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請用此 Handle URI 來引用此文件: http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/52317
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dc.contributor.advisor藍崇文(Chung-Wen Lan)
dc.contributor.authorChin-Chun Chenen
dc.contributor.author陳治均zh_TW
dc.date.accessioned2021-06-15T16:11:44Z-
dc.date.available2020-08-20
dc.date.copyright2015-08-20
dc.date.issued2015
dc.date.submitted2015-08-18
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[32]M. Trempaa, C. Reimann, J. Friedrich, G. Müller, D. Oriwol, Mono-crystalline growth in directional solidification of silicon with different orientation and splitting of seed crystals. Journal of Crystal Growth, 351(1), 131-140 (2012).
[33]K. Fujiwara, Y. Obinata, T. Ujihara, N. Usami, G. Sazaki, K. Nakajima, Grain growth behaviors of polycrystalline silicon during melt growth processes. Journal of crystal growth, 266(4), 441-448 (2004).
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[44] K. Fujiwara, W. Pan, N. Usami, K. Sawada, A. Nomura, T. Ujihara, T. Shishido, K. Nakajima, Structural properties of directionally grown polycrystalline SiGe for solar cells. Journal of crystal growth, 275(3), 467-473 (2005).
[45]M.C. Wu, C.F. Yang, and C.W. Lan, Minority lifetime degradation of silicon wafers after electric zone melting. Journal of Crystal Growth, 420, 74-79 (2015).
[46]Y.M. Yang, A. Yu1, B. Hsu1, W.C. Hsu1, A. Yang, and C.W. Lan, Development of high‐performance multicrystalline silicon for photovoltaic industry. Progress in Photovoltaics: Research and Applications (2013).
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dc.identifier.urihttp://tdr.lib.ntu.edu.tw/jspui/handle/123456789/52317-
dc.description.abstract晶體結構的發展對於太陽能多晶矽的光電性質是影響的關鍵,尤其是晶界的種類。本篇論文為了研究晶體結構的發展,以不同遷移速度(2-6 mm/min)下進行細晶片的電區熔長晶。並發現在低遷移速度時,<111>方向為主導晶向,在高遷移速度時<112>方向為主導晶向。其中,大部分的non-∑晶界傾向沿著溫梯方向生長,但有少數會沿著降低界面能的方向生長。換言之,除了高遷移速度之外,斜的∑3晶界因晶粒競爭的關係而減少。若晶粒均被∑晶界分開,其競爭情況可看成晶界間的互相作用,兩個∑3n晶界行成的晶界也為∑3n晶界,會遵守特定的關係。換言之,當∑晶界碰到non-∑晶界,而non-∑晶界會被保留下來,這也解釋了在低遷移速度時∑晶界會逐漸減少。
  最近,Nakajima提出具有為小的阻成分布的多晶矽鍺來當作新的光電材料,吾人也以不同鍺摻雜濃度(0-12.46 at.%)下進行細晶片的電區熔長晶。並發現在低遷移速度時,<111>方向仍為主導晶向
zh_TW
dc.description.abstractThe evolution of grain structures, especially the types of grain boundaries (GBs), during directional solidification is crucial to the electrical properties of multicrystalline silicon used for solar cells. To study this, the electric molten zone crystallization (EMZC) of silicon wafers at different drift speeds from 2 to 6 mm/min was considered. It was found that <111> orientation was dominant at the lower drift velocity, while <112> orientation at the higher drift velocity. Most of the non-∑GBs tended to aligned with the thermal gradient, but some tilted toward the unfavorable grains having higher interfacial energies. On the other hand, the tilted ∑3 GBs tended to decrease during grain competition, except at the higher speed, where the twin nucleation became frequent. The competition of grains separated by ∑GBs could be viewed as the interactions of GBs that two coherent ∑3n GBs turned into one ∑3n GB following certain relations as reported before. On the other hand, when ∑ GBs met non-∑ GBs, non-∑ GBs remained which explained the decrease of ∑ GBs at the lower speed.
Nakajima et al. has recently proposed multicrystalline SiGe with microscopic compositional distribution as a novel annual photovoltaic material. We also studyed the evolution of grain structures of multicrystalline SiGe at different Ge concentration from 0 to 12.45 at. % was considered. It was found that <111> orientation still was dominant at high Ge concentration.
Nakajima et al. has recently proposed multicrystalline SiGe with microscopic compositional distribution as a novel annual photovoltaic material. We also studyed the evolution of grain structures of multicrystalline SiGe at different Ge concentration from 0 to 12.45 at. % was considered. It was found that <111> orientation still was dominant at high Ge concentration.
en
dc.description.provenanceMade available in DSpace on 2021-06-15T16:11:44Z (GMT). No. of bitstreams: 1
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Previous issue date: 2015
en
dc.description.tableofcontents致謝 i
中文摘要 ii
Abstract iii
目錄 iv
圖目錄 vi
表目錄 xi
第一章 緒論 1
1-1前言 1
第二章文獻回顧 4
2-1無切割矽晶帶製造技術 4
2-1-1矽晶帶製造技術分類 4
2-1-2主流無切割矽晶帶製造技術 4
2-1-2-1限邊薄片續填生長法(Edge-Defined Film-Fed Growth) 4
2-1-2-2線牽引矽帶生長法(String Ribbon) 5
2-1-2-3矽帶於基板之生長法(Ribbon Growth on Substrate) 6
2-1-2-4基板浸潤結晶生長法(Crystallization on Dipped Substrate) 7
2-1-3 目前矽晶帶的發展與問題 8
2-2 電區熔法 9
2-2-1電區熔法原理 9
2-1-2電區熔法實驗 10
2-3 晶界控制 13
2-3-1 太陽能多晶矽中晶界的特性 13
2-3-2 太陽能多晶矽中的孿生晶界的機制 15
2-3-3 太陽能多晶矽中的晶粒競爭機制 16
2-3-4太陽能多晶矽中晶界的作用及發展 19
2-3-5 摻雜鍺對於多晶矽的晶體結構之影響 21
第三章實驗藥品、設備和流程 23
3-1實驗藥品 23
3-1-1 矽晶生長使用藥品 23
3-1-2 矽晶化學處理藥品 24
3-1-3 矽晶清洗處理藥品 25
3-2實驗設備系統 26
3-2-1 可視化電區熔系統 26
3-2-2 電區熔生長前後處設備 27
3-3實驗規劃 34
3-3-1多晶矽片的生長及觀測實驗 34
3-3-2多晶矽片摻雜鍺的生長及觀測實驗 34
3-3-3多晶矽片摻雜顆粒的生長及觀測實驗 35
第四章結果與討論 36
4-1多晶矽片的生長及觀測實驗 36
4-1-1 晶體結構分析 36
4-1-2 晶向分析 37
4-1-3 晶界分析 40
4-1-4晶粒競爭 43
4-1-5晶界的互相作用 44
4-1-5應力釋放 47
4-2多晶矽鍺的生長及觀測實驗 50
4-2-1鍺濃度分布 50
4-2-2晶體結構分析 51
4-2-3晶向分析 53
4-2-4晶界分析 55
4-2-5界面移動 57
4-3多晶矽片摻雜顆粒的生長及觀測實驗 58
第五章結論 61
參考文獻 62
dc.language.isozh-TW
dc.subject界面型態觀察zh_TW
dc.subject電區熔長晶zh_TW
dc.subject晶粒競爭zh_TW
dc.subject矽鍺合金zh_TW
dc.subjectgrain competitionen
dc.subjectmorphology observation of interfaceen
dc.subjectsilicon-germanium alloyen
dc.subjectelectric molten zoneen
dc.title電區熔生長矽及矽鍺合金之晶粒發展與界面型態觀察研究zh_TW
dc.titleEvolution of Grain Structures and Morphological Observation of Crystal-Melt Interface during Electric Molten Zone Crystallization of Silicon and Silicon-Germanium Alloy Wafersen
dc.typeThesis
dc.date.schoolyear103-2
dc.description.degree碩士
dc.contributor.oralexamcommittee何國川(Kuo-Chuan Ho),高振宏(Chengheng-Robert Kao),王丞浩(Chen-Hao Wang)
dc.subject.keyword電區熔長晶,晶粒競爭,矽鍺合金,界面型態觀察,zh_TW
dc.subject.keywordelectric molten zone,grain competition,silicon-germanium alloy,morphology observation of interface,en
dc.relation.page75
dc.rights.note有償授權
dc.date.accepted2015-08-18
dc.contributor.author-college工學院zh_TW
dc.contributor.author-dept化學工程學研究所zh_TW
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