請用此 Handle URI 來引用此文件：
http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/33994完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 林金全(King-Chuen Lin) | |
| dc.contributor.author | Ming-Shiang Chen | en |
| dc.contributor.author | 陳明祥 | zh_TW |
| dc.date.accessioned | 2021-06-13T05:51:00Z | - |
| dc.date.available | 2006-07-14 | |
| dc.date.copyright | 2006-07-14 | |
| dc.date.issued | 2006 | |
| dc.date.submitted | 2006-07-05 | |
| dc.identifier.citation | 1. Saad, S. M. HASSAN; EL-SHAHAWI, M. S.; OTHMAN ,A. M.; M. A. MOSAAD ANALYTICAL SCIENCES 2005, 21, 673.
2. Walsh, G. E. ; Bahner, L. H. ; Environ. Pollut. Ser. A 1980, 21, 169. 3. Bhattacharyya, K. G. ; Sharma, A. ; J. Environ. Manag. 2004 ,71 , 217. 4. Walker, G. M. ; Weatherley, L. R. Water Res. 1997, 312, 93. 5. Walker, G. M. ; Weatherley, L. R. Environ. Pollut. 1998, 99 , 133. 6. Chern, J. M. ; Wu, C. Y. Water Res. 2001, 35, 4159. 7. Allen, S. J., in: G. McKay (Ed.), Use of Adsorbents for the Removal of Pollutants from Wastewaters, CRC Press, Boca Raton, FL, 1996 8. Miljanic, S. ; Cimerman, Z. ; Frkanec, L. ; Zinic, M. Anal. Chim. Acta 2002, 468, 13. 9. Visser, A.J.W.G. ; Vos, K. ; Hoek, Van ; Santema, J. S. J. Phys. Chem. 1988, 92, 759. 10. Zandvoort, M.A.M.J. Van ; Vossen, D.L.J. ; Ginkel, G. Van ; Torre, R. ;Bartolini, P. ; Ricci, M. ; Thomas-Oates, J. ; Zuilhot, H. Phys. Chem.Chem. Phys. 1999, 1, 4571. 11. Tanaka, K.; Miura, T.; Umezawa, N.; Urano, Y.; Kikuchi, K.; Higuchi, T.; Nagano, T. J. Am. Chem. Soc. 2001, 123, 2530. 12. Peterson, O. G. ; Tuccio, S. A. ; Snavely, B. B. Appl. Phys. Lett. 1970, 17, 245. 13. Tptygin, D. ; Packard, B. Z. ; Brand, L., Chem. Phys. Lett. 1997, 277, 430. 14. Ghasemi, J ; Niazi, A ; Kubista, M , Spectrochimica Acta Part A 2005, 62, 649. 15. Ilich, P ; Mishra, P. K. ; Macura, S; Burghardt, T. P. , Spectrochimica Acta Part A 1996, 52, 1323. 16.Ballard J. ; Strong K. ; Remedios J. J. ; Page M. ; Johnston W. B., J. Quant. Spectrosc. Radiat. T ransfer, 1994, 52, 677. 17. Scherer J. J. ; Paul J. B. ; O’Keefe A. ; Saykally R. J.. Chem. Rev. 1997, 97, 25. 18. O’Keefe, A.; Scherer, J. J.; Cooksy, A. L.; Sheeks, R.; Heath, J.; Saykally, R. J. Chem. Phys. Lett. 1990, 172, 214. 19. Heath, J. R. ; Cooksy, A. L. ; Gruebele, M. H. W. ; Schmuttenmaer,C. A. ; Saykally, R. J. Science 1989, 244, 564. 20. Benard, D. J. ; Winker, K. B. J. Appl. Phys. 1991, 69, 2805. 21. Yu, T. ; Lin, M. C. J. Am. Chem. Soc. 1993, 115, 4371. 22. Hsu, C. Y. ; Huang, H.Y. ; Lin, K.C. , J. Chem. Phys. 2005, 123, 134312. 23. Snyder, K. L.; Zare, R. N. Anal. Chem. 2003, 75, 3086. 24. Scherer, J. J., Chem. Phys. Lett., 1998, 292, 143. 25. Scherer, J. J. Paul, J. B.; Jiao, H. ; O’Keefe, A. Appl. Opt., 2001,40, 6725. 26. Ball, S. M.; Jones, R. L. Chem. Rev., 2003, 103, 5239. 27. Ball, S. N.; Povey, I. M.; Norton, E. G.; Jones, R. L. Chem.Phys. Lett., 2001, 342, 113. 28. Hallock, A. J. Berman, E. S. F. ; Zare, R. N. Anal. Chem., 2002,74, 1741. 29. Pipino, A. C. R. ; Hudgens, J. W. ; Huie, R. E. Chem. Phys. Lett.,1997, 280, 104. 30. Shaw, A. M. ; Hannon, T. E. ; Li R. ; Zare, R. N. J. Phys. Chem.B, 2003, 107, 7070. 31. O’Reilly, J. R. ; Butts, C. P. ; l’Anson, I. A. ; Shaw, A. M. J. Am.Chem. Soc., 2005, 127, 1632. 32. Muir, R. N. ; Alexander, A. J. Phys. Chem. Chem. Phys., 2003, 5, 1279. 33. Romanini, D. ; Lehmann, K. K. J. Chem. Phys. 1993, 99, 6287. 34. Jongma, R. T. ; Boogaarts, M. G. H. ; Holleman, I. ; Meijer, G. Rev. Sci. Instrum. 1995, 66, 2821. 35. Meijer, G. ; Boogaarts, M. G. H.; Jongma, R. T.; Parker, D. H.;Wodtke, M. A. Chem. Phys. Lett. 1994, 217, 112. 36. Zalicki, P. ; Zare, R. N. J. Chem. Phys. 1995, 102, 2708. 37. Martin, J. ; Paldus, B. A. ; Zaliki, P. ; Wahl, E. H. ; Owano, T. G. ; Harris, J. S. ; Kruger, C. H.; Zare, R. N. Chem. Phys. Lett. 1996, 258, 63. 38. O’Keefe, A. ; Deacon, D. A. G. Rev. scient. Instrum. 1988, 59, 2544. 39. Peter, W. M. ; Joseph, H. E. Laser 1998. 40. Hodges, J. T. ; Looney, J. P. ; Van Zee, R. D. J. Chem. Phys. 1996 105, 10278. 41. Voges A. B. ; Al-Abadleh H. A. ; Musorrafiti M. J. ; Bertin P. A. ;guyen S. T. ; Geiger F. M. J. Phys. Chem. B 2004, PAGE EST: 7.8. 42. Jeon B .J. ; Hah H. J. ; Koo S. M. Journal of Ceramic Processing Research. 2002, 3, 216. 43. Nawrocki, J. J. Chromatogr., A 1997, 779, 29. 44. Tan, L. C.; Carr, P. W.; Abraham, M. H. J.Chromatogr., A 1996, 752, 1. 45.Brinker, C. J.; Scherer, G. W. Sol-Gel Science: The Physics and Chemistry of Sol-Gel Processes; Academic Press: New York, 1990. 46. The Colloid Chemistry of Silica; Bergna, H. E., Ed.; Advances in Chemistry Series 234; American Chemistry Society: Washington, DC, 1994. 47. Chuang, I. S.; Maciel, G. E. J. Phys. Chem. B 1997, 101, 3052. 48. Ong, S. W.; Zhao, X. L.; Eisenthal, K. B. Chem. Phys. Lett. 1992, 191, 327.. 49. Allen, L. H.; Matijevic, E.; Meites, L. J. Inorg. Nucl. Chem. 1971, 33, 1293. 50. Bolis, V.; Cavenago, A.; Fubini B. Langmuir 1997, 13, 895. 51. Labouriau, A. ; Higley, T. J. ; Earl, W. L. J. Phys. Chem. 1998, 102, 2897. 52. Chuang, I. S.; Maciel, G. E. J. Am. Chem. Soc. 1996, 118, 401. 53. Dong, Y. ; Pappu, S. V. ; Zhi, Xu. Anal. Chem. 1998, 70, 4730. 54. Shaw, A. M. ; Hannon, T. E. ; Li ,R. and Zare, R. N. J. Phys. Chem.B, 2003, 107, 7070. 55. Jung, L. S.; Campbell, C. T. Sticking probabilities in adsorption from liquid solutions: Alkylthiols on gold. Phys. Rev. Lett. 2000, 84, 5164. 56. Jung, L. S.; Campbell, C. T. Sticking probabilities in adsorption of alkanethiols from liquid ethanol solution onto gold. J. Phys. Chem. B 2000, 104, 11168. 57. Georgiadis, R.; Peterlinz, K. P.; Peterson, A. W. Quantitativemeasurements and modeling of kinetics in nucleic acid monolayer films using SPR spectroscopy. J. Am. Chem. Soc. 2000, 122, 3166. 58. Adamson, A. W. Physical Chemistry of Surfaces, 5th ed.; John Wiley & Sons: New York, 1990. 59. Karpovich, D. S.; Blanchard, G. J. Direct Measurement of theAdsorption Kinetics of Alkanethilate Self-Assembled Monolayers on aMicrocrystalline Gold Surface. Langmuir 1994, 10, 3315. 60. Mifflin, A. L.; Gerth, K. A.; Geiger, F. M. J. Phys. Chem. A 2003,107, 9620. 61. Al-Abadleh, H. A. ; Mifflin, A. L. ; Musorrafiti, M. J. ; Geiger, F. M. J. Phys. Chem. B 2005, 109, 16852. 62. Lars, L. H. Christensen Analytical Biochemistry 1997, 249, 153. 63. Karlsson, R. ; Roos, H. ; Fa¨gerstam, L. G. ; Persson, B. Methods Companion Methods Enzymol. 1994, 6, 99. 64. Fogler, H. S. Elements of Chemical Reaction Engineering, 3rd ed.;Prentice Hall PTR: Upper-Saddle River, NJ, 1999 65. Ong, S. W. ; Zhao, X. L. ; Eisenthal, K. B. Chem. Phys. Lett. 1992, 191, 327. 66. Xu, Z. ; Li, J. W. ; Dong, Y. Langmuir 1998, 14, 1183. 67. Bolis, V. ; Cavenago, A. ; Fubini, B. Langmuir 1997, 13, 895. 68. Pelmenschikov, A. G. ; Morosi, G . ; Gambaf, A. J. Phys. Chem. 1993, 97, 11979. 69. Tarasevich, Y. I. ; Polyakov, V. E. ;Serdan, A. A. ; Lisichkin, G. V. Colloid Journal, 2004, 66, 592. 70. Natal-Santiago, M. A. ; Dumesic, J. A. Journal of catalysis 1998, 175, 252. 71. Chu, K. H. ; Hashim, M. A. J. Chem. Technol. Biotechnol, 2004 , 77, 685. 72. Robin, H. A. Ras ; Németh J. Johnston, C. T. ; Dékány, I. ;Schoonheydt, R. A. Phys . Chem. Chem. Phys, 2004 , 6 , 5347. 73. Kikteva, T. ; Star, D. ; Zhao, Z. ; Tammy, L. Baisley. ;Leach, G.W. J. Phys. Chem. B 1999, 103, 1124. 74. Qian, G. ; Wang, M. J. Phys. D: Appl. Phys. 1999, 32, 2462. 75. Wirth, M. J.; Burbage, J. D. Anal. Chem. 1991, 63, 1311. 76.Voges, A. B. ; Al-Abadleh, H. A. ; Musorrafiti, M. J. ; Bertin, P. A. ;Nguyen, S. T. ; Geiger, F. M. J. Phys. Chem. B 2004 PAGE EST: 7.8 77. Uchida, T ; Yamaguchi, A. ; Ina, T. , Teramae, N. J. Phys. Chem. B, 2000, 104, 12091. 78. Ong, S. W.; Zhao, X. L. ; Eisenthal, K. B. Chem. Phys. Lett. 1992, 191, 327. 79. Xu, Z. ; Li, J. W. ; Dong, Y. Langmuir 1998, 14, 1183. 80. Bard, A. J.; Faulkner, L. R. Electrochemical Methods: Fundamentalsand Applications, 2nd ed.; Wiley & Sons: New York, 2001. 81. Intermolecular and Surface Forces, 2nd ed.; Israelachvili, J., Ed.;Academic Press: London, 1992. 82. Shaw, A. M.; Hannon, T. E.; Li, F.; Zare, R. N. J. Phys. Chem. B 2003, 107, 7070. 83. Fan, H. F. ; Hung, C. Y. ; Lin, K. C. Anal. Chem. 2006, 78, 3583 84. Uchida, T ; Yamaguchi, A. ; Ina, T. ; Teramae, N. J. Phys. Chem. B, 2000 104 , 12091. 85. Dong, Y. ; Pappu, S. V. ; Zhi, Xu. Anal. Chem. 1998, 70, 4730. | |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/33994 | - |
| dc.description.abstract | 摘要
Rhoadmine B目前在工業上有著相當多的應用，舉凡如衣服染色、一些工業顏料等等。然而所產生的這些工業的廢水，必須要做一些適當的處理，以免讓這些有毒的廢液直接排入我們生存的環境中，而最常用來移除這些有毒物質的方法即為吸附。 本實驗是利用腔體震盪光譜法，來觀測染料吸附在矽石（silica）表面上的現象。實驗主要為用兩片高反射率的鏡子（R>99%），並且在這兩片高反射率的鏡子中間，加上矽石材質的稜鏡，入射此稜鏡的雷射光經由布魯斯特角（Brewster angle），最後產生全反射的漸逝波，樣品及吸收這些漸逝波。 我們最主要是觀察Rhoadmine B在甲醇和矽石介面的吸附現象。此實驗最主要的焦點是利用腔體震盪光譜法，去看Rhoadmine B在矽石上的吸附動力學，藉由蘭穆爾吸附模型（Langmuir model），去推導出Rhoadmine B在矽石上的吸附常數（ka）和脫附常數（kd）。 矽石/液體介面的最主要成分是矽醇基（Si-OH），一般來說矽石在大部分的有機溶劑中，都會有少量解離成帶負電的（Si-O-），而Rhoadmine B為帶部分正電的染料，藉此來看其吸附的現象;我們亦將矽石表面修飾為疏水性的介面，比較這兩種不同介面的吸附情形。 我們也對Rhoadmine B在不同pH值下，看兩種不同Rhoadmine B形式（RB Zwitterion 和RBH+）的吸附常數。藉由蘭穆爾的競爭吸附模型，我們成功的得到這兩種形式吸附在矽石表面上的吸附常數。 | zh_TW |
| dc.description.provenance | Made available in DSpace on 2021-06-13T05:51:00Z (GMT). No. of bitstreams: 1 ntu-95-R93223055-1.pdf: 1856412 bytes, checksum: fd437a972baf1096205edf32186d248a (MD5) Previous issue date: 2006 | en |
| dc.description.tableofcontents | 目錄
謝誌.....................................................Ⅲ 摘要.....................................................Ⅴ 一、引言.................................................1 二、腔體震盪光譜.........................................8 2-1 腔體震盪光譜的簡介...................................8 2-2 腔體震盪光譜的一些應用...............................11 2-2-1寬頻的腔體震盪光譜..................................16 2-2-2 利用腔體震盪光譜測量固態樣品.......................19 2-3 腔體震盪光譜的原理...................................21 三、實驗部分.............................................30 3-1實驗架設..............................................30 3-2實驗樣品處理以及數據擷取..............................36 3-3 矽石/液體的介面......................................40 四、結果與討論...........................................46 4-1 蘭穆爾分析模型.......................................46 4-2 考慮質量轉移效應.....................................67 4-3 矽石/甲醇介面的情形..................................70 4-4 從脫附過程可得的訊息.................................73 4-5 將稜鏡的表面做修飾...................................76 4-6 觀察Rhodamine B在TMS下的吸附和脫附...................79 結論.....................................................83 五、Rhodamine B在不同pH值的矽石/水的介面.................86 5-1 Rhodamine B在水中的情形..............................86 5-2實驗裝置..............................................86 5-3結果與討論............................................87 結論....................................................100 | |
| dc.language.iso | zh-TW | |
| dc.subject | 吸附 | zh_TW |
| dc.subject | 腔體震盪光譜 | zh_TW |
| dc.subject | 脫附速率 | zh_TW |
| dc.subject | Rhodamine B | en |
| dc.subject | CRDS | en |
| dc.subject | adsorption | en |
| dc.subject | desorption | en |
| dc.title | 利用腔體震盪光譜觀察Rhodamine B在液體/矽
石介面上的吸附現象 | zh_TW |
| dc.title | Using cavity-ring down absorption spectroscopy to observe
Rhodamine B adsorbed on silica/liquid interface | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 94-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 周必泰(Pi-Tai Chou),張大釗(Ta-Chau Chang) | |
| dc.subject.keyword | 腔體震盪光譜,吸附,脫附速率, | zh_TW |
| dc.subject.keyword | CRDS,Rhodamine B,adsorption,desorption, | en |
| dc.relation.page | 101 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2006-07-06 | |
| dc.contributor.author-college | 理學院 | zh_TW |
| dc.contributor.author-dept | 化學研究所 | zh_TW |
| 顯示於系所單位： | 化學系 | |
文件中的檔案：
| 檔案 | 大小 | 格式 | |
|---|---|---|---|
| ntu-95-1.pdf 未授權公開取用 | 1.81 MB | Adobe PDF |
系統中的文件，除了特別指名其著作權條款之外，均受到著作權保護，並且保留所有的權利。