請用此 Handle URI 來引用此文件:
http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/33723
完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 謝國煌 | |
dc.contributor.author | Chuan-Hao Hsu | en |
dc.contributor.author | 徐傳浩 | zh_TW |
dc.date.accessioned | 2021-06-13T05:45:05Z | - |
dc.date.available | 2015-07-12 | |
dc.date.copyright | 2006-07-24 | |
dc.date.issued | 2006 | |
dc.date.submitted | 2006-07-12 | |
dc.identifier.citation | 1. 李榮哲, LCD彩色濾光片材料.
2. 楊承哲, “活性團聯共聚合物接枝包覆碳黑之奈米複合微粒的合成、性質與溶劑中分散特性”國立台灣大學化學工程學研究所碩士學位論文,(2002). 3. 爐法碳黑的典型性質-特殊碳黑, 卡博特公司.(1999) 4. Accorsi, J Romero, Eduardo, “Special carbon blacks for plastics”, Plastics Engineering, April 01, 29. (1995) 5. 染料雜誌, 技術資訊:染料顏料- “第六章 黑色顏料”. (1999) 6. 陳偉源, “彩色濾光片之高光學密度黑色矩陣研究”國立台灣大學高分子科學與工程學研究所碩士學位論文,(2002). 7. 張義和, “Polymeric Surfactant 在顏料分散的應用”,介面化學工業研討會. (2001) 8. T. C. Patton, “Paint flow and pigment dispersion”, John-Wiely & Sons Inc., New Jersey, USA. (1978) 9. 許哲豪, “高光學密度超薄型黑色矩陣用碳黑分散液製備”國立中興大學化學工程學研究所碩士學位論文,(2002). 10. 趙承琛, “介面科學基礎”, 復文書局. (1998) 11. 蕭世明、鄒淑貞、陳治貞, “高機能性樹脂與精密塗料-精密塗料用分散及分散機構”, p.46-53. (2005) 12. 陳仁英, Norbert Stehr . 工業材料, 第185期, p.171-1148. (2002) 13. 徐茂峰、鄒淑貞、蕭世明、張義和, 產業奈米技術應用資訊園地-產業應用專刊.第9卷, p168-176.(2004) 14. M. J. Rosen, “Surfactants and interfacial phenomena”, John Wily&Sons, Inc., New York(1978). 15. Yining Lin, Thomas W.Smith, and Paschalis Alexandridis, “Adsorption of a Polymeric Siloxane Surfactant on Carbon Black Particles Dispersed in Mixtures of Water with Polar Organic Solvents”. Journal of Colloid and Interface Science 255, 1-9.(2002) 16. 李傳宏、陳利君、葉昱昕, 工業材料, 第109期,p.105-114.(2002) 17. Decker, C., UV-radiation curing chemistry. Pigment & Resin Technology, 30(5): p. 278-286(2001). 18. J. P. Fouassier, J.F.R., Radiation Curing in Polymer Science and Technology Vol.2 Photoinitiating systems, p. 1-58.(1993) 19. 劉瑞祥 編譯, 光聚合性組成型, 感光性高分子, p256-295.(1992) 20. Martin, B., UV Curing: Science and Technology, Vol.II, p.109-140. (1985) 21. 日本化學會編, 化學便覽, p. 114.(1975) 22. Allan, N.S., Chemistry & Technology of UV & EB Formulations for Coatings, Inks & Paints,Vol II, p. 37-134.(1991) 23. Huiguang Kou,Anila Asif and WenFang Shi , “Photopolymerization kinetics of Hyperbranched Acrylated Aromatic Polyester”, J. of Appl. Polym.Sci., vol. 89, p.1503.(2003) 24. 陳暉,「UV硬化技術入門(一)」,高分子工業,第三十四期,p.65.(1985) 25. 林子孟,紫外光硬化型樹脂之光硬化動力學及熱物性研究,碩士論文,國立臺北科技大學化學工程系研究所,台北,2003。 26. 石井孝雄,平本立躬,塗裝與塗料,臺北:完善出版社,p.138.(1975) 27. 盧崑宗,「木材之紫外線硬化塗裝」,塗料與塗裝技術,第七十三期,p.27-30.(1999) 28. 張上鎮,「紫外光硬化塗料與塗裝(1)」,塗料與塗裝技術,第二十一期,p.22-30(2001) 29. T. Urano, R. Takasaki, S. Ikeda, and H. Itoh, “High Speed Photopolymer for High Density Black Matrix”, The Imaging Science Journal, Vol.46 (1998). 30. M. Nakahara, T. Takada, H. Kumagai, and Y. Sanada, “Surface Chemistry of Carbon Black Through Curing Process of Epoxy Resin”, Carbon Vol.33,No.11, 1537-1540 (1995). 31. T.Y. Inan, E. Ekinci, A. Kuyulu, amd A, Gungor, “Preparation of novel UV-curable methacrylated urethane resins from a modified epoxy resin and isocyanatoethylmethacrylate (IEM)”, POLYMER BULLETIN, 47 :437-444 (2002). 32. Z. H. Zeng,L. Zhang, J. W. Yang, and Y. L. Chen, “ Structure-property behavior of UV-curable polyepoxy-acrylate hybrid materials prepared via sol-gel process”, JOURNAL OF APPLIED POLYMER SCIENCE, 87 (10): 1654-1659(2003). 33. United States Patent:US 2005/0175930 A1. 34. United States Patent:US 2005/0258406 A1. 35. United States Patent:US 2005/0260523 A1. 36. 俞國平, “雷射光散射法”, 粉粒體粒徑量測技術研討會(2000). 37. M. A. Montes-Moran, D. Suarez, and J. A. Menendez, “On the nature of basic sites on carbon surfaces: an overview” CARBON 40, 1219-1224(2004). 38. C. A. Leon, L. R. Radovic, “Interfacial chemistry and electrochemistry of carbon surfaces” Chemistry and Physics of Carbon, Vol 24, New York: Marcel Dekker; 213–310 (1994). 39. L. R. Radovic, C. C. Moreno, and J. U. Rivera, “Carbon materials as adsorbents in aqueous solutions” Chemistry and Physics of Carbon, vol. 27. New York: Marcel Dekker; 227–405 (2001). 40. S. Peter Pappas “UV CURING: SCIENCE AND TECHNOLOGY”, Volume II, (1985). 41. N. S. Allan, M. S. Johnson, P. K. T. Oldring, and S Salim, “CHEMISTRY & TECHNOLOGY OF UV & EB FORMULATIONS FOR COATINGS, INKS & PAINTS”, VOLUME II, (1991). 42. E. H. Charles, and F. K. James, “Radiation Curing of Polymeric Materials”, American Chemical Society, Washington, DC (1990). 43. Kim, H.D., “Properties of UV-curable polyurethane acrylates for primary optical fiber coating”. Journal of Applied Polymer Science, 46(8), p. 1339-1351.(1992) | |
dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/33723 | - |
dc.description.abstract | 本研究中成功合成出具有-COOH官能基之鹼可洗紫外光可硬化樹脂,在與碳黑混合後可得黑色矩陣光阻劑,再利用微影製程得到線寬100μm、膜厚約1μm之線路圖案,且光學密度值達4.0以上之黑色矩陣。
在所合成之鹼可洗紫外光可硬化樹脂部分,第一種為高分子型:首先利用羥乙基甲丙烯酸酯(2-hydroxyethyl methacrylate)與二異氰酸甲苯(toluene 2,4-diisocyanate)反應形成具有異氰酸基之預聚物;再導入預先合成之丙烯酸(acrylic acid)-甲基丙烯酸苯酯(benzyl methacrylate)-羥乙基丙烯酸酯(2-hydroxyethyl acrylate)共聚物,利用剩餘之異氰酸基與羥乙基丙烯酸酯上之羥基反應,最後可得具有不飽和乙烯鍵之感光性樹脂。第二種為環氧壓克力樹脂改質型: 先利用二異氰酸異佛爾酮(isophorone diisocyanate)與羥乙基甲丙烯酸酯(2-hydroxyethyl methacrylate)反應得具有異氰酸基之預聚物,再導入預先合成之馬來酸酐(maleic anhydride)與環氧壓克力樹脂行開環反應而得酸化之環氧壓克力樹脂,利用剩餘之異氰酸基與酸化後所產生之酸基反應,最後同樣可得具有不飽和乙烯鍵之感光性樹脂。實驗中利用傅立葉轉換紅外光光譜儀及核磁共振儀進行樹脂官能基變化之監控與鑑定、再以凝膠滲透儀分析所得樹脂之分子量,最後利用酸鹼度計測量所合成樹脂之酸度。 在製備黑色矩陣光阻劑部分,將碳黑(carbon black)、樹脂、高分子型分散劑、丙二醇甲醚醋酸酯(PGMEA)、光起始劑、膜平坦劑及氧化鋯磨球混合後,以球磨製程後可得分散均勻之黑色矩陣光阻劑,最後以動態光散射分析儀及穿透式電子顯微鏡觀察碳黑之分散情況,結果顯示碳黑可均勻分散至50~150nm。 利用旋轉塗佈將光阻劑塗佈於玻璃基材上,經過預烤後利用微影製程進行曝光顯影,曝後烤後以光學顯微鏡與掃瞄式電子顯微鏡觀察線路的外觀形態及膜厚,並以熱重損失分析儀測試所得材料之熱性質。本研究結果可得線寬100μm、膜厚1μm且光學密度值達4.0以上黑色矩陣之線路圖案。 | zh_TW |
dc.description.abstract | The synthesis of alkali soluble UV-curable resins with carboxyl group had been fully-developed in this study. After well-mixed with carbon black, the ultra-thin pattern with optical density up to 4.0 could be obtained via the lithography process.
There were two types of the UV-curable resins. One was the polymeric type UV-curable resin. The copolymer (poly(acrylic acid)-co-(benzyl methacrylate)-co-(2-hydroxyethyl acrylate)) was reacted with the oligomer, which was pre-synthesized by toluene 2,4-diisocyanate(TDI) and 2-hydroxyethyl methacrylate(HEMA) and hence the polymeric type UV-curable resin was formed. Another one was the modified epoxy acrylate type UV-curable resin. The prepolymer synthesized by the ring-opening reaction of maleic anhydride and acidification epoxy acrylate was reacted with the oligomer, which was pre-synthesized by isophorone diisocyanate(IPDI) and 2-hydroxyethyl methacrylate(HEMA) to form the modified epoxy acrylate type UV-curable resin. The Fourier transfer infrared spectrometer and nuclear magnetic resonance were utilized to monitor and identify the functional groups of the synthesized resins. And the gel permeation chromatography was used to analyze the molecular weight of the UV-curable resins. The PH meter was utilized to evaluate the acid value of resins. The photo-resist was prepared by mixing up carbon black, resin, polymeric dispersants, propylene glycol monomethyl ether acetate(PGMEA), photo initiator and leveling agent, and followed by the ball mixing process with Zirconium oxide beads. A dynamic light scattering analyzer and transmission electron microscope was utilized to analyze the distribution of carbon black. As a result the narrow size distribution of carbon black between 50~150nm can be obtained. The UV-curable resist was spin-coated on the glass substrate to form a thin film. After pre-baking and lithography technique, the patterns with line-width 100μm can be achieved. An optical microscope and scanning electron microscope were utilized to observe the morphology and the thickness of this thin film. The thermal property of this thin film was studied by a thermogravimetric analyzer. As a result, the ultra-thin film with 1μm thickness and optical density up to 4.0 can be obtained. | en |
dc.description.provenance | Made available in DSpace on 2021-06-13T05:45:05Z (GMT). No. of bitstreams: 1 ntu-95-R93549009-1.pdf: 2432481 bytes, checksum: 189e7d675b181a9c8262745e71871482 (MD5) Previous issue date: 2006 | en |
dc.description.tableofcontents | 摘要……………………………………………………………………Ⅰ
Abstract………………………………………………………………Ⅲ 目錄……………………………………………………………………Ⅴ 表索引…………………………………………………………………Ⅷ 圖索引…………………………………………………………………Ⅹ 第一章 緒論……………………………………………………………1 第二章 文獻回顧………………………………………………………4 2-1 黑色矩陣簡介(Black Matrix)……………………………4 2-1.1 黑色矩陣分類……………………………………5 2-2碳黑……………………………………………………………8 2-2.1 碳黑的種類………………………………………9 2-2.2 碳黑的性質…………………………………………13 2-2.3 碳黑的電學和光學特性……………………………16 2-3碳黑的分散……………………………………………………17 2-3.1 分散劑………………………………………………17 2-4 紫外光可硬化(UV curable)樹脂…………………………21 2-4.1 紫外光硬化簡介……………………………………21 2-4.2 紫外光硬化樹脂之組成……………………………22 2-4.3 影響紫外光硬化的因素……………………………29 2-5 紫外光可硬化樹脂應用於黑色矩陣……………………….31 第三章 實驗……………………………………………………………35 3-1實驗藥品………………………………………………35 3-2實驗儀器………………………………………………42 3-3 實驗流程……………………………………………………47 3-4 實驗方法及實驗條件………………………………………52 3-5 實驗分析及測試方法………………………………………59 第四章 結果與討論……………………………………………………61 4-1 含酸基之紫外光可硬化樹脂製備與特性分析…………….61 4-1.1 化學結構分析………………………………………61 4-1.1.1 FTIR光譜分析……………………………61 4-1.1.2 GPC分子量分析…………………………64 4-1.1.3 NMR分析…………………………………66 4-1.2 樹脂酸度分析………………………………………67 4-2 碳黑分散粒徑分析…………………………………………69 4-2.1 分散劑含量對碳黑粒徑之影響……………………69 4-2.2 穿透式電子顯微鏡(TEM)分析……………………72 4-3 微影製程分析…………………………………………73 4-3.1 預烤及曝後烤溫度分析……………………73 4-3.2 轉速分析………………………………………73 4-3.3光起始劑分析…………………………………74 4-3.4曝光劑量分析…………………………………74 4-4 黑色矩陣線路圖案轉移結果分析…………………………76 4-4.1 光學顯微鏡(OM)觀察………………………………76 4-4.2 掃描式電子顯微鏡(SEM)觀察……………………81 4-4.3 顯影時間對顯影結果的影響………………………82 4-5 光學性質分析………………………………………………83 4-6 耐熱性質分析………………………………………………84 4-7 耐酸、耐鹼性及耐溶性分析…………………………86 第五章 結論……………………………………………………87 第六章 參考文獻………………………………………………90 | |
dc.language.iso | zh-TW | |
dc.title | 彩色濾光片黑色矩陣複合材料之研究 | zh_TW |
dc.title | Studies on Black Matrix Composite of Color Filter | en |
dc.type | Thesis | |
dc.date.schoolyear | 94-2 | |
dc.description.degree | 碩士 | |
dc.contributor.oralexamcommittee | 邱文英,韓錦鈴,鄺東元 | |
dc.subject.keyword | 鹼可洗紫外光可硬化樹脂,碳黑,分散,黑色矩陣,微影製程,光學密度值, | zh_TW |
dc.subject.keyword | Alkali soluble UV-curable resin,Carbon black,Dispersion,Black matrix,Lithography,Optical density, | en |
dc.relation.page | 119 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2006-07-14 | |
dc.contributor.author-college | 工學院 | zh_TW |
dc.contributor.author-dept | 高分子科學與工程學研究所 | zh_TW |
顯示於系所單位: | 高分子科學與工程學研究所 |
文件中的檔案:
檔案 | 大小 | 格式 | |
---|---|---|---|
ntu-95-1.pdf 目前未授權公開取用 | 2.38 MB | Adobe PDF |
系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。