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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 毛明華 | |
| dc.contributor.author | Chung-Yuan Yang | en |
| dc.contributor.author | 楊崇淵 | zh_TW |
| dc.date.accessioned | 2021-06-13T03:26:47Z | - |
| dc.date.available | 2006-07-31 | |
| dc.date.copyright | 2006-07-31 | |
| dc.date.issued | 2006 | |
| dc.date.submitted | 2006-07-28 | |
| dc.identifier.citation | [1] 余治浩, “量子點與量子井結構光學增益及光學及損耗之量測與分析”, Measurement and Analysis of Optical Gain and Loss of Quantum-Dot and Quantum-Well Structures”, 國立臺灣大學光電工程學研究所碩士論文, 2005.
[2] G. P. Agrawal, and N. K. Dutta, “Semiconductor Lasers”, Van Nostrand Reinhold, 1993 [3] L. A. Coldren, and S. W. Corzine, “Diode Lasers and Photonic Integrated Circuits”, Wiley, 1995 [4] P. S. Zory, and Jr., “Quantum Well Lasers”, Academic Press, 1993 [5] D. Bimberg, M. Grundmann, N. N. Ledentsov, “Quantum Dot Heterostructures”, Wiley, 1999 [6] Y. Arakawa, and H. Sakaki, “Multidimensional quantum well laser and temperature-dependence of its threshold current,” Appl. Phys. Lett., vol. 40, pp.939-941, 1982. [7] N. Kirstaedter, N.N. Ledentsov, M. Grundmann,D. Bimberg, V.M. Ustinov, S.S. Ruvimov,M.V. Maximov, P.S. Kop’ev, Zh.1. Alferov,U. Richter, P. Werner, U. Gdsele and J. Heydenreich, “Low threshold, large To injection laser emission from (InGalAs )quantum dots ,” Electronics Letters, vol. 30, pp.1416-1417, 1994. [8] D. Bimberg, M. Grundmann, N. N. Ledentsov, Ch. Ribbat, R. Sellin, Zh. I. Alferov, P. S. Kop’ev, M. V. Maximov, V. M. Ustinov, A. E. Zhukov, and J. A. Lott. “Quantum Dot Lasers: Theory and Experiment”, AIP Conference Proceedings, vol. 560, pp. 178-197, 2001. [9] B. W. Hakki and T. L. Paoli, “gain spectrum in GaAs double-heterostructure injection lasers”, J. Appl. Phys. vol. 46, pp. 1299-1306, 1975. [10] C. H. Henry, R. A. Logan, and F. R. Merritt, ”Measurement of gain and absorption spectra in AlGaAs buried heterostructure lasers” , J. Appl. Phys. Vol. 51, pp. 3042, 1980. [11] J. D. Thomson, H. D. Summers, P. J. Hulyer, P. M. Smowton, and P.Blood, “Determination of single-pass optical gain aRnd internal loss using a multisection device”, Appl. Phys. Lett. vol. 75, 2527-2579,1999 [12] Summers, H.D. Wu, J. Roberts, J.S. ,“Experimental investigation of thermally induced power saturation invertical-cavity surface-emittin“, Optoelectronics, IEE Proceedings ,vol148,261-265,2001 [13] 高健凱, “以電激發長度變化法量測量子點結構之光學增益”, Optical Gain Measurement of Quantum-dot Structures by Using a Variable-stripe-length Method with Current Injection”, 國立臺灣大學光電工程學研究所碩士論文, 2004. [14]K.L. Shaklee, R.E. Nahaori, L.F. Leheny, “Optical gain in semiconductors“, J. Lumin. vol. 7,284,1973 [15] L. Dal Negro , P. Bettotti , M. Cazzanelli , D. Paci.ci , L. Pavesi, “Applicability conditions and experimental analysis of the variable stripe length method for gain measurements “,Optics Communications,vol.229 pp.337–348,2004 [16] E. Hecht, Optics, fourth ed., Addison Wesley, San Francisco, 2002 | |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/31981 | - |
| dc.description.abstract | 光學增益是決定半導體雷射特性的重要參數之一,量測上有許多方法可以採用,比如Hakki-Paoli 方法、Henry 方法、長度調變法(variable stripe length method VSL),每個方法都有其優缺點,比如Hakki-Paoli 方法需要高解析度的頻譜分析儀、Henry 方法在光路的對準以及耦合上的困難。
長度調變法為本篇論文所討論的主軸,比較用電激發與光激發兩種方式達到長度調變法所量到的增益頻譜,以及使用半導體光大器架構來達到量測模態增益的目的,後者可以從低激發強度量到高激發強度,雖然作法上比較複雜,但是卻可以幫助彌補電激發光與光激發光的不足之處。 根據實驗結果,顯示長度調變法在低激發強度下,當材料仍處於吸收狀態時,無論是電激發或光激發,皆因為再吸收 (re-absorption)的效應而無法得到正確的增益頻譜。若使用半導體光放大器架構來量測單一波長的增益,則可以克服長度調變法在低激發強度下所遇到再吸收的問題。 | zh_TW |
| dc.description.abstract | Optical gain is one of the most important parameters which determine the properties of semiconductor lasers. There are several methods for optical gain measurement. Every method has its disadvantages such as high-resolution spectrometers required for Hakki-Paoli method, difficulties in optical alignment and coupling for Henry method.
In this thesis, we focus firstly on the variable stripe length method, and compare the modal gain in optical pumping and current injection. Semiconductor optical amplifier(SOA) structures are used to measure the modal gain from low excitation to high excitation. Although the experimental setup is more complicated, it can be applied under some measurement conditions where the variable-stripe-length method using optical pumping or current injection will be inappropriate. Based on the results in our measurement and analysis, the variable-stripe-length method, either using electrical or optical pumping, can not be applied in absorption case under low excitation. If we use SOA structures to measure the gain at a certain wavelength, the difficulties encountered above can be overcome. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-13T03:26:47Z (GMT). No. of bitstreams: 1 ntu-95-R93943150-1.pdf: 1817368 bytes, checksum: 875ee48cde1e872bd526a1bab2a1eaa8 (MD5) Previous issue date: 2006 | en |
| dc.description.tableofcontents | 第一章 序論 1
第一節 半導體雷射簡介 1 第二節 研究動機 3 第三節 論文內容簡介 4 第二章 實驗理論 5 第一節 光學增益與損耗 5 第二節 模態增益量測簡介 6 第三節 光激發光 9 第四節FRESNEL 繞射效應 12 第三章 元件製作以及實驗量測架設 16 第一節 磊晶材料與結構 16 第二節 元件製程 20 第三節 量測系統 21 第四章 量測結果與討論 26 第一節 TR819 模態增益頻譜量測 27 第二節 TR821模態增益頻譜量測 31 第三節 C1511 模態增益頻譜量測 34 第四節 C1512 模態增益頻譜量測 38 第五節 C1513 模態增益頻譜量測 41 第六節 C1513的半導體光放大器(SEMICONDUCTOR OPTICAL AMPLIFIER SOA) 45 第七節 SH246的半導體光放大器(SEMICONDUCTOR OPTICAL AMPLIFIER SOA) 49 第五章 結論 51 參考文獻 53 | |
| dc.language.iso | zh-TW | |
| dc.subject | 光激發法 | zh_TW |
| dc.subject | 半導體光放大器 | zh_TW |
| dc.subject | Optical Pumping | en |
| dc.subject | Semiconductor Optical Amplifier | en |
| dc.title | 以光激發法研究半導體量子結構之光學增益 | zh_TW |
| dc.title | Study of Optical Gain in Semiconductor Quantum Structures by Optical Pumping | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 94-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 王智祥,林浩雄 | |
| dc.subject.keyword | 光激發法,半導體光放大器, | zh_TW |
| dc.subject.keyword | Semiconductor Optical Amplifier,Optical Pumping, | en |
| dc.relation.page | 55 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2006-07-29 | |
| dc.contributor.author-college | 電機資訊學院 | zh_TW |
| dc.contributor.author-dept | 電子工程學研究所 | zh_TW |
| 顯示於系所單位: | 電子工程學研究所 | |
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