以電子束微影製作奈米石墨薄膜

Abstract

Monolayer graphite thin film (graphene) has attracted much attention recently because of its many unique properties and potential applications. In this thesis, we describe the method we developed to fabricate graphene-based device. Mechanical proliferation was used to create thin graphite fakes on the surface of SiO2 which was grown on top of n+ silicon substrate. Optical and Atomic force microscope were then used to identify the position and thickness of the graphene flakes. Electron beam lithography was then employed to make contacts to these graphene flakes. The problems that were encountered and solved in these processes will be are presented and discussed in this thesis.