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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 林啟萬 | |
| dc.contributor.author | Yu-Chung Chen | en |
| dc.contributor.author | 陳昱中 | zh_TW |
| dc.date.accessioned | 2021-06-15T04:50:25Z | - |
| dc.date.available | 2010-08-05 | |
| dc.date.copyright | 2010-08-05 | |
| dc.date.issued | 2010 | |
| dc.date.submitted | 2010-08-02 | |
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| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/45981 | - |
| dc.description.abstract | Microelectrode array (MEA) has been used in cell physiology for many years. It features the non-invasive, long-term, and space resolution method to record cell signals. By applying MEA, the neuron extracellular voltage could be record and the electrophysiology could be further researched.
Cell impedance is another method to evaluate the condition of the cell culture. Previous researches showed that the cell attachment and spread on the electrode could be detected by the change of the impedance. Thus the impedance could be a method to evaluate the condition of the cell growth, proliferation or apoptosis. In this research, microelectrode array has been fabricated by photolithography process. Indium-Tin Oxide (ITO) was chosen as the conducting material for its conductivity and transparency, and was regarded to be non-toxicity for cell culture. The ITO pattern was covered with Silicon-dioxide (SiO2) insulating layer. A large reference electrode was made by Silver/Silver Chloride (Ag/AgCl) on top of the SiO2 layer. Human kidney epithelial cells were cultured on the surface of the MEA. Impedance of the cells was measured from 1 kHz to 100 kHz. High impedance could be measured if the cells attached to the surface in good condition. While the cells grow quite well on the SiO2 covered surface, the AgCl surface had an inhibitive effect on cell attachment and proliferation. Also the measuring process involved input high frequency voltage wave, which might had deteriorated effect on the attached cells. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-15T04:50:25Z (GMT). No. of bitstreams: 1 ntu-99-R97548018-1.pdf: 11287852 bytes, checksum: 52bb385b507204fafa24255bdc523322 (MD5) Previous issue date: 2010 | en |
| dc.description.tableofcontents | Chapter 1 Introduction ................................................................................................ 1
Chapter 2 Background ................................................................................................ 3 2.1 Microelectrode Array ...................................................................................................... 3 2.2 Cell Impedance .............................................................................................................. 10 Chapter 3 Materials and Methods ............................................................................ 14 3.1 Fabrication of MEA ....................................................................................................... 14 3.1.1 Photolithography process ....................................................................................... 14 3.1.2 ITO pattern ............................................................................................................. 15 3.1.3 Insulating SiO2 layer ............................................................................................... 16 3.1.4 Ag/AgCl reference electrode .................................................................................. 17 3.1.5 Thickness calibration .............................................................................................. 21 3.2 Cell Culture ................................................................................................................... 22 3.3 Impedance measurement ............................................................................................... 23 Chapter 4 Results ....................................................................................................... 25 4.1 Fabrication of MEA ....................................................................................................... 25 4.1.1 ITO pattern ............................................................................................................. 25 4.1.3 Reference electrode ................................................................................................ 34 4.2 Cell Culture ................................................................................................................... 36 4.2.1 First Group culture ................................................................................................. 36 4.2.2 Second Group Culture ............................................................................................ 40 4.3 Impedance Measurement ............................................................................................... 43 4.3.1 Impedance Characteristic ....................................................................................... 43 4.3.2 First Group Impedance ........................................................................................... 44 4.3.3 Second Group Impedance ....................................................................................... 47 Chapter 5 Discussions ................................................................................................ 51 5.1 Fabrication process of MEA .......................................................................................... 51 5.2 Cell Culture on MEA..................................................................................................... 52 5.3 Impedance and Cells...................................................................................................... 56 5.3.1 Impedance in first group ......................................................................................... 56 5.3.2 Impedance in the second group .............................................................................. 59 5.4 Future work ................................................................................................................... 64 Chapter 6 Conclusion ................................................................................................ 66 Reference .................................................................................................................... 67 | |
| dc.language.iso | en | |
| dc.subject | 微電極陣列 | zh_TW |
| dc.subject | 細胞阻抗 | zh_TW |
| dc.subject | Cell Impedance | en |
| dc.subject | Microelectrode Array | en |
| dc.title | 以微電極陣列對細胞阻抗之量測分析 | zh_TW |
| dc.title | Measuring Cell Impedance by Microelectrode Array | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 98-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 胡文聰,楊燿州 | |
| dc.subject.keyword | 微電極陣列,細胞阻抗, | zh_TW |
| dc.subject.keyword | Microelectrode Array,Cell Impedance, | en |
| dc.relation.page | 71 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2010-08-02 | |
| dc.contributor.author-college | 工學院 | zh_TW |
| dc.contributor.author-dept | 醫學工程學研究所 | zh_TW |
| 顯示於系所單位： | 醫學工程學研究所 | |
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