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完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 陳奕君(I-Chun Cheng) | |
dc.contributor.author | Chih-Yong Yeh | en |
dc.contributor.author | 葉致仰 | zh_TW |
dc.date.accessioned | 2021-06-15T00:42:53Z | - |
dc.date.available | 2008-09-02 | |
dc.date.copyright | 2008-09-02 | |
dc.date.issued | 2008 | |
dc.date.submitted | 2008-08-30 | |
dc.identifier.citation | 【1】X. Peng, Z. Wang, D. Dimitrov, T. Boonstra and S. Xue, “Study of SiOxNy as a bottom antireflective coating and its pattern transferring capability”, J. Vac. Sci. Technol. A., vol.25, p.1078, 2007
【2】D. Bouhafs, A. Moussi, A.Chikouche, J.M. Ruiz, “Design and simulation of antireflection coating system for optoelectronic devices: Application to silicon solar cell”, solar energy materials and solar cells, vol.52, p. 79, 1998 【3】B.C. Chakravarty, S.N. Singh and B.K. Das, “Use of Tin oxide as an inexpensive antireflection coating for p on n polycrystalline silicon solar cells”, IEEE electron device letters, vol. EDL-4, No.5, p.138, 1984 【4】P. Menna, G.Di Francia, V.La Ferrara, “Porous silicon in solar cell: A review and a description of its application as an AR coating”, Solar energy materials and solar cells, vol.37, p.13, 1995 【5】Zhizhang Chen, Peyman Sana, Jalal Salami and Ajeet Rohatgi, ”A Novel and Effective PECVD SiO2/SiN Antireflection Coating for Si Solar Cells”, IEEE Transactions on electro devices, vol.40, No.6, p.1161, 1993 【6】Th. Gessmann, Y.-L. Li, E.F. Schubert, J.W. Graff and J.K. Sheu, “GaInN light-emitting diodes with omnidirectional reflectors”, Proc. Of SPIE, vol. 4996, p.139, 2003 【7】S. Fernandez, F.B. Naranjo, F. Calle, M.A. Sanchez- Garcia, E. Calleja, P. Vennegues, A. Trampert, and K.H. Ploog, “High-quality distributed Bragg reflectors based on AlxGa1-xN/GaN multilayers grown by molecular-beam epitaxy”, appl. Phys. Lett. vol.79, p.2340, 1999 【8】K.V. Popov, J.A. Dobrowolski, Alexander V. Tikhonravov and Brian T. Sullivan,”Broadband high-reflection multilayer coatings at oblique angles of incidence”, Appl. Opt., vol.36, No.10, p.2139, 1997 【9】J.K. Kim, S. Chhajed, M.F. Schubert, E.F. Schubert, A.J. Fischer, M.H. Crawford, J. Cho, H. Kim and C. Sone, “Light-Extraction Enhancement of GaInN Light- Emitting Diodes by Graded-Refractive-Index Indium Tin Oxide Anti-Reflection Contact”, Adv. Mater., vol.20, p.801, 2008 【10】李正中,”薄膜光學與鍍膜技術”五版,藝軒圖書出版社,台北 市,2006 【11】葉倍宏, “薄膜光學─電腦輔助模擬與分析”,復文興業股份 有限公司, 1992 【12】J.A. Dobrowolski and R.A. Kemp, “Refinement of optical multilayer systems with different optimization procedures”, Appl. Opt., vol.29, No.19, p.2876, 1990 【13】Pierre G. Verly, “Optical coating synthesis by simultaneous refractive-index and thickness refinement of inhomogeneous films”, Appl. Opt., vol.37, No.31, p.7327, 1998 【14】A.V. Tikhonravov, M.K. Trubetskov and G.W. DeBell, “Optical coating design approaches based on the needle optimization technique”, Appl. Opt., vol.46, No.5, p.704, 2007 【15】A.V. Tikhonravov, M.K. Trubetskov and G.W. DeBell, “Application of the needle optimization technique to the design of optical coatings”, Appl. Opt., vol.35, No.28, p.5493, 1996 【16】W.H. Southwell, “Gradient-index antireflection coatings”, Opt. Lett. vol.8, No.11, p.584, 1983 【17】J.A. Dobrowolski, Daniel Poitras, Penghui Ma, Himanshu Vakil and Michael Acree, “Toward perfect antireflection coating: numerical investigation”, Appl. Opt., vol.41, No.16, p.3075, 2002 【18】Daniel Poitras and J.A. Dobrowolski, “Toward perfect antireflection coatings. 2. Theory”, Appl. Opt., vol.43, No.6, p.1286, 2004 【19】Minfeng Chen, Hung-chun Chang, Allan S.P. Chang, Shawn-Yu Lin, J.-Q. Xi, E.F. Schubert, Appl. Opt., vol.46, p.6533, 2007 【20】Shiuh Chao, Cheng-Kuei Chang and Jyh-Shin Chen, “TiO2-SiO2 mixed films prepared by the fast alternating sputter method”, Appl. Opt. vol.30, No.22, p.3233, 1991 【21】F. Rebib, E. Tomasella, M. Dubois, J.Cellier, T. Sauvage and M. Jacquet, “SiOxNy thin films deposited by reactive sputtering: Process and structural characterisation”, Thin Solid Films, vol.515, p.3480, 2007 【22】J.M. Chappé, N. Martin, J. Lintymer, F. Sthal, G. Terwagne, J. Takadoum, “Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process”, Applied Surface Science, vol.253, p.5312, 2007 【23】Jyh-Shin Chen, Shiuh Chao, Jiann-Shiun Kao, Huan Niu and Chih-Hsin Chen, “Mixed films of TiO2-SiO2 deposited by double electron-beam evaporation”, Appl. Opt., vol.35, No.1, p.90, 1996 【24】E.C. Samano, J.Camacho and R. Machorro, ”Optimal control on composition and optical properties of silicon oxynitride thin films”, J. Vac. Sci. Technol. A, vol.23, p.1228, 2005 【25】M.G. Hussein, K. Wörhoff, G. Sengo and A. Driessen, “Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications” 【26】S.R. Kennedy and M.J. Brett, “Porous broadband antireflection coating by glancing angle deposition”, Appl. Opt., vol.42, No.22, p.4573, 2003 【27】J.-Q. Xi, Jong Kyu Kim, E.F. Schubert, Dexian Ye, T.- M. Lu and Shawn-Yu Lin, “Very low-refractive-index optical thin films consisting of an array of SiO2 nanorods”, Opt. Lett., vol.31, No.5, p.601, 2006 【28】J.-Q. Xi, M.F. Schubert, Jong Kyu Kim, E.F. Schubert, Minfeng Chen, Shawn-Yu Lin, W. Liu and J.A. Smart, “Optical thin-film materials with low refractive index for broadband elimination of Fresnel reflection”nature photonics, vol.1, p.176, 2007 【29】A.V. Tikhonravov, M.K. Trubetskov, T.V. Amotchkina and A. Thelen, “Optical coating design algorithm based on the equivalent layers theory”, Appl. Opt. vol.45, No.7, p.1530, 2006 【30】Yeuh-Yeong, Liou and Jin-Ying Lin, “Design of Broadband Visible Antireflection Coating by Recurrence Search Method”, Japanese Journal of Applied Physics, vol.45, p.2915, 2007 【31】Yeuh-Yeong, Liou and Zhi-Wei Wei, “Designing Wideband Visible Antireflection Coating Using Spiral Search Method”, Japanese Journal of Applied Physics, vol.47, p.1570, 2008 【32】W.D.Sproul,“High-rate reactive DC magnetron sputtering of oxide and nitride superlattice coatings”, Vacuum, 51, p.641, 1998 【33】J.D. Plummer,M.D.Deal, and P.B.Griffin, “Silicon VLSI Technology: Fundamentals, Practice and Modeling”, Prentice Hall, New Jersey, 2001 【34】M.Serényi, M.Rácz, T.Lohner, “Refractive index of sputtered silicon oxynitride layers for antireflection coating”, Vacuum, 61, p.245, 2001 【35】G.Xu, P.Jin, M.Tazawa, and K.Yoshimura, “Optical investigation of silicon nitride thin films deposited by r.f. magnetron sputtering”, Thin Solid Films, 425, p.196, 2003 【36】E.C.Samano, J.Camacho, and R.Machorro, “Optimal control on composition and optical properties of silicon oxynitride thin films”, J. Vac. Sci. Technol. A, 23, p.1228, 2005 【37】D.A. Harris and C.L. Bashford, “Spectrophotometry & spectrofluorimetry a practical approach”, IRL Press, Washington DC, 1987 【38】G.V. Reklaitis, A. Ravindran and K.M. Ragsdell, “Engineering optimization Method and Application”, Wiley, 1983 【39】A. Kondilis, E. Aperathitis and M. Modreanu, “Extraction of the refractive index profile of thin transparent conductive oxide films from the analysis of reflectance optical spectra”, Thin Solid Films, vol.515, p.8586, 2007 【40】李金宏, ”橢圓偏光儀簡介”, 量測資訊, 66期, 15頁, 民國 88年 【41】Nanofilm Ellipsometry System EP3使用指導書 【42】P.E. Frandsen, K. Jonasson, H.B. Nielsen, O. Tingleff, “Unconstrained optimization”, handout 【43】Antonio Luque and Stevn Hegedus, “Handbook of Photovoltaic Science and Engineering”, Wiley, 2003 【44】蔡進譯, ”超高效率太陽電池─從愛因斯坦的光電效應談 起', 物理雙月刊, 27卷第五期, p.701, 2005 【45】Virginia Semiconductor, Inc., “Optical Properties of Silicon” 【46】A.G. Barriuso, J.J. MonzÓn, L.L. Sánchez-Soto and A. Felipe,“Assessing approximate broadband omnidirectional antireflection”, Optics Communications, vol.270, p.116, 2007 【47】M.R.Krames, M.Ochiai-Holcomb, G.E. Hofler, C.Carter- Coman, E.I. Chen, I-H. Tan, P.Grillot, N.F. Gardner, H.C. Chui, J.W. Huang, S.A. Stockman, F.A.Kish, M.G.Craford, T.S.Tan, C.P.Kocot, and M.Hueschen J.Posselt, B.Loh, G.Sasser, D.Collins, “High-power truncated-inverted-pyramid(AlxGa1–x)0.5In0.5P/GaP light-emitting diodes exhibiting >50 external quantum efficiency”, Appl. Phys. Lett., 75, p.2365, 1999 【48】E.F. Schubert, “Light-Emitting Diode”, Cambridge University Press (2003). 【49】R. Swanepoel, “Determination of the thickness and optical constants of amorphous silicon”, J. Phys. E:Sci. Instrum., vol.16, p.1214, 1983 【50】J.C. Manifacier, J.Gaslot and J.P. Fillard, “A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film”, J. Phys. E:Sci. Instrum., vol. 9, p.1002, 1976 | |
dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/42030 | - |
dc.description.abstract | 在本論文中,首先介紹多層膜理論分析及最佳化方法,作為抗反射膜設計的理論基礎。一方面利用反應性射頻磁控濺鍍來成長氮氧化矽薄膜,另一方面藉由數值模擬方法,設計可見光波段、廣角度的抗反射膜。雖然中間折射率材無法調製出,但仍獲得氮化矽(折射率2.03)及氧化矽(折射率1.46)的膜材,我們定義評估函數 來評估設計膜在可見光波段、廣角度下的抗反射效能,並利用共軛梯度法來最佳化之。我們對太陽電池及發光二極體做簡單假設,實際設計抗反射膜,入射光在可見光波段、0˚~70˚入射角下從空氣到太陽電池僅具有4.46%的低平均反射率;而氮化鎵發光二極體在藍光波長(470nm)及綠光波長(525nm)下,排除全反射效應,從元件發出的光僅有3.04%和3.05%的光被反射。最後,我們也了解當抗反射波段、角度範圍的要求增加,要達到低平均反射率的條件愈嚴苛,實驗上厚度的控制要求要愈精準。 | zh_TW |
dc.description.abstract | In this thesis, we applied the multilayer theory and conjugate gradient optimization method to design the anti-reflection coating layers for GaN-based light emitting diode (LED) and crystalline silicon solar cells. Based on the refractive indices (2.03 and 1.46) of SiOxNy thin films fabricated by RF reactive magnetron sputtering, we designed approximate broadband omnidirectional anti-reflection coating using numerical computation. A merit function was defined to estimate the performance of anti-reflection coating for wide incident angle within the visible range, Using the two-layer anti-reflection design with layer refractive indices of 2.03 and 1.46, our optimized reflectance of bi-layer antireflection coating is about 4.46%, which is averaged over wavelength range of 400 ~ 700nm and incident angle range of 0˚~70˚ . For LEDs, average reflectance (below critical angle ~ 24˚) as low as 3.04% and 3.05% are achieved for blue light (wavelength centered at 470nm) and green light (wavelength centered at 525nm), respectively. In this study, we also found that more accurate control of the bilayer thickness is required while taking broad wavelength and wide incident angle into account. | en |
dc.description.provenance | Made available in DSpace on 2021-06-15T00:42:53Z (GMT). No. of bitstreams: 1 ntu-97-R95941089-1.pdf: 2560081 bytes, checksum: e54a3612bfe1116b792457ebc46b59d4 (MD5) Previous issue date: 2008 | en |
dc.description.tableofcontents | 目錄
誌謝 Ⅰ 摘要 Ⅱ Abstract Ⅲ 目錄 Ⅳ 圖目錄 Ⅵ 表目錄 Ⅸ 第一章 緒論 1.1 前言 1 1.2 研究背景與動機 1 1.3 參考文獻 3 第二章 基本原理 2.1 多層膜理論分析 7 2.2 最佳化方法 12 2.3 光學薄膜常數量測方法 14 2.4 參考文獻 18 第三章 實驗方法與儀器原理 3.1 實驗設備 19 3.1.1 反應性射頻磁控濺鍍系統 19 3.2 量測裝置 20 3.2.1 紫外光/可見光光度計 20 3.2.2 薄膜量測儀 22 3.3 實驗流程與步驟 23 3.3.1 基板清潔工作 23 3.3.2 濺鍍機反應腔體清潔工作 24 3.3.3 反應性磁控濺鍍機操作流程 25 3.4 薄膜性質量測 26 3.4.1 量測步驟 26 3.4.2 量測結果與討論 27 3.5 參考文獻 30 第四章 抗反射膜的設計 4.1 程式架構與說明 33 4.2 於太陽電池上的應用 37 4.3 於發光二極體上的應用 45 4.4 參考文獻 58 第五章 結論 59 附錄A 包絡線法 61 參考文獻 66 | |
dc.language.iso | zh-TW | |
dc.title | 寬波段廣角度抗反射膜設計之研究 | zh_TW |
dc.title | Design of approximately omnidirectional broadband anti-reflection coating | en |
dc.type | Thesis | |
dc.date.schoolyear | 96-2 | |
dc.description.degree | 碩士 | |
dc.contributor.oralexamcommittee | 吳志毅(Chih-I Wu),吳育任(Yuh-Renn Wu),魏大欽(Ta-Chin Wei),李敏鴻(Min-Hung Lee) | |
dc.subject.keyword | 抗反射膜,共軛梯度法,廣角度, | zh_TW |
dc.subject.keyword | anti-reflection coating,conjugate gradient method,wide angle, | en |
dc.relation.page | 66 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2008-09-01 | |
dc.contributor.author-college | 電機資訊學院 | zh_TW |
dc.contributor.author-dept | 光電工程學研究所 | zh_TW |
顯示於系所單位: | 光電工程學研究所 |
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