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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 蔡定平(Din-Ping Tsai) | |
| dc.contributor.author | Fu-Hao Chen | en |
| dc.contributor.author | 陳富豪 | zh_TW |
| dc.date.accessioned | 2021-06-15T02:59:59Z | - |
| dc.date.available | 2014-08-03 | |
| dc.date.copyright | 2009-08-03 | |
| dc.date.issued | 2009 | |
| dc.date.submitted | 2009-07-31 | |
| dc.identifier.citation | [1] http://metaphotonics.de/.
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| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/44477 | - |
| dc.description.abstract | 近幾年來，超穎材料研究發展得很快。然而，製作奈米級且反應
在可見光波段超穎材料非常的困難且昂貴。因此，我們發展高聚焦超 快雷射在相變化材料 (鍺銻碲合金)上寫下奈米結構之光熱奈米微影 術。高聚焦之雷射光斑可以將熱能侷限在很小的區域，並產生結晶化 或非晶化之過程。在實驗中，利用 AFM 來觀察相變化以及切割造成的 表面形貌及分析其生成原因，且得到最小線寬 97 nm。我們也以熱傳 導分析來研究相變化的過程以及區域，並以數值方法得出線寬和功率 的關係，當低功率時和實驗有相當好的擬合。另外，切割深度和切割 率和功率，寫線速度的關係及物理也有定性上的說明。在應用方面， 我們也製作了大小 500 奈米見方的卍字手性結構，線寬約為 100 奈 米。表示此方法有製作奈米級結構的能力，並且提供低成本和低複雜 度的優點。 | zh_TW |
| dc.description.abstract | In recent years, the research of metamaterials has developed quickly. However, the fabrication of metamaterials responding to visible light is still difficult and expensive. Therefore, the novel opto-thermal nanolithography is proposed. In this thesis, the
opto-thermal nanolithography of as-deposited Ge2Sb2Te5 (GST) film using tightly focused femto-second pulsed laser has been studied. A focused laser spot is utilized to generate a spatially confined hot area in a Ge2Sb2Te5 film, where heat induced amorphization or crystallization of Ge2Sb2Te5 would take place. Hence, two different phases are observed. In our experiment, the topography of direct-writing lines is investigated, and the minimum line width of 97 nm is achieved by this technique. Some charecteristics of topography are studied. We also study the phenomenon theoretically by solving the heat-conduction equation to deduce the temperature distribution and to account for amorphization and crystallization. Numerical results for the relation between the line width and the laser power are obtained. In application, a planar chiral metamaterial (gammadion shape) with a unit cell size of 500×500 nm2 is fabricated. It is demonstrated that the technique provides a low-cost nanofabrication for metamaterials. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-15T02:59:59Z (GMT). No. of bitstreams: 1 ntu-98-R96222027-1.pdf: 14390314 bytes, checksum: 954d9316e4222be9e3a4ae27355230aa (MD5) Previous issue date: 2009 | en |
| dc.description.tableofcontents | 一 簡介
1 1.1 超穎材料(Metamaterials) . . . . . . . . . . . . . . . . . . . . . . . . 1 1.2 常見的奈米製程 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 7 1.2.1 光學微影 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 8 1.2.2 電子束微影[7] . . . . . . . . . . . . . . . . . . . . . . . . . . 10 1.2.3 聚焦離子束微影 . . . . . . . . . . . . . . . . . . . . . . . . . 10 1.3 相變化材料與光熱微影術 (Opto-Thermal Nanolithography) . . . . . . . . . . . . . . . . . . . . 12 1.3.1 相變化材料介紹 . . . . . . . . . . . . . . . . . . . . . . . . . 12 1.3.2 光熱微影術 . . . . . . . . . . . . . . . . . . . . . . . . . . . . 15 二 光熱作用之原理 17 2.1 多層膜材料中的熱傳導 . . . . . . . . . . . . . . . . . . . . . . . . . 17 2.1.1 熱傳導方程 . . . . . . . . . . . . . . . . . . . . . . . . . . . . 17 2.1.2 邊界條件與初始條件 . . . . . . . . . . . . . . . . . . . . . . 19 2.2 熱源：高斯光束的高聚焦光場 . . . . . . . . . . . . . . . . . . . . 21 2.2.1 超快雷射高斯光束. . . . . . . . . . . . . . . . . . . . . . . . 21 2.2.2 聚焦光場 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 22 2.2.3 高斯光束的聚焦電場 . . . . . . . . . . . . . . . . . . . . . . 26 I2.3 多層材料中的溫度分佈 . . . . . . . . . . . . . . . . . . . . . . . . . 30 2.3.1 Green’s function 方法 . . . . . . . . . . . . . . . . . . . . . . 31 2.3.2 溫度場的解析解 . . . . . . . . . . . . . . . . . . . . . . . . . 32 2.4 結晶化和分晶化的判斷準則 . . . . . . . . . . . . . . . . . . . . . . 34 三 實驗架構和樣品製備 39 3.1 光熱微影術系統 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 39 3.1.1 實驗架構 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 39 3.1.2 儀器介紹 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 40 3.1.3 樣品製備 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 50 3.1.4 實驗控制變因 . . . . . . . . . . . . . . . . . . . . . . . . . . 52 3.2 控制流程 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 53 3.2.1 圖案座標化 . . . . . . . . . . . . . . . . . . . . . . . . . . . . 53 3.2.2 週期、陣列數目、縮放參數、和延遲時間 . . . . . . . . . . 54 3.2.3 對焦修正 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 55 四 實驗結果和討論 56 4.1 系統對雷射功率衰減之量測 . . . . . . . . . . . . . . . . . . . . . . 56 4.2 樣品反射率，穿透率以及等效吸收常數之量測 . . . . . . . . . . . 58 4.3 光熱微影之實驗結果 . . . . . . . . . . . . . . . . . . . . . . . . . . 62 4.3.1 鍺銻碲膜厚= 40 nm 實驗結果 . . . . . . . . . . . . . . . . 62 4.3.2 鍺銻碲膜厚= 30 nm 實驗結果. . . . . . . . . . . . . . . . . 67 4.3.3 鍺銻碲膜厚= 20 nm 實驗結果. . . . . . . . . . . . . . . . . 70 4.3.4 鍺銻碲膜厚= 10 nm 實驗結果. . . . . . . . . . . . . . . . . 73 4.3.5 鍺銻碲膜厚= 5 nm 實驗結果 . . . . . . . . . . . . . . . . . 76 II 4.3.6 最小線寬以及奈米結構 . . . . . . . . . . . . . . . . . . . . . 79 4.3.7 總結 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 81 五 實驗數據分析 83 5.1 線寬和照度的關係. . . . . . . . . . . . . . . . . . . . . . . . . . . . 84 5.2 切割深度(ablation depth) 和照度的關係 . . . . . . . . . . . . . . . 89 5.3 切割率(ablation rate) 和脈衝數的關係 . . . . . . . . . . . . . . . . 92 5.4 總結 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 94 六 總結與未來工作 96 參考文獻 97 A 程式碼 104 | |
| dc.language.iso | zh-TW | |
| dc.subject | 熱光阻 | zh_TW |
| dc.subject | 超快雷射 | zh_TW |
| dc.subject | 鍺銻碲 | zh_TW |
| dc.subject | 相變化 | zh_TW |
| dc.subject | 光熱微影術 | zh_TW |
| dc.subject | 表面電漿 | zh_TW |
| dc.subject | 超穎材料 | zh_TW |
| dc.subject | surface plasmon | en |
| dc.subject | thermal resist | en |
| dc.subject | ultrafast laser | en |
| dc.subject | Ge2Sb2Te5 | en |
| dc.subject | phase change | en |
| dc.subject | metamaterial | en |
| dc.subject | opto-thermal nanolithography | en |
| dc.title | 應用光熱效應之相變化奈米微影製程 | zh_TW |
| dc.title | Phase-Change Fabrication for Opto-Thermal Nanolithography | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 97-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 梁培德(Pui-Tak Leung),周趙遠鳳(Yuan-Fong Chau) | |
| dc.subject.keyword | 超穎材料,表面電漿,光熱微影術,相變化,鍺銻碲,超快雷射,熱光阻, | zh_TW |
| dc.subject.keyword | metamaterial,surface plasmon,opto-thermal nanolithography,phase change,Ge2Sb2Te5,ultrafast laser,thermal resist, | en |
| dc.relation.page | 104 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2009-07-31 | |
| dc.contributor.author-college | 理學院 | zh_TW |
| dc.contributor.author-dept | 物理研究所 | zh_TW |
| 顯示於系所單位： | 物理學系 | |
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