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完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 廖英志(Ying-Chih Liao) | |
dc.contributor.author | Ying-Han Hung | en |
dc.contributor.author | 洪英瀚 | zh_TW |
dc.date.accessioned | 2021-06-13T06:36:01Z | - |
dc.date.available | 2021-12-31 | |
dc.date.copyright | 2011-07-29 | |
dc.date.issued | 2011 | |
dc.date.submitted | 2011-07-25 | |
dc.identifier.citation | 1. 劉致中, 林國權, 王世杰, 葉仰哲, 新興印刷電子特用材料與化學品商機探索 : New opportunities for the printed electronics materials and chemicals, 2010, 工業技術研究院產業經濟與趨勢研究中心: 新竹縣竹東鎮.
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Progress In Energy And Combustion Science, 2010. 36(5): p. 554-580. 34. Bonn, D., J. Eggers, J. Indekeu, J. Meunier, E. Rolley, Wetting and spreading. Reviews Of Modern Physics, 2009. 81(2): p. 739-805. 35. Hirt, C.W., Direct Computation of Dynamic Contact Angles and Contact Lines, in ECC99 Coating Conference1999: Germany. 36. Prasad, T., B. Ram, T. Rao, Potentiometric Study Of The Kinetics Of Oxidation Of Formaldehyde, Acetaldehyde, Propionaldehyde And Normal-Butyraldehyde By Ammonical Silver-Nitrate. Current Science, 1982. 51(15): p. 749-751. 37. Deegan, R., O. Bakajin, T. Dupont, G. Huber, S. Nagel, T. Witten, Capillary flow as the cause of ring stains from dried liquid drops. Nature, 1997. 389(6653): p. 827-829. 38. Hirt, C.W., Simulating the Residue left by Evaporating Drops, 2008. 39. Hirt, C.W., A Surface Tension Model Update, 1999. 40. Shimada, T., H. Nakai, T. Homma, Density functional theory study on the reaction mechanism of reductants for electroless Ag deposition process. Journal Of The Electrochemical Society, 2007. 154(4): p. D273-D276. 41. Koura, N., Electroless Plating of Silver, in Electroless Plating: Fundamentals and Applications, G.O. Mallory and J.B. Hajdu, Editors. 1990, William Andrew Publishing/Noyes. p. 441-462. 42. Richmond, H.H., G.S. Myers, G.F. Wright, The Reaction between Formaldehyde and Ammonia. Journal of the American Chemical Society, 1948. 70(11): p. 3659-3664. 43. Duineveld, P., The stability of ink-jet printed lines of liquid with zero receding contact angle on a homogeneous substrate. Journal Of Fluid Mechanics, 2003. 477: p. 175-200. 44. Kang, B.J., J.H. Oh, Geometrical characterization of inkjet-printed conductive lines of nanosilver suspensions on a polymer substrate. Thin Solid Films, 2010. 518(10): p. 2890-2896. | |
dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/34874 | - |
dc.description.abstract | 噴墨印刷技術製作電子元件具有節省原料、使用可撓曲基材、易於放大面積、非接觸式、不需開模等特性,有相當潛力應用於電子產業。
金屬導線為電子元件中最基本的部份。噴墨製作金屬導線一般需要經200°C、 30分鐘以上的燒結過程,才可使其電阻率降至均相銀的三倍左右。高溫除了限制 基材的選擇,也使其無法配合不可加熱的應用。 以無電鍍銀為基礎的反應式噴墨銀可能為此問題的解決辦法。本研究以銀氨溶 液和甲醛溶液為材料,發展雙噴頭反應式噴墨製作銀導線之技術。 研究分為兩部份,我們先以計算流體力學軟體FLOW3D模擬不同之雙噴頭噴 法,評估於30°、45°、60°之斜向碰撞和撞擊液膜等過程中反應物溶液的混合 效果。我們發現於不論採取何種碰撞方式,均無助於反應物溶液混合。但碰撞後 所形成之反應物濃度分佈,使得撞擊液膜方式之後續擴散混合效果較斜向碰撞高 出一個數量級。此外,於過程中我們也發現斜向碰撞會生成非圓形的液體形狀, 可能有助於提升導線之平整性。 之後我們以MicroFab JetLab 4機台實際進行噴墨程序,探討墨水組成、甲醛 和銀氨溶液的噴墨先後次序、點距與噴法、清洗、烘烤溫度對噴墨程序的影響。 我們發現銀氨溶液的氨水含量應盡量降低以利於機台操作,先噴甲醛再噴銀氨溶 液會有較多的銀生成,噴墨後清洗可去除不純雜質。我們以點距25 μm,交錯陣 列的噴墨方式製作出長1 cm,寬250 μm,厚約200 nm的銀導線。於70、100、 150°C烘烤下,其電阻率為均相銀之15至8.7倍。 | zh_TW |
dc.description.provenance | Made available in DSpace on 2021-06-13T06:36:01Z (GMT). No. of bitstreams: 1 ntu-100-R98524075-1.pdf: 11014680 bytes, checksum: 8e19b922bb9f61d0989311641495e468 (MD5) Previous issue date: 2011 | en |
dc.description.tableofcontents | 口試委員審定書 ........................................................................... i
誌謝 ......................................................................................... ii 摘要 ........................................................................................ iii 英文摘要 .................................................................................. iv 目錄 ........................................................................................ vi 圖目錄 .................................................................................... vii 表目錄 ..................................................................................... ix 第1章 緒論 ............................................................................. 1 第2章 文獻回顧 ....................................................................... 8 第1節 噴墨技術 ............................................................................. 8 第2節 噴墨導線電極 ...................................................................... 13 第3節 反應式噴墨 ......................................................................... 16 第4節 液滴碰撞 ............................................................................ 16 第3章 數值模擬 ..................................................................... 22 第1節 流體力學 ............................................................................ 22 第2節 質量傳遞 ............................................................................ 24 第3節 化學反應 ............................................................................ 26 第4節 數值方法 ............................................................................ 28 第5節 參數設定 ............................................................................ 28 第6節 結果討論 ............................................................................ 33 第4章 雙噴頭噴墨製作銀導線 ................................................... 45 第1節 反應原理 ............................................................................ 45 第2節 材料與設備 ......................................................................... 46 第3節 噴墨製程 ............................................................................ 54 第4節 結果討論 ............................................................................ 55 第5章 結論 ........................................................................... 76 參考文獻 ................................................................................. 77 | |
dc.language.iso | zh-TW | |
dc.title | 化學還原法製作銀導線之雙噴頭噴墨製程 | zh_TW |
dc.title | Dual-Channel Inkjet Printed Conductive Silver Lines via Chemical Reduction Method | en |
dc.type | Thesis | |
dc.date.schoolyear | 99-2 | |
dc.description.degree | 碩士 | |
dc.contributor.oralexamcommittee | 徐振哲(Cheng-Che Hsu),盧彥文(Yen-Wen Lu) | |
dc.subject.keyword | 印刷電子,無電鍍,金屬化,液滴撞擊,計算流體力學, | zh_TW |
dc.subject.keyword | Printed Electronics,Electroless Plating,Metallization,Drop impact,CFD, | en |
dc.relation.page | 82 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2011-07-25 | |
dc.contributor.author-college | 工學院 | zh_TW |
dc.contributor.author-dept | 化學工程學研究所 | zh_TW |
顯示於系所單位: | 化學工程學系 |
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