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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 李伯訓(Bor-Shuinn Lee) | |
| dc.contributor.author | Hao-Ting Wang | en |
| dc.contributor.author | 王浩庭 | zh_TW |
| dc.date.accessioned | 2021-06-15T05:21:36Z | - |
| dc.date.available | 2011-09-09 | |
| dc.date.copyright | 2010-09-09 | |
| dc.date.issued | 2010 | |
| dc.date.submitted | 2010-07-19 | |
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| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/46660 | - |
| dc.description.abstract | 本實驗為提升牙科臨床塗氟效果，自製釋氟貼片，並使用X 射線
光電子能譜儀、二次離子質譜儀、電子掃描顯微鏡分析釋氟貼片貼附 不同時間後對牙釉質表面帶來的影響，對其產物做定性與定量分析。 此外， 配合離子層析儀分析，以了解釋氟貼片能否幫助牙釉質抵抗 去礦化環境，並增強再礦化能力，對臨床有實質幫助。 經由X 射線光電子能譜儀，二次離子質譜儀，以及離子層析儀的 分析，本實驗發現約經過8 小時的釋氟貼片貼附後，牙釉質表面的氟 濃度可達飽和，在最表面形成的產物為氟化鈣 CaF2。氟膠塗佈24 小 時後，影響深度在健全牙釉值約為7.2μm，而在經過去礦化程序的牙 釉質較深，約為17.6μm。經過釋氟貼片處理過後的牙釉質其抑制酸 性環境去礦化作用的能力隨著釋氟貼片貼附時間的增加有顯著提升， 成正向關係; 釋氟貼片也能增加牙釉質再礦化的能力，但效果和貼片 貼附時間並無明顯關係。 | zh_TW |
| dc.description.abstract | Objectives: The aim of this study was to develop a fluoride releasing strip for dental clinicians to increase the effectiveness of topical fluoridation.
Moreover, this study tried to establish a molecular- based model to analyze the product on teeth enamel after fluoridation. Methods: This multi method study used XPS, SIMS, SEM measurements in order to analyze qualitative and quantitative change of teeth enamel after use of fluoride releasing strip. And used Ion Chromatography to determine demineralization/ remineralization rate change of enamel after fluoride strip fluoridation. Results: The reaction reached saturation point after 8 hours use of strip. The main product was calcium fluoride. Fluoride strip effect deeper on enamel samples witch pretreated with demineralization solution then sound enamel samples. Using XPS depth profile survey, we found that the depth of fluoride infiltration is about 7.2μm on sound enamel sample and 17.6μm in demineralized enamel sample. It seems that topical fluoridation inhibited enamel demineralization more effectively then increased enamel remineralization. Key Word: topical fluoride, dental enamel, surface | en |
| dc.description.provenance | Made available in DSpace on 2021-06-15T05:21:36Z (GMT). No. of bitstreams: 1 ntu-99-R96422019-1.pdf: 5896160 bytes, checksum: bcfbf63fa0448d7a1243fd8c9cd393a6 (MD5) Previous issue date: 2010 | en |
| dc.description.tableofcontents | 口試委員會審定書………………………………………………… i
誌謝…………………………………………………………………. ii 中文摘要…………………………………………………………… .. iii 英文摘要…………………………………………………………….. iv 第一章 序論………………………………………………………….. 1 第二章 文獻回顧………………………………………………….. 3 2-1. 牙釉質的結構…………………………………………… … 3 2-2. 氫氧磷灰石的結構與特性………………………………….3 2-3. 氟離子和牙釉質去礦化/再礦化關係…………… …………4 2-4. 去礦化和再礦化的定量分析……………………………….7 2-5. 使用氟化物後牙釉質表面產物的測定…………................11 2-6. 使用APF 後牙釉質表面的產物………………...…………12 2-7. 使用XPS (x ray photoelectron spectroscopy) 做氟化物對牙 釉質或HAP 影響之表面分析…………………………………...13 第三章 實驗材料與方法……………………………………………15 3-1. 含氟溶液， 氟膠， 釋氟貼片以及去礦化溶液/ 再礦化溶 液的製備…………………………………………………………15 3-2. 各種儀器分析專用牙釉質樣本之製備……………………16 3-2-1. XPS 以及SIMS 專用牙釉質樣本…14 3-2-2. SEM 分析牙釉質樣本之製備..……………………17 3-2-3. Ion Chromatography 分析牙釉質樣本之製備........17 3-3. 各種儀器分析之實驗流程…………………………………18 3-3-1. XPS 和 SIMS……………………………………...18 3-3-2. SEM……...…………………………………………20 3-3-3. Ion Chromatography……...………………………..20 3-4. 實驗藥品……….…………………………………………..21 3-5. 實驗器材與儀器…………………………………………....21 第四章 實驗結果與討論……………………………………………22 4-1. XPS 分析結果…………………………………………...…22 4-1-1. XPS 分析， D24…………………………………22 4-1-2. XPS 分析， R24………………………………….24 4-2. XPS 分析結果之討論………….……………………………26 4-2-1. XPS 元素半定量分析之討論與比較……………...26 4-2-2.關於narrow scan spectrum 的校正..………………..27 4-2-3. Ca2p3/2 narrow scan spectrum 之討論……………28 4-2-4. F1s narrow scan spectrum 之討論………………….29 4-2-5. P2p3/2 narrow scan spectrum 之討論……………...30 4-2-6. O1s narrow scan spectrum 之討論….……………...31 4-2-7. Depth profile etching time 與實際 測量深度之關係…………….………….……….….32 4-3. SIMS 分析結果與討論…………….……………………….32 4-4. SEM 分析結果與討論………………………………………34 4-5. Ion Chromatography 分析結果與討論…………….……....35 第五章 結論與未來研究方…………………………………………36 參考文獻…………………………….………………………………….37 圖 目 錄 圖(1): 摘自 tenCate JM (1997). Review on fluoride, with special emphasis on calcium fluoride mechanisms in caries prevention. European Journal of Oral Sciences 105(5):461-465.為各礦物質溶度積和pH 值的關係圖…………………6 圖(2): 摘自Tenbosch JJ, Angmarmansson B (1991). A Review Of Quantitative Methods For Studies Of Mineral-Content Of Intraoral Incipient Caries Lesions. Journal of Dental Research 70(1):2-14. 為病灶深度Ld 方向的簡單示意 圖………………………………………………………………..……………………..9 圖(3):XPS 以及SIMS 分析用牙釉質樣本製備方法示意圖…………….……….16 圖(4): Ion Chromatography 分析用牙釉質樣本製備方法……..………………….18 圖(5): XPS 以及SIMS 表面分析流程簡圖……..………………………………….19 圖(6): XPS depth profile 分析樣本D24， Survey spectrum………………………..46 圖(7): XPS depth profile 分析樣本D24， O. F. P 對Ca 比例關係……………..47 圖(8): XPS depth profile 分析樣本D24， Ca 2p spectrum………………………..48 圖(9): XPS depth profile 分析樣本D24， Ca BE值對etching time 做圖………….49 圖(10): XPS depth profile 分析樣本D24， F1s spectrum………………………….50 圖(11): XPS depth profile 分析樣本D24， F BE 值對etching time 做圖…………51 圖(12): XPS depth profile 分析樣本D24， P2p spectrum…………………………52 圖(13): XPS depth profile 分析樣本D24， P BE 值對etching time 做圖…………53 圖(14): XPS depth profile 分析樣本D24， O1s spectrum……………………….…54 圖(15): XPS depth profile 分析樣本D24， P BE 值對etching time 做圖…………55 圖(16): XPS depth profile 分析樣本R24， Survey spectrum……………………..56 圖(17): XPS depth profile 分析樣本R24， O. F. P 對Ca 比例關係……………..57 圖(18) XPS depth profile 分析樣本R24， Ca 2p spectrum………………………...58 圖(19): XPS depth profile 分析樣本R24， Ca BE 值對etching time 做圖……….59 圖(20): XPS depth profile 分析樣本R24， F1s spectrum………………………….60 圖(21): XPS depth profile 分析樣本R24， F BE 值對etching time 做圖…………61 圖(22): XPS depth profile 分析樣本R24， P2p spectrum…………………….…..62 圖(23): XPS depth profile 分析樣本R24， P BE 值對etching time 做圖…………63 圖(24): XPS depth profile 分析樣本R24， O1s spectrum…………………………64 圖(25): XPS depth profile 分析樣本R/24， P BE 值對etching time 做圖…………65 圖(26): XPS depth profile 分析樣本， O. F. P 對Ca 比例關係， D24. R24 綜合 比較…………………………………………………………………………………..66 圖(27): D24， etching time=0 survey spectrum 局部放大圖……………………...67 圖(28A): 表面輪廓儀掃描結果， D24……………………………………………..68 圖(28B): 表面輪廓儀掃描結果， R24……………………………………………..68 圖(29): SIMS 分析， positive mode，比較D24 塗氟前後………………………….69 圖(30): SIMS 分析， positive mode，比較R24 塗氟前後…………………………70 圖(31) : SIMS 分析， positive mode，比較D8 塗氟前後………………….………71 圖(32) : SIMS 分析， positive mode，比較R8 塗氟前後…………………………..72 圖(33) : SIMS 分析， positive mode，比較D4 塗氟前後…………………………..73 圖(34) : SIMS 分析， positive mode，比較R4 塗氟前後……………………………74 圖(35) : SIMS 分析， positive mode，比較D2 塗氟前後……………………..…….75 圖(36) : SIMS 分析， positive mode，比較R2 塗氟前後……………………………76 圖(37) : SIMS 分析， positive mode，比較D1 塗氟前後………………………….77 圖(38) : SIMS 分析， positive mode，比較R1 塗氟前後……………………….….78 圖(39) : SIMS 分析， positive mode，比較D0 R0…………………………………..79 圖(40): SIMS 分析， negative mode， 比較D0 R0………………………………….80 圖(41): SEM 觀察D24 表面， 塗氟前， 50000 倍…………………………………81 圖(42): SEM 觀察D24 表面， 塗氟前， 50000 倍， 另一區域……………….….82 圖(43): SEM 觀察D24表面， 塗氟後， 50000倍………………………………….82 圖(44): SEM 觀察D24 表面， 塗氟後， 100000 倍……………………………….82 圖(45): SEM 觀察R24 表面， 塗氟前， 50000 倍………………………………….83 圖(46): SEM 觀察R24 表面， 塗氟前， 100000 倍……………………………….83 圖(47): SEM 觀察R24 表面， 塗氟後， 50000 倍………………………………..84 圖(48): SEM 觀察R24 表面， 塗氟後， 100000 倍………………………………..84 圖(49): 離子層析儀分析D group 塗氟時間與抵抗去礦化能力的關係……….85 圖(50): 離子層析儀分析R group 塗氟時間與增強再礦化能力的關係…………86 | |
| dc.language.iso | zh-TW | |
| dc.subject | 氟膠 | zh_TW |
| dc.subject | 表面分析 | zh_TW |
| dc.subject | 牙釉質 | zh_TW |
| dc.subject | X 射線光電子能譜儀 | zh_TW |
| dc.subject | 去礦化 | zh_TW |
| dc.subject | 再礦化 | zh_TW |
| dc.subject | surface analysis | en |
| dc.subject | dental enamel | en |
| dc.subject | topical fluoride | en |
| dc.subject | demineralization | en |
| dc.subject | XPS | en |
| dc.subject | remineralization | en |
| dc.title | 釋氟貼片對人類牙釉質表面產物之定性以及定量分析 | zh_TW |
| dc.title | Qualitative and Quantitative Analysis of the Human Enamel Surface Treated by Fluoride Strip | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 98-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 張哲政(Che-Chen Chang),吳嘉文(Chia-Wen Wu) | |
| dc.subject.keyword | 氟膠,牙釉質,表面分析,X 射線光電子能譜儀,去礦化,再礦化, | zh_TW |
| dc.subject.keyword | topical fluoride,dental enamel,surface analysis,XPS,demineralization,remineralization, | en |
| dc.relation.page | 86 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2010-07-20 | |
| dc.contributor.author-college | 牙醫專業學院 | zh_TW |
| dc.contributor.author-dept | 臨床牙醫學研究所 | zh_TW |
| 顯示於系所單位： | 臨床牙醫學研究所 | |
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