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  1. NTU Theses and Dissertations Repository
  2. 工學院
  3. 機械工程學系
請用此 Handle URI 來引用此文件: http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/32591
完整後設資料紀錄
DC 欄位值語言
dc.contributor.advisor顏家鈺
dc.contributor.authorYao-Ting Maoen
dc.contributor.author毛耀霆zh_TW
dc.date.accessioned2021-06-13T04:12:00Z-
dc.date.available2006-08-01
dc.date.copyright2006-07-28
dc.date.issued2006
dc.date.submitted2006-07-24
dc.identifier.citation[1] In Soh, H.T., Guarini, K.W., Quate, C.F., Scanning probe lithography, Kluwer Academic Publishers, Boston, Dordrecht, London, 2001.
[2] Pe’rez-Murano, F., G. Abadal, N. Barniol, X. Aymerich, J. Servat, P. Gorostiza and F. Sanz, “Nanometer-scale oxidation of Si(100) surfaces by tapping mode atomic force microscopy,” J. Appl. Phys. Vol.78, No.11, pp.6797-6801, 1995.
[3] Avouris, P., T. Hertel and R. Martel, “Atomic force microscope tip-induced local oxidation of silicon: kinetics, mechanism, and nanofabrication,” Appl. Phys. Lett.
[4] Jin X. and W. N. Unertl, “Submicrometer modification of polyemr surfaces
with a surface force microscope,” Appl. Phys. Lett., Vol. 61, No. 6, 10 August 1992.
[5] Dumas, P., M. Gu, C. Syrykh, A. Hallimaoui, F. Salvan, and J. K. Gimzewski, “Nanostructuring of porous silicon using scanning tunneling microscopy,” J. Vac. Sci. Technol., B 12 (3) , pp. 2067-2069, May/Jun.,1994.
[6] Boschung, E., M. Heuberger and G. Dietler, “Energy dissipation during nanoscale indentation of polymers with an atomic force microscope,” Appl. Phys. Lett., 64 (26), pp. 3566-3368, June, 1994.
[7] Shojiro Miyake, “1 nm deep mechanical processing of muscovite mica by atomic force microscopy,” Appl. Phys. Lett., 67 (20), pp. 2925-2927, Nov., 1995.
[8] Gobel, H. and P. von Blanckenhagen, “Atomic force microscope as a tool for metal surface modification,” J. Vac. Sci. Technol., B 13 (3), pp. 1247-1251, May/Jun, 1995.
[9] Bourgoin, J. P., R. V. Sudiwala, and S. Palacin, “High speed layer by layer patterning of phthalocyanine Langmuir-Blodgett films by the atomic force microscope,” J. Vac. Sci. Technol., B 14 (5), pp. 3381-3385, Sep/Oct, 1996.
[10] Sugihara, Hideki, Atsushi Takahara, and Tisato Kajiyama, “Mechanical nanofabrication of lignoceric acid monolayer with atomic force microscopy,” J. Vac. Sci. Technol., B 19 (2), pp. 593-595, Mar/Apr., 2001.
[11] Heyde, M., K. Rademann, B. Cappella, M. Geuss, H. Sturm, T. Spangenberg and H. Niehus, “Dynamic plowing nanolithography on polymethylmethacrylate using an atomic force microscope,” Rev. Sci. Instrm., 72 (1), pp. 136-141, Jan., 2001.
[12] Porter, Jr., Lon A., Alexander E. Ribbe, and Jillian M. Buriak, “Metallic Nanostructures via Static Plowing Lithography,” Nano Letters, 3 (8), pp. 1043-1047, 2003.
[13] Kunze, U and B. Klehn, “Nanolithography with an AFM by means of vector-scan controlled dynamic plowing,” J. Appl. Phys., Vol. 85, pp. 3897-3903, 1999.
[14] Yamamoto, S., H. Yamada, and H. Tokumoto, “Nanometer Modification of Non-Conductive Materials Using Resist-Films by Atomic Force Microscopy,” Jpn. J. Appl. Phys. 1, 34, pp. 3396, 1995.
[15] Sohn, L. L. and R. L. Willett, “Fabrication of nanostructures using atomic-force-microscope-based lithography,” Appl. Phys. Lett., 67 (11), pp. 1552-1554, Sep., 1995.
[16] Bouchiat, V. and D. Esteve, “Lift-off lithography using an atomic force microscope,” Appl. Phys. Lett., 69 (20), pp. 3098-3100, Nov., 1996.
[17] Magno, R. and B. R, Bennett, “Nanostructure patterns written in III-V semiconductors by an atomic force microscope,” Appl. Phys. Lett., 70 (14), pp.1855-185, April, 19977.
[18] Hu, S., S. Altmeyer, A. Hamidi, B. Spangenberg, and H. Kurz, “Novel approach to atomic force lithography,” J. Vac. Sci. Technol., B 16 (4), pp. 1983-1986, Jul/Aug, 1998.
[19] Wiesauer, K. and G. Springholz, “Fabrication of semiconductor nanostructures by nanoindentation of photoresist layers using atomic force microscopy,” J. Appl. Phys., 88 (12), pp. 7289-7297, Dec., 2000.
[20] Leach, R. N., F. Stevens, C. Seiler, S. C. Langford, and J. T. Dickinson “Nanometer-Scale Solvent-Assisted Modification of Polymer Surfaces Using the Atomic Force Microscope,” Langmuir, 19, 10225-10232 , 2003.
[21] G. Binning, C. F. Quate, and C. Gerber. “Atomic force microscope.” Physical Review Letters, Vol.56 (9):930-933,1986.
[22] Hu, S, A. Hamidi, S. Altmeyer, T. Koster, B. Spangenberg and H. Kurt,
“Fabrication of silicon and metal nanowires and dots using mechanical atomic force lithography,” J. Vac. Sci. Tech., Vol.B, No.16, pp.2822, 1998.
[23] Notargiacomo, A., V. Foglietti, E. Cianci, G. Capellini, M. Adami, P. Faraci, F. Evangelisti and C. Nicolin, “Atomic force microscopy lithography as a nanodevice development technique,” Nanotechnology, Vol.10, pp.458, 1999.
[24] Versen, M., B. Klehn, U. Kunze, D. Reuter and A.D. Wieck, “Nanoscale devices fabricated by direct machining of GaAs with an atomic force microscope,” Ultramicroscopy, Vol.82, pp.159-163, 2000.
[25 ] Fang, T-H., C-I Weng and J-G Chang, “Machining characterization of the nano-lithography process using atomic force microscopy,” Nanotechnology, Vol.11, pp.181-187,2000.
[26 ] Guangyong Li, Ning Xi, Mengmeng Yu, Wai Keung Fung. “3-D Nanomanipulation using atomic force microscopy.” Proceedings of the 2003 IEEE International Conference on Robotics & Automation Taipei, Taiwan, September 14-19, 2003.
[27] M. Ashhab, M. V. Salapaka, M. Dahleh, and I. Mezic, “Control of Chaos in Atomic Force Microscopes,” Proceedings of the American Control Conference, Albuquerque, New Mexico June 1997
[28] El Rifai, Osamah M., and Kamal Youcef-Toumi, “In-contact Dynamics of Atomic Force Microscopes,” Proceedings IEEE/ASME International Conference on Advanced Intelligent Mechatronics, 8-12 July, 2001.
[29] El Rifai, O.M. and K. Youcef-Toumi, “Dynamics of atomic force microscopes: experiments and simulation,” Proceedings of the 2002 IEEE International Conference on Control Applications, Sep. 18-20, Glasgow, Scotland, UK, pp.1126-1131, 2002.
[30] Hosaka S., H. Koyanagi, A. Kikukawa, M. Miyamoto, R. Imura, and J. Ushiyama, “Fabrication of nanometer-scale structures on insulators and in magnetic materials using a scanning probe microscope,” J. Vac. Sci. Technol. Vol. B13, pp. 1307-1311, 1995
[31] Hosaka S., H. Koyanagi, A. Kikukawa, M. Miyamoto, and K. Etoh, “Force modulation atomic force microscopy recording for ultrahigh density recording,” J. Vac. Technol. Vol. B15, pp. 788-793, 1997.
[32] Hosaka S., K. Etoh, A. Kikukawa, H. Koyanagi, and K. Itoh, “6.6 Mhz silicon AFM cantilever for high-speed readout in AFM based recording,” Microelectronic Eng., Vol. 46, pp. 109-122, 1999.
[33] Mamin H. J., R. P. Ried, B. D. Terris, D. Rugar, B, W. Chui, and T. K. Kenny, “High density data storage using micromachined probe,” Int. Conf. on Solid State Devices and Materials, Hamamatsu, pp. 222-223, 1997.
[34] Mamin H. J., B. D. Terris, L. S. Fan, S. Hoen, R. C. Barrett, and D. Rugar, “High-density data storage using proximal probe techniques,” IBM J. Res. Develop., Vol. 39, pp. 681-699, 1995.
[35] Vettiger P., G. Cross, M. Despont, U. Drechsler, U. D
dc.identifier.urihttp://tdr.lib.ntu.edu.tw/jspui/handle/123456789/32591-
dc.description.abstract本文藉由掃描式探針顯微鏡提出三維的奈米微影。以前的研究已經可以證明伺服控制對壓電材料能產生有效的三維控制。然而對於試片材料的動態掌握,且用於微影上尚未有有效的結論。本篇研究指出利用探針與試片的特性,及多種微影的演算法則使得試片表面上的材料有推擠,排開的效果。並且探討成因及比較彼此的差異性。本篇論文顯示經由特殊的演算法則,可以得到更為立體的微影圖形。此外介紹 Model Reference Control(I/O linearization control),可以由設計過程,看到其模擬表現,並且藉由實驗,驗證此控制符合設計的需求。zh_TW
dc.description.abstractThis thesis addresses the 3-dimensional scanning probe microscope (SPM) lithography. Previous researches have shown that servo control imposes significant effect on the behavior of the piezo-electric actuators used in the SPM system; however, there is very little discussion on the dynamics of sample material and lithography effect. This paper points out that the debris can be push and squeezed by the properly controlling the relationship between the probe and the sample. The thesis shows that an appropriate multi-dimensional lithography algorithm is essential to good 3D lithography and discusses the corresponding effects. This paper also addresses the more concrete lithography results by special algorithm. The design procedure for a model reference controller is also presented to achieve dynamic matching among different axes. The experimental results confirm the design specifications.en
dc.description.provenanceMade available in DSpace on 2021-06-13T04:12:00Z (GMT). No. of bitstreams: 1
ntu-95-R93522809-1.pdf: 2951697 bytes, checksum: 3a1b63a1303922525a3d4d073d8ca607 (MD5)
Previous issue date: 2006
en
dc.description.tableofcontents目錄
摘要 I
ABSTRACT II
目錄 III
表目錄 V
圖目錄 VI
第一章 緒論 1
1.1 前言 1
1.2 文獻回顧 2
1.3 研究動機與目的 5
1.4 論文架構 7
第二章 原子力顯微鏡(AFM)系統 8
2.1 原子力顯微鏡介紹 8
2.2 原子力顯微鏡硬體架構 9
2.2.1 AFM作用原理 9
2.2.2 壓電圓管 11
2.2.3 探針懸臂樑 12
2.2.4 光位移感測器(position sensitive photo detector, PSPD) 14
2.2.5 原子力顯微鏡的操作模式 15
2.3 實驗硬體與軟體設備 16
第三章 研究方法 26
3.1 系統識別 26
3.2控制器的設計 33
3.2.1 PID控制器 33
3.2.2 Model Reference (I/O linearization control)原理簡介 38
3.2.3 Model reference(I/O linearization control)數位設計方式: 44
3.2.4 Model reference(I/O linearization control)simulation: 47
第四章 實驗與結果 57
4.1. PI控制器 57
4.2 PI 控制器的微影結果 64
4.2.1方陣微影結果 64
4.2.2棋盤微影結果 67
4.2.3台灣地圖微影結果 69
4.2.4任意圖片的微影結果 71
4.2.5太極圓微影結果 73
4.2.6螺旋微影結果 75
4.2.7立體奈米線方法一 80
4.2.8立體奈米線方法二 84
4.2.9立體奈米點方法一 86
4.2.10立體奈米點方法二 91
4.3 model reference控制器 92
4.4 model reference 控制器的微影結果 99
4.4.1三角波 99
4.4.2方波 101
4.4.3立體台灣 102
4.5 MR與PI 控制器的比較 106
4.5.1 小方陣 106
第五章 結論與未來展望 108
dc.language.isozh-TW
dc.subject掃描式探針顯微鏡zh_TW
dc.subject壓電材料zh_TW
dc.subjectModel reference controlen
dc.subjectSPMen
dc.subjectPZTen
dc.title以掃描探針顯微鏡研製三維奈米結構zh_TW
dc.titleSPM Technology for Machining Tree-Dimensional Nano Patternsen
dc.typeThesis
dc.date.schoolyear94-2
dc.description.degree碩士
dc.contributor.oralexamcommittee胡竹生,李世光
dc.subject.keyword掃描式探針顯微鏡,壓電材料,zh_TW
dc.subject.keywordSPM,PZT,Model reference control,en
dc.relation.page112
dc.rights.note有償授權
dc.date.accepted2006-07-26
dc.contributor.author-college工學院zh_TW
dc.contributor.author-dept機械工程學研究所zh_TW
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