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  1. NTU Theses and Dissertations Repository
  2. 理學院
  3. 應用物理研究所
請用此 Handle URI 來引用此文件: http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/50036
完整後設資料紀錄
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dc.contributor.advisor陳永芳(Yang-Fang Chen)
dc.contributor.authorHung-Yuan Wangen
dc.contributor.author王鴻淵zh_TW
dc.date.accessioned2021-06-15T12:28:18Z-
dc.date.available2019-10-14
dc.date.copyright2016-10-14
dc.date.issued2016
dc.date.submitted2016-08-08
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dc.identifier.urihttp://tdr.lib.ntu.edu.tw/jspui/handle/123456789/50036-
dc.description.abstract本論文中,我們展示了調控由單層二硫化鉬覆蓋之掌性結構產生之圓偏振光的可能性。標準電子束微影技術以及乾蝕刻技術被用於在氮化鎵上定義出左手及右手性螺旋狀掌性結構。高達1.2的不對稱因子可以藉由線性偏振激發光測得,這個結果在過去的研究中是很難實現的。為了取得高度的圓偏振發光,帶有二硫化鉬的樣品必須被圓偏振光激發。與由鎘化硒量子點和氮化鎵測得之微小不對稱因子比較,由單層二硫化鉬測得之高度不對稱因子可以歸因於其獨特的能帶結構,而這樣的能帶結構源自於存在單層過渡金屬二硫族化合物(transition metal dichalcogenide)中的反轉對稱破缺(inversion symmetry breaking)及自旋軌道耦合(spin-orbit coupling)引起的谷旋閉鎖效應(spin-valley locking)。
可以肯定是,我們在此所呈現的結果可以為製作小尺度與超薄圓偏振光源奠定重要的基礎。
zh_TW
dc.description.abstractIn this thesis, we demonstrate the possibility to control circularly polarized emission arising from monolayer MoS2 covering on chirality structures. Standard E-beam lithography and dry etching techniques were used to define the patterns of left-chiral and right-chiral spiral structures on GaN substrate. A dissymmetry factor as high as 1.2 can be obtained with a linear polarized pumping source, which is quite difficult from all the results ever reported. In order to obtain high degree of circularly polarization of emission, the MoS2 samples have to be pumped by circularly polarized light beam. Compared with the very small dissymmetry factor from CdSe quantum dots and GaN, the large dissymmetry factor of monolayer MoS2 can be attributed to the unique band structure which is due to the spin-valley locking caused by inversion symmetry breaking and spin-orbit coupling in transition metal dichalcogenide monolayers.
It is believed that our work shown here can pave a key step to build a compact and ultra-thin circularly polarized light source.
en
dc.description.provenanceMade available in DSpace on 2021-06-15T12:28:18Z (GMT). No. of bitstreams: 1
ntu-105-R03245003-1.pdf: 4229524 bytes, checksum: aa1c52178c84ce806fc5fb11e0c4da90 (MD5)
Previous issue date: 2016
en
dc.description.tableofcontents口試委員會審定書.............................................................................#
Acknowledgement i
摘要 ii
Abstract iii
目 錄 iv
List of Figures vi
List of Tables ix
Chapter 1 Introduction 1
1.1 Background 1
1.2 Motivation 8
Chapter 2 Experiment Instruments 9
2.1 Electron Beam Lithography and Scanning Electron Microscopy 9
2.2 Dry Etching Process 11
2.3 Micro-Photoluminescence (μ-PL) System Measurement System 12
2.4 μ-PL Circular Polarization Measurement 15
Chapter 3 Samples Fabrication and Characteristics 17
3.1 Sample Design 17
3.2 Sample Fabrication 19
3.3 Material Characteristics 24
Chapter 4 Experiment Results and Discussion 29
4.1 Single Layer MoS2-covered Single Spiral GaN Cavity 29
4.2 Single Layer MoS2-covered Double Spiral GaN Cavity 34
4.3 CdSe Quantum Dots Embedded GaN Single Spiral Cavity 39
4.4 CdSe Quantum Dots Embedded GaN Double Spiral Cavity 41
4.5 GaN Single Spiral Cavity 44
4.6 GaN Double Spiral Cavity 45
Chapter 5 Conclusion 48
5.1 Conclusion 48
5.2 Future Works 50
Reference 51
dc.language.isoen
dc.subject光致螢光zh_TW
dc.subject螺旋狀結構zh_TW
dc.subject圓偏振光zh_TW
dc.subject單層二硫化鉬zh_TW
dc.subject掌性zh_TW
dc.subjectcircular polarizationen
dc.subjectphotoluminescenceen
dc.subjectspiral structureen
dc.subjectsingle-layer MoS2en
dc.subjectchiralityen
dc.title旋光結構調控單層二硫化鉬圓偏振螢光zh_TW
dc.titleControl of Circularly Polarized Emission from Monolayer MoS2 by Chirality Structuresen
dc.typeThesis
dc.date.schoolyear104-2
dc.description.degree碩士
dc.contributor.oralexamcommittee林泰源(Tai-Yuan Lin),許芳琪(Fang-Chi Hsu)
dc.subject.keyword掌性,單層二硫化鉬,圓偏振光,螺旋狀結構,光致螢光,zh_TW
dc.subject.keywordchirality,single-layer MoS2,circular polarization,spiral structure,photoluminescence,en
dc.relation.page53
dc.identifier.doi10.6342/NTU201601568
dc.rights.note有償授權
dc.date.accepted2016-08-08
dc.contributor.author-college理學院zh_TW
dc.contributor.author-dept應用物理研究所zh_TW
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