelm, The orientation of high-order growth twins in diamond-type crystals. Journal of Applied Crystallography, 4(6), 521-523 (1971). [43] R.R. Prakash, K. Jiptner, J. Chen, Y. Miyamura, H. Harada, and T. Sekiguchi, Grain boundary interactions in multicrystalline silicon grown from small randomly oriented seeds. Applied Physics Express, 8(3), 035502 (2015). [44] K. Fujiwara, W. Pan, N. Usami, K. Sawada, A. Nomura, T. 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Shin, Multi-scale modeling of solidification and microstructure development in laser keyhole welding process for austenitic stainless steel. Computational Materials Science, 98, 446-458 (2015). [50] V. Randle, Twinning-related grain boundary engineering. Acta materialia, 52(14), 4067-4081 (2004). [51]D.T. Hurle (Ed.), Handbook of Cryst. Growth, Vol. 2b, North-Holland, Amsterdam, 1994, p. 813. [52] F.A. Trumbore, Solid solubilities of impurity elements in germanium and silicon*. Bell System Technical Journal, 39(1), 205-233 (1960). [53]H.J. Scheel and P. Capper, Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production . 2001: John Wiley & Sons. [54]R.W. Powell, and F.H. Schofield, The thermal and electrical conductivities of carbon and graphite to high temperatures. Proceedings of the physical society, 51(1), 153 (1939). [55]R.W. Keyes, The Electrical Conductivity of Liquid Germanium.Physical Review, 84(2), 367 (1951). [56]C.J. Glassbrenner, and G.A. Slack, Thermal conductivity of silicon and germanium from 3 K to the melting point. Physical Review, 134(4A), A1058 (1964). | |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/52317 | - |
| dc.description.abstract | 晶體結構的發展對於太陽能多晶矽的光電性質是影響的關鍵,尤其是晶界的種類。本篇論文為了研究晶體結構的發展,以不同遷移速度(2-6 mm/min)下進行細晶片的電區熔長晶。並發現在低遷移速度時,<111>方向為主導晶向,在高遷移速度時<112>方向為主導晶向。其中,大部分的non-∑晶界傾向沿著溫梯方向生長,但有少數會沿著降低界面能的方向生長。換言之,除了高遷移速度之外,斜的∑3晶界因晶粒競爭的關係而減少。若晶粒均被∑晶界分開,其競爭情況可看成晶界間的互相作用,兩個∑3n晶界行成的晶界也為∑3n晶界,會遵守特定的關係。換言之,當∑晶界碰到non-∑晶界,而non-∑晶界會被保留下來,這也解釋了在低遷移速度時∑晶界會逐漸減少。
最近,Nakajima提出具有為小的阻成分布的多晶矽鍺來當作新的光電材料,吾人也以不同鍺摻雜濃度(0-12.46 at.%)下進行細晶片的電區熔長晶。並發現在低遷移速度時,<111>方向仍為主導晶向 | zh_TW |
| dc.description.abstract | The evolution of grain structures, especially the types of grain boundaries (GBs), during directional solidification is crucial to the electrical properties of multicrystalline silicon used for solar cells. To study this, the electric molten zone crystallization (EMZC) of silicon wafers at different drift speeds from 2 to 6 mm/min was considered. It was found that <111> orientation was dominant at the lower drift velocity, while <112> orientation at the higher drift velocity. Most of the non-∑GBs tended to aligned with the thermal gradient, but some tilted toward the unfavorable grains having higher interfacial energies. On the other hand, the tilted ∑3 GBs tended to decrease during grain competition, except at the higher speed, where the twin nucleation became frequent. The competition of grains separated by ∑GBs could be viewed as the interactions of GBs that two coherent ∑3n GBs turned into one ∑3n GB following certain relations as reported before. On the other hand, when ∑ GBs met non-∑ GBs, non-∑ GBs remained which explained the decrease of ∑ GBs at the lower speed.
Nakajima et al. has recently proposed multicrystalline SiGe with microscopic compositional distribution as a novel annual photovoltaic material. We also studyed the evolution of grain structures of multicrystalline SiGe at different Ge concentration from 0 to 12.45 at. % was considered. It was found that <111> orientation still was dominant at high Ge concentration. Nakajima et al. has recently proposed multicrystalline SiGe with microscopic compositional distribution as a novel annual photovoltaic material. We also studyed the evolution of grain structures of multicrystalline SiGe at different Ge concentration from 0 to 12.45 at. % was considered. It was found that <111> orientation still was dominant at high Ge concentration. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-15T16:11:44Z (GMT). No. of bitstreams: 1 ntu-104-R02524084-1.pdf: 6955660 bytes, checksum: 64fe9e5e0fc8c30d64c588ce84c83794 (MD5) Previous issue date: 2015 | en |
| dc.description.tableofcontents | 致謝 i
中文摘要 ii Abstract iii 目錄 iv 圖目錄 vi 表目錄 xi 第一章 緒論 1 1-1前言 1 第二章文獻回顧 4 2-1無切割矽晶帶製造技術 4 2-1-1矽晶帶製造技術分類 4 2-1-2主流無切割矽晶帶製造技術 4 2-1-2-1限邊薄片續填生長法(Edge-Defined Film-Fed Growth) 4 2-1-2-2線牽引矽帶生長法(String Ribbon) 5 2-1-2-3矽帶於基板之生長法(Ribbon Growth on Substrate) 6 2-1-2-4基板浸潤結晶生長法(Crystallization on Dipped Substrate) 7 2-1-3 目前矽晶帶的發展與問題 8 2-2 電區熔法 9 2-2-1電區熔法原理 9 2-1-2電區熔法實驗 10 2-3 晶界控制 13 2-3-1 太陽能多晶矽中晶界的特性 13 2-3-2 太陽能多晶矽中的孿生晶界的機制 15 2-3-3 太陽能多晶矽中的晶粒競爭機制 16 2-3-4太陽能多晶矽中晶界的作用及發展 19 2-3-5 摻雜鍺對於多晶矽的晶體結構之影響 21 第三章實驗藥品、設備和流程 23 3-1實驗藥品 23 3-1-1 矽晶生長使用藥品 23 3-1-2 矽晶化學處理藥品 24 3-1-3 矽晶清洗處理藥品 25 3-2實驗設備系統 26 3-2-1 可視化電區熔系統 26 3-2-2 電區熔生長前後處設備 27 3-3實驗規劃 34 3-3-1多晶矽片的生長及觀測實驗 34 3-3-2多晶矽片摻雜鍺的生長及觀測實驗 34 3-3-3多晶矽片摻雜顆粒的生長及觀測實驗 35 第四章結果與討論 36 4-1多晶矽片的生長及觀測實驗 36 4-1-1 晶體結構分析 36 4-1-2 晶向分析 37 4-1-3 晶界分析 40 4-1-4晶粒競爭 43 4-1-5晶界的互相作用 44 4-1-5應力釋放 47 4-2多晶矽鍺的生長及觀測實驗 50 4-2-1鍺濃度分布 50 4-2-2晶體結構分析 51 4-2-3晶向分析 53 4-2-4晶界分析 55 4-2-5界面移動 57 4-3多晶矽片摻雜顆粒的生長及觀測實驗 58 第五章結論 61 參考文獻 62 | |
| dc.language.iso | zh-TW | |
| dc.subject | 界面型態觀察 | zh_TW |
| dc.subject | 電區熔長晶 | zh_TW |
| dc.subject | 晶粒競爭 | zh_TW |
| dc.subject | 矽鍺合金 | zh_TW |
| dc.subject | grain competition | en |
| dc.subject | morphology observation of interface | en |
| dc.subject | silicon-germanium alloy | en |
| dc.subject | electric molten zone | en |
| dc.title | 電區熔生長矽及矽鍺合金之晶粒發展與界面型態觀察研究 | zh_TW |
| dc.title | Evolution of Grain Structures and Morphological Observation of Crystal-Melt Interface during Electric Molten Zone Crystallization of Silicon and Silicon-Germanium Alloy Wafers | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 103-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 何國川(Kuo-Chuan Ho),高振宏(Chengheng-Robert Kao),王丞浩(Chen-Hao Wang) | |
| dc.subject.keyword | 電區熔長晶,晶粒競爭,矽鍺合金,界面型態觀察, | zh_TW |
| dc.subject.keyword | electric molten zone,grain competition,silicon-germanium alloy,morphology observation of interface, | en |
| dc.relation.page | 75 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2015-08-18 | |
| dc.contributor.author-college | 工學院 | zh_TW |
| dc.contributor.author-dept | 化學工程學研究所 | zh_TW |
| 顯示於系所單位: | 化學工程學系 | |
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