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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 李佳翰 | |
| dc.contributor.author | Zhan-Yu Liu | en |
| dc.contributor.author | 劉展瑜 | zh_TW |
| dc.date.accessioned | 2021-06-15T05:46:48Z | - |
| dc.date.available | 2015-08-20 | |
| dc.date.copyright | 2010-08-20 | |
| dc.date.issued | 2010 | |
| dc.date.submitted | 2010-08-18 | |
| dc.identifier.citation | [1] E. H. Anderson, “Specialized Electron Beam Nanolithography for EUV and X-Ray Diffractive Optics,” IEEE J. QUANTUM ELECTRON. 42, 27-35 (2006).
[2] K. A. Goldberg, P. Naulleau, I. Mochi, E. H. Anderson, S. B. Rekawa, C. D. Kemp, R. F. Gunion, H.-S. Han, and S. Huh, “Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture,” J. Vac. Sci. Technol. B 26, 2220-2224 (2008). [3] F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni, “Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination,” Opt. Lett. 34, 271-273 (2009). [4] D. S. Kim, J. J. Park, K. H. Lee, J. Park, and C. H. Nam, “Soft X-ray Microscope Constructed with 130-nm Spatial Resolution Using a High Harmonic X-ray Source,” Jpn. J. Appl. Phys. 48, 026506 (2009). [5] G. Vaschenko, C. Brewer, F. Brizuela, Y. Wang, M. A. Larotonda, B. M. Luther, M. C. Marconi, J. J. Rocca, C. S. Menoni, E. H. Anderson, W. Chao, B. D. Harteneck, J. A. Liddle, Y. Liu, and D. T. Attwood, “Sub-38 nm resolution tabletop microscopy with 13 nm wavelength laser light,” Opt. Lett. 31, 1214-1216 (2006). [6] D. T. Attwood, Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge University Press, 1999). [7] W. L. Chao, J. Kim, S. Rekawa, P. Fischer, and E. H. Anderson, “Demonstration of 12 nm resolution Fresnel zone plate lens based soft x-ray microscopy,” Opt. Express 17, 17669-17677 (2009). [8] W. Chao, B. D. Harteneck, J. A. Liddle, E. H. Anderson, and D. T. Attwood, “Soft X-ray microscopy at a spatial resolution better than 15 nm,” Nature 435, 1210-1213 (2005). [9] W. Chao, E. H. Anderson, P. Fischer, and D. H. Kim, “Towards sub-10 nm resolution zone plates using the overlay nanofabrication processes,” Proc. SPIE 6883, 688309 (2008). [10] G. C. Yin, Y. F. Song, M. T. Tang, F. R. Chen, K. S. Liang, F. W. Duewer, M. Feser, W. B. Yun, and H. P. D. Shieh, “30 nm resolution x-ray imaging at 8 keV using third order diffraction of a zone plate lens objective in a transmission microscope,” Appl. Phys. Lett. 89, 221122 (2006). [11] W. Yun, B. Lai, Z. Cai, J. Maser, D. Legnini, Z. Chen, A. A. Krasonperova, Y. Vladimirsky, F. Cerrina, E. Di Fabrizio, and M. Gentili, “Nanometer focusing of hard x rays by phase zone plates,” Rev. Sci. Instrum. 70, 2238-2241 (1999). [12] M. J. Simpson and A. G. Michette, “Imaging properties of modified Fresnel zone plates,” Opt. Acta, 31, 403- 413 (1984). [13] J. Kirz, “Phase zone plates for x rays and the extreme uv,” J. Opt. Soc. Am. 64, 301-309 (1974). [14] I. Snigireva, A. Snigirev, V. Kohn, V. Yunkin, M. Grigoriev, S. Kuznetsov, G. Vaughan, and M. Di Michiel, “ Focusing high energy X-rays with stacked Fresnel zone plates,” Phys. Status Solidi A-Appl. Mat. 204, 2817-2823 (2007). [15] S. D. Shastri, J. M. Maser, B. Lai and J. Tys, “Microfocusing of 50 keV undulator radiation with two stacked zone plates,” Opt. Commun. 197, 9-14 (2001). [16] P. Srisungsitthisunti, O. K. Ersoy, and X. Xu, “Volume Fresnel zone plates fabricated by femtosecond laser direct writing,” Appl. Phys. Lett. 90, 011104 (2007). [17] J. W. Goodman, Introduction to Fourier Optics, (McGraw-Hill, 2005). [18] E. Hecht, Optics, (Pearson Education, 2002). [19] I. J. Cooper, C. J. R. Sheppard, and M. Sharma, “Numerical integration of diffraction integrals for a circular aperture,” Optik 7, 293-298 (2002). [20] Y. Tamari and H. Azechi, “Development of background reduced Fresnel phase zone plate,” Rev. Sci. Instrum. 75, 4023-4025 (2004). [21] R. F. Harrington, Time-Harmonic Electromagnetic Fields (IEEE Press, 2001). | |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/47072 | - |
| dc.description.abstract | 極紫外光微影術是下一世代微影技術可能的主流技術。在極紫外光的波段下，菲涅耳波帶片是非常重要的光學繞射元件之一。在固定孔徑大小以及製程極限下，具有中央擋片結構的菲涅耳波帶片不但能提供高空間解析度並且阻擋零階繞射光。若阻擋的面積越大，則空間解析度將變的更高，但同時光強則會變的更低。在這樣的結構中，空間解析度與光強是不可兼得的。在本文中，我們利用菲涅耳－克希荷夫繞射公式模擬了在極紫外光波段下共十五個不同堆疉波帶片結構，此結構分別是由增強波帶片和主波帶片所組成。我們發現這十五個結構中，有一組的空間解析度與光強相較於只具有中央擋片結構的波帶片還要來的更好。 | zh_TW |
| dc.description.abstract | Extreme ultraviolet lithography (EUV) is one candidate of the next generation lithography. In EUV wavelength, Fresnel zone plate (FZP) is one of the most important diffractive optical elements. In a fixed fabrication limit and lens size, Fresnel zone plate with a central stop can not only provide high spatial resolution but also block the zero order diffractive light. More area blocked in the center, higher spatial resolution can be achieved but accompanied with lower light intensity. It is trade-off between the spatial resolution and light intensity in this kind of structure. In this thesis, fifteen cases of stacked zone plate which are composed by an enhancing zone plate and primary zone plate are studied by Fresnel-Kirchhoff diffraction formula in EUV wavelength. One of the cases can not only improve the spatial resolution but also enhance the light intensity as comparing with only one zone plate with central stop. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-15T05:46:48Z (GMT). No. of bitstreams: 1 ntu-99-R97525080-1.pdf: 3930357 bytes, checksum: b4852949aadf0d63613428a0169254ed (MD5) Previous issue date: 2010 | en |
| dc.description.tableofcontents | 致謝 i
中文摘要 ii ABSTRACT iii STATEMNT OF CONTRIBUTIONS iv TABLE OF CONTENTS v LIST OF FIGURES vii LIST OF TABLES xii Chapter 1 Introduction 1 1.1 Motivation and Literature Review 1 1.2 Framework 2 Chapter 2 Basic Concepts, Diffraction Theory, and Simulation Method 4 2.1 Basic Concepts 4 2.1.1 Lens properties of Fresnel zone plate 4 2.1.2 Spatial resolution of Fresnel zone plate 6 2.2 Diffraction Theory 7 2.2.1 The Helmholtz Equation 8 2.2.2 Green’s Theorem 9 2.2.3 The Kirchhoff Diffraction Theory 9 2.2.4 Fresnel-Kirchhoff Diffraction Formula 11 2.2.5 Fresnel-Kirchhoff Diffraction Formula with Normal Incident Plane Wave 12 2.3 Simulation Method 13 Chapter 3 Simulation Results 19 3.1 Focal Properties of Single Zone Plate 19 3.1.1 Diffraction Pattern Varied by the Number of Zone 19 3.1.2 Diffraction Pattern Varied by the Number of Zone Blocked from the Center 20 3.1.3 Fresnel Zone Plate with Additional Zones 21 3.1.4 Fresnel Zone Plate with Additional Zones and Central Stop 22 3.2 Focal Properties of Two Stacked Zone Plate 23 3.2.1 Diffraction Pattern at the Half Focal Length Plane with Different Enhancing Zone Plate Structures 24 3.2.2 Diffraction Pattern at the Half Focal Length Plane with Different Pinhole Size of Enhancing Zone Plates 25 3.2.3 Intensity at the Focal Point after Twice Diffraction with Different Enhancing Zone Plate Structures 26 3.2.4 Summary of Total Fifteen Combination Cases 27 Chapter 4 Conclusion and Future Work 55 Appendix A Verification of MATLAB Code 58 Appendix B Fabrication Processes of Two Modified Zone Plates Set 60 REFERENCE 63 VITA 66 | |
| dc.language.iso | en | |
| dc.subject | 光學繞射元件 | zh_TW |
| dc.subject | 極紫外光 | zh_TW |
| dc.subject | 菲涅耳波帶片 | zh_TW |
| dc.subject | extreme ultraviolet light | en |
| dc.subject | diffractive optics | en |
| dc.subject | Fresnel zone plate | en |
| dc.title | 利用純量繞射理論探討複合式菲涅耳波帶片之聚焦特性 | zh_TW |
| dc.title | Using Scalar Diffraction Theory to Study the Focal Properties of Composite Fresnel Zone Plate | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 98-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 蔡坤諭,吳俊德,林俊宏,陳昭宏 | |
| dc.subject.keyword | 光學繞射元件,菲涅耳波帶片,極紫外光, | zh_TW |
| dc.subject.keyword | diffractive optics,Fresnel zone plate,extreme ultraviolet light, | en |
| dc.relation.page | 66 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2010-08-19 | |
| dc.contributor.author-college | 工學院 | zh_TW |
| dc.contributor.author-dept | 工程科學及海洋工程學研究所 | zh_TW |
| 顯示於系所單位： | 工程科學及海洋工程學系 | |
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