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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 顏家鈺 | |
| dc.contributor.author | Yu-Cian Chang | en |
| dc.contributor.author | 張毓倩 | zh_TW |
| dc.date.accessioned | 2021-06-15T02:33:48Z | - |
| dc.date.available | 2010-08-14 | |
| dc.date.copyright | 2009-08-14 | |
| dc.date.issued | 2009 | |
| dc.date.submitted | 2009-08-14 | |
| dc.identifier.citation | [1] Gordon Moore, “Cramming More Components Onto Integrated Circuits,” electronics Magazine, 1965.
[2] C. E. Warble, 1983, “Electron Microscope Grid Holders for A Multipurpose Spicemen Stage,” Rev. Sci. Instrum., Vol. 54, No. 5, pp: 607 – 610. [3] Eiichi Hazaki, Osamu Yamada, Yasushi Nakaizumi, Shigeyuki Hosoki, Sumio Hosaka, Akira Hashimoto, 1993, “Scanning Tunnel Microscope Equipped with Scanning Electron Microscope,” United States Patent Number 5256876. [4] Jae-Wook Ryu, Dae-Gab Gweon, “High Precision X-Y-θz Micropositioning Stage Using Monolithic Flexure-Pivoted Linkages,” Proceedings of The 11th Meeting, The American Society for Precision Engineering, Montery, Ca., Vol. 14, pp.626-630. [5] Kusakari Tsutomu, Yosdhikawa Masaanori, “A Piezo-Driven 3D Positioning Mechanism with Single-Stage Structure,” Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering, V62, No. 1, Jan. 1996, pp.130-134. [6] M. G. Langer, W. Öffner, H. Wittmann, H. Flösser, H. Schaar, W. Häberle, A. Pralle, J. P. Ruppersberg, J. K. H. Hörber, 1997, “A Scanning Force Microscope for Simultaneous Force and Patch-lamp Measurements on Living Cell Tissues,” Rev. Sci. Instrum., Vol. 68, No. 6, pp: 2583 – 2590. [7] Toru Oshima, 2003, “Method and Apparatus for Processing Workpiece by Using X-Y Stage Capable of Improving Position Accuracy,” United States Patent Number 6615477 B2. [8] Gürsel Altci, Bijan Shirinzadeh, “Kinematics and Stiffness Analysed of a Flexure-Jointed Planar Micromanipulation System for a Decoupled Compliant Motion,” Proceeding of the 2003 IEEE/RSJ, Intl. Conference on intelligent Robots ans Systems, Las Vegas, Nevada, October 2003. [9] Byoung Hun Kang, John T. Wen, Nicholas G. Dagalakis, Jason J. Gorman, “Analysis and Design of Parallel Michanisms with Flexure Joints,” Proceeding of the 2004 IEEE, International Conference on Robotics & Automation, New Orleans, LA, April 2004. [10] http://www.deben.co.uk/ [11] Oberdan W. Otto, Joseph 0. Garofalo, K.K. Low, Chi-Min Yuan, Richard C. Henderson,Christophe Pierrat, Robert L. Kostelak, Shiela Vaidya, P.K. Vasudev,“Automated optical proximity correction_a rules-based approach,” Proceeding of the 1994. Proc. SPIE, Vol. 2197, Optical/Laser Microlithography VII, DOI:10.1117/12.175422. [12] Tzu-Jeng Hsu,“Optical proximity correction (OPC) method for improving lithography,”United State Patent, Number 6615477 B2US 6194,104B1,Feb 27,2007. [13] Kenji Yamazaki and Hiroshi Yamaguchi,“Flexible Nanofabrication in Three-Dimensional Electron-Beam Lithography Enhanced by Suppression of Proximity Effect,” Applied Physics Express 1,Japan,2008. [14] http://nano.nchc.org.tw/dictionary/ebl.html [15] U. Itkis, Control Systems of Variable Structure, New York: John Wieley, 1976. [16] V. I. Utkin, Sliding Modes and Their Application in Variable Structure Systems, Moscow: MIR publishers, 1978. [17] Cedrat Tehnologies, “Piezo Actuator & Electronics Catalogue,” pp.19-22, 2005. [18] http://www.macrosensors.com/ [19] http://www.piezomechanik.com/ [20] 蕭智凱 撰, “電子束微影系統奈米操控托架設計”, 國立台灣大學機械工程研究所碩士論文, 2007。 [21] Y. C. Huang, C. H. Cheng, “Robust Tracking Control of a Novel Piezodriven Monolithic Flexure-Hinge Stage,” Proceeding of the 2004 IEEE International Conference on Control Application, Taipei, Taiwan, pp. 977-982, September 2-4, 2004. [22] I. J. Nagrath, M. Gopal, “Control Systems Engineering,” Wiley, 2/e. [23] K. J. Astrom, B. Wittenmark, “Adaptive control,” Addison Wesley, 2/e. [24] M. Goldfarb and N. Celanovic, “Modeling Piezoelectric Stack Actuators for nControl of Micromanipulation,” IEEE Control System Magazine, vol.17, no. 3, pp. 69-79, June 1997. [25] W. Ang, C. Riviere and P. Khosla, “Modeling Rate-dependent Hysteresis in Piezoelectric Actuator,” Proceedings of the 2003 IEEE/RSJ International Conference on Intelligent Robots and Systems, pp. 1975-1980, 2003. [26] 簡宏彰 撰, “三自由度超精密為定位平台之研究”, 國立台灣大學機械工程研究所碩士論文, 1996。 究所碩士論文, 1997。 [28] 蔡坤諭 撰, “深次微米三軸精密定位平台之伺服設計”, 國立台灣大學機械工程研究所碩士論文, 1997。 [29] 周冠謙 撰, “以實體化模型為基礎之微米級高速工具機伺服控制”, 國立台灣大學機械工程研究所博士論文, 2005。 [30] 彭勇皓 撰, “新型光學鏡面掃描系統之伺服設計”, 國立台灣大學機械工程研究所碩士論文, 2005。 [31] 黃柏凱 撰,“利用智慧型控制之壓電致動器精密定位控制系統”, 國立東華大學電機工程學系博士論文, 2006。 [32] 李柏均 撰, “基於摩擦遲滯模型之順滑模態控制應用於多軸壓電奈米定位平”,國立台灣大學機械工程研究所碩士論文,2008。 [33] Simulink Design Optimization User's Guide. | |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/43948 | - |
| dc.description.abstract | 次世代微影技術中，電子束微影(E-beam Lithography ，EBL)目前被認為是最具潛力發展成為次世代半導體製程設備的技術，為改善EBL造成的臨近效應(Proximity Effect)、圖形扭曲(Distortion)，以及補償原有EBL載台誤差3~5 µm，提高平台的定位度，而設計了具有六個自由度的高精密度奈米定位平台。
本論文改裝JEOL JSM 7000F的EBL 載台，加入高精度奈米定位平台，由壓電致動器驅動，壓電致動器具有體積小、出力大、剛性佳等優點，然而遲滯效應會造成10％~15％的位移誤差量，為了減低遲滯效應對微影的影響，選擇PID控制器做為閉迴路控制，有良好的控制響應，將遲滯效應消除以便微影。有別於一般的EBL採用固定載台，E-beam去曝寫的型式，本論文採用固定E-beam，移動載台去曝寫(fixed beam lithography)，以不同於傳統軟體補償和路徑補償的方式去修正臨近效應，且可避免圖形扭曲，另外適用於長行程圖形的接合，以及38 nm小線寬的達成。 | zh_TW |
| dc.description.abstract | In the next generation lithography, electron beam lithography is regarded as the most potential lithography technology. In order to correct the proximity effect , pattern distortion, the displacement error of about 3~5 µm from the original stage and to increase the stage precision, a precision 6 degree-of-freedom motion stage for the scanning electron microscope (SEM) system is designed.
Nano stage is integrated into the original stage of JEOL 7000F JSM SEM. Piezoelectric actuators are used in the nano stage because of its advantages including small size, high precision resolution and stiffness. However, the hysteresis causes large displacement errors. A PID controller is used as the closed loop control to reduce hysteresis effect, and the pattern is generated by moving the nano stage while keeping the E-beam fixed. A minimum line width of 38 nm, proximity correction, and large displacement pattern stitching are achieved. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-15T02:33:48Z (GMT). No. of bitstreams: 1 ntu-98-R96522808-1.pdf: 22829084 bytes, checksum: 926885e7f7dd3c8a3458f38c3c0f3e09 (MD5) Previous issue date: 2009 | en |
| dc.description.tableofcontents | 目錄
第1章 緒論 1 1.1 研究背景 1 1.2 文獻回顧 2 1.2.1 奈米六軸定位平台 2 1.2.2 鄰近效應的修正 5 1.3 研究目標 8 1.4 研究貢獻 9 第2章 奈米定位平台結構於三微電子束微影系統 11 2.1 簡介 11 2.1.1 應用簡介 11 2.1.2 電子束微影系統 11 2.1.3 平板彈簧 12 2.1.4 放大機構 12 2.2 奈米定位平台機構設計 13 2.2.1 X-Y-θz平台設計 13 2.2.2 Z-θx-θy平台設計 16 2.3 奈米定位平台有限元素分析 17 2.3.1 ANSYS模擬 17 2.4 奈米定位平台機構實體圖 22 2.5 奈米定位平台結合JEOL JSM 7000F SEM實體機構 24 第3章 系統實驗架構與設計 29 3.1 實驗架構概述 29 3.2 壓電致動器 30 3.2.1 基本性質 30 3.2.2 壓電材料組成律 32 3.2.3 機電轉換係數 33 3.2.4 遲滯效應 34 3.2.5 積層式壓電致動器 37 3.3 壓電驅動器 39 3.4 LVDT 41 3.4.1 LVDT簡介 41 3.4.2 LVDT原理 42 3.4.3 LVDT E-115.21 43 3.4.4 LVDT校正實驗 47 3.4.5 LVDT控制模組 49 3.4.6 LVDT雜訊 49 3.5 訊號擷取卡 50 3.5.1 類比數位轉換卡 50 3.5.2 數位類比轉換卡 51 3.5.3 輸入電壓最小可偵測範圍 52 3.6 Beam blanker 54 第4章 系統識別 55 4.1 本系統描述 56 4.2 線性疊加實驗 57 4.3 系統識別步驟 57 4.3.1 X 軸系統識別步驟 59 4.3.2 Y 軸系統識別步驟 60 4.3.3 θz 軸系統識別步驟 61 4.4 系統識別結果 62 第5章 PID控制 67 5.1 PID控制器設計 67 5.1.1 PID控制器介紹 67 5.1.2 PID控制理論 68 5.2 系統控制 70 第6章 實驗結果與討論 73 6.1 開迴路電子束微影結果 73 6.2 閉迴路電子束微影結果 83 6.3 討論與未來目標 89 參考文獻 91 | |
| dc.language.iso | zh-TW | |
| dc.title | 適合電子束微影系統之高精密度奈米定位平台 | zh_TW |
| dc.title | High Accuracy Positioning Stage for an E-Beam Lithography System | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 97-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 蔡坤諭,陳永耀,陳政宏 | |
| dc.subject.keyword | 電子束微影系統,奈米平台,多自由度,壓電致動器,PID控制,遲滯效應, | zh_TW |
| dc.subject.keyword | E-beam lithography,nano stage,multi-d-o-f,piezoelectric,PID control,hysteresis, | en |
| dc.relation.page | 94 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2009-08-14 | |
| dc.contributor.author-college | 工學院 | zh_TW |
| dc.contributor.author-dept | 機械工程學研究所 | zh_TW |
| 顯示於系所單位： | 機械工程學系 | |
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