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  1. NTU Theses and Dissertations Repository
  2. 電機資訊學院
  3. 資訊工程學系
請用此 Handle URI 來引用此文件: http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/36614
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DC 欄位值語言
dc.contributor.advisor傅楸善
dc.contributor.authorJyun-Sian Jhuen
dc.contributor.author朱峻賢zh_TW
dc.date.accessioned2021-06-13T08:07:53Z-
dc.date.available2006-07-21
dc.date.copyright2005-07-21
dc.date.issued2005
dc.date.submitted2005-07-21
dc.identifier.citation[1] Z. Rahman, D. J. Jobson, and G. A. Woodell, “Properties and Performance of a Center/Surround Retinex,” IEEE Transactions on Image Processing, Vol. 6, No. 3, pp. 451-462, 1997.
[2] K. Rockwell, “Automatic Multi-Pattern Metering,” http://www.kenrockwell.com/nikon/matrix01.htm, 2000.
[3] C. C. Yu, “Automatic Exposure with Fuzzy Control,” Master Thesis, Department of Computer Science and Information Engineering, National Taiwan University, 2004.
dc.identifier.urihttp://tdr.lib.ntu.edu.tw/jspui/handle/123456789/36614-
dc.description.abstract照片拍出來的亮暗,主要是由自動曝光來控制。實際生活中,我們要拍的景都非常不同,很難用一種簡單的測光方式去符合各種景。Nikon提出一種AMP的測光方式,使用表格對照的方式來解決各種景的分析,再藉由分析天氣和對比的情況來選擇適合的演算法。C. C. Yu使用模糊控制、主體擴張、多重參考表格的方式來改善AMP的效能。我們新的演算法使用了對焦的資訊,並用更精簡的測光演算法達到更好的效果。
另外,Yu也提出最佳曝光照片選擇演算法,主要目的是選出人眼最喜歡的照片。我們修改了演算法,使得選出來的照片會有更大的機率符合大部份的人喜好。
zh_TW
dc.description.abstractAutomatic exposure (AE) controls the light intensity of pictures. In real life, the scenes are too many and diverse to analyze. The common AE metering methods do not work for all scenes, so Nikon’s Automatic Multiple Pattern (AMP) metering algorithm [2] solves these problems. It analyzes large image data, and constructs reference tables. AMP chooses a better metering method by considering weather and contrast conditions. C. C. Yu’s AE metering algorithm [3] solves some problems of AMP method with fuzzy control, subject growing, and multiple reference tables. Our new metering algorithm utilizes the focus information and is simpler and smaller than AMP and C. C. Yu’s algorithms.
Moreover, C. C. Yu proposes an optimal exposure selector (OES) to choose one of pictures with different exposures and to satisfy people preference. We modify the OES factors to achieve precise results.
en
dc.description.provenanceMade available in DSpace on 2021-06-13T08:07:53Z (GMT). No. of bitstreams: 1
ntu-94-R92922112-1.pdf: 2002570 bytes, checksum: f29ae0087fa5e1a34da65eab0f3ce1e5 (MD5)
Previous issue date: 2005
en
dc.description.tableofcontentsChapter 1 Introduction .........................1
1.1 Auto Exposure ..............................1
Chapter 2 Previous Works .......................1
2.1 Automatic Multiple Pattern .................1
2.1.1 Scene Classification .....................2
2.1.2 Cut Process ..............................3
2.2 AMP with Fuzzy Control .....................6
2.2.1 Subject Growing ..........................6
2.2.2 Fuzzy Control ............................7
2.2.3 Multiple Reference Tables ................7
Chapter 3 Center/Focus Metering Algorithm ......8
3.1 Subject Growing ............................8
3.2 Center/Focus Metering Algorithm ...........10
3.2.1 Subject Detection .......................11
3.2.2 Analysis of Scene Classification ........14
3.2.3 AE Metering Function ....................15
3.3 Experiments ...............................18
3.4 Conclusion ................................25
Chapter 4 Optimal Exposure Selector ...........25
4.1 AE Bracketing .............................25
4.2 Optimal Exposure Selector .................27
4.3 Modification ..............................29
4.4 Experiments ...............................32
Chapter 5 Future Work .........................38
5.1 Future Work ...............................38
References ....................................39
dc.language.isoen
dc.subject自動曝光zh_TW
dc.subject對焦zh_TW
dc.subject最佳曝光照片選擇演算法zh_TW
dc.subjectOptimal Exposure Selectoren
dc.subjectAuto Exposureen
dc.subjectFocusen
dc.title中央/對焦之測光方法應用於自動曝光zh_TW
dc.titleAutomatic Exposure with Center/Focus Meteringen
dc.typeThesis
dc.date.schoolyear93-2
dc.description.degree碩士
dc.contributor.oralexamcommittee邱健平,劉俊鑫,林錦池
dc.subject.keyword自動曝光,對焦,最佳曝光照片選擇演算法,zh_TW
dc.subject.keywordAuto Exposure,Focus,Optimal Exposure Selector,en
dc.relation.page39
dc.rights.note有償授權
dc.date.accepted2005-07-21
dc.contributor.author-college電機資訊學院zh_TW
dc.contributor.author-dept資訊工程學研究所zh_TW
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