利用分光式反射儀量測滾筒上之薄膜厚度

Abstract

在微影製程領域中，利用奈米壓印做圖形的轉移是常用的技術之ㄧ。在奈米壓印中，利用滾筒壓印作大面積圖案的生產與製造是最有效率的方法之ㄧ。 我們實驗室以干涉微影的方法，已可在平面基材上製作次微米等級的週期性結構，也可在滾筒上製作次微米週期性結構。為因應微影製程及後續製程上的需求，在滾筒上進行干涉微影之前必須先確認滾筒上薄膜之厚度，故在本論文中我們嘗試開發出一套反射儀，不僅可量測平面基材上之薄膜厚度，也可量測滾筒上之薄膜厚度，甚至雙層薄膜之厚度。 利用浸潤式塗佈的特性，我們提出在特定條件下可使用平面基材上之薄膜厚度來印證滾筒上薄膜厚度的方法，並利用商用機台確認滾筒上的薄膜厚度，解決了一般量測儀器對於彎曲表面基材進行薄膜厚度量測上的不足，因而滾筒上薄膜厚度的精密量測為此篇論文研究之重點。

Abstract In lithography, nanoimprint is one of the common methods for pattern transfer. The fabrication and production of large-area patterns made by roll-to-roll process is more effective by using nanoimprint process. We used the interference lithography to fabricate sub-wavelength structures on planar substrates. The process was also applied to the roller surface. Because of the demands of the interference lithography and the subsequent process, the thickness of the thin film on the roller should be confirmed in these processes. Therefore, in this work we try to develop a focusing beam splitter reflectometer to measure the thicknesses of thin film coated not only on a planar substrate but also on a roller. Furthermore, each thickness of a double-layer film stack can be measured by using the reflectometer. To confirm the film thickness on the roller, we demonstrate a new method for thickness measurement. Because of the characteristics of dip coating, the film thickness on the roller is confirmed by comparing with the one on a planar substrate. The lack of a nonplanar substrate measurement is overcome by our home-made reflectometer. Nevertheless, this thesis is focused on the measurement of a roller’s film thickness.