常壓PECVD系統氣流場與電漿含前驅物硝酸鋅反應之模擬研究

Abstract

本文建立數值模型以分析PECVD製程中鍍膜區域流場結構變化以及噴頭內部電漿反應，包含許多物質且相互產生不同的化學反應，利用商用套裝軟體COMSOL Multiphysics5.2進行數值模型，使用紊流模型、熱傳模型、化學模型三種模型耦合進行計算。 首先常壓電漿外部流場模型可了解受氣流結構影響後的物種分布，並且應用於設計線型常壓電漿的抽氣系統。由常壓氮氣電漿噴流下游模型進行數值模擬，此模擬結果與實驗相符，皆在間距1 mm時放光強度突增，證明此熱流場模型耦合化學模型可用來模擬氮氣電漿反應。最後以電漿內部反應模型引入電子能量、電子密度函數，由可量測得電壓值及施加電功率與作為模型參數，模擬結果與實驗所量測得出口溫度做比較，在定性上有相同的趨勢。此模型可預測電漿頭內部的激發態物種量值、前驅物硝酸鋅熱分解形成氧化鋅以及內部混合氣體溫度分布。

This study is a numerical simulation of the flow field on the deposition region and the atmospheric pressure plasma jet (APPJ) in the PECVD manufacturing process. The plasma reaction includes mutually species and different chemical reactions. When doing simulation, we utilized commercial software COMSOL Multiphysic5.2. The turbulent model is coupled with heat transfer model and chemical model. At first we analysis the configuration of flow field effect on the deposition region in the PECVD process. This model could apply on designing a system to collect the by-production for linear atmosphere pressure plasma. In continue, to verify the plasma reaction model, contrast the experimental result with simulation result. Establishing an APPJ model to simulate the downstream of fluent .The simulation result is consistence with the experiment. The visual light sudden expansion which occur at the gap is 1 mm. It could be proof this model is feasible. In the last model, we defined the specific function of electron temperature and electron density which was add measured voltage and applied power be model parameters. We compared the simulation results with experimental results, and found qualitatively similar in outlet temperature. This model could predict the excited species concentration, zinc nitrate precursor thermal decomposed to form zinc oxide and temperature distribution of mixing gas.