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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 顏溪成(Shi-Chern Yen) | |
| dc.contributor.author | Sheng-Wei Cheng | en |
| dc.contributor.author | 鄭昇韋 | zh_TW |
| dc.date.accessioned | 2021-06-13T01:06:11Z | - |
| dc.date.available | 2007-07-26 | |
| dc.date.copyright | 2007-07-26 | |
| dc.date.issued | 2007 | |
| dc.date.submitted | 2007-07-23 | |
| dc.identifier.citation | Bard, A.J and L.R. Faulkner, “Electrochemical Methods”,2ndEd.,John Wily ＆
Sons, Inc, New York(2001) Beck, E. C, Giannini, A.P., Ramirez, E.R., Food Technol., 22, (1974) 18-19. Belongia, B. M., Haworth, P. D., Baygents, J. C., Raghavan, S, J. Electrochem. Soc., 146, (1999) 4124-4130. Bignon, J., Brochard, P., Brown, R., Davis, J. M. G, Vu, V., Gibbs, G., Greim, M., Oberdorster, G., Sebastien, P., The Annals of OccupationalHygiene ,39, (1995) 89-106. Chen, X., Chen, G., Po, L. Y., Sep. Purif. Technol., 19, (2000) 65-76 Dick, C. A. J., Stone, V., Brown, D.M., Watt, M., Cherrie, J.W., Howarth, S., Seaton, A., Donaldson, K, Atmospheric Environment, 34, (2000) 2587-2592 Den, W., Huang, C., Colloids and Surface A, 254, (2005) 81-89. Donaldson, K., Li, X.Y., MacNee, W., Journal of Aerosol Science, 29, (1998) 553-560. Donini, J. C., Kan,J., Szykarczuk, J., Hassan, T. A., Kar, K. L., The Canadian Journal of Chemical Engineering, 72, (1994) 1007-10012. Feng, C., Sugiura, N., Shimada, S., Maekawa, T., J. Hazardous Materials, B103, (2003) 65-78 Han, M., Song, J., Kwon, A., Wat. Sci. Tech. 2, No5-6, (2002) 73-76 Holt, P. K., Barton, G. W., Mitchell, C. A., The Third Australian Environmental Engineering Research Event, 23-26 November Castlemaine, Victoria (1999) Holt, P. K., Barton, G. W., Wark, M., Mitchell ,C. A., Colloids and surfaces A, 211, (2002) 233-248 Hu, C. Y., Lo, S. L., Kuan, W. H., Water Research, 37, (2003) 4513-4523. Hunter, R. J., “Foundations of colloid science”, Oxford University Press, Inc., New York (1987). Hunter, R. J.,“Introduction to Modern Colloid Science”, Oxford University Press, Inc., New York (1993) Khristoskova, S., Chem. Abstr., 22, (1984) 177-185. Kobya, M., Can, O. T., Bayramoglu, M., J. Hazad. Mater., B100, (2003) 163-178. Koparal, A. S., Ogutveren, U.B., J. Hazard. Mater., B89, (2002) 83-94. Kumar, P. R., Chaudhari, S., K. C., Mahajan, S. P., Chemosphere, 55, (2004) 1245-1252. Larue, O., Vorobiev, E., Int. J. Miner. Process, 71, (2003) 1-15.. Lin, S. H., Kiang, C. D., J. Hazad. Mater., B97, (2003) 159-171. Mattesson, M. J., Dobson, R, L., Glenn, R.W., Kukunoor, N. S., Waits, W. H., Clayfield, E. J., Colloid and Surface A, 104, (1995) 101-109 Mitchell, J. K.,“Fundementals of Solid Behavior”., John Wiley ＆ Sons, Inc., New York (1976). Mills, D., J. Am. Water Works Assoc., 92, (2000) 35-43 Mollah, M.Y.A., Schennach, R., Parga, J., Cocke, D.L., J. Hazard. Mater., B84, (2001) 29-41. Oberdorster, G., Ferin, J., Finkelstein, J., Baggs, R., Stavert, D.M., Lehnert, B. E., SAE Technical Paper Series, 921388, (1992) 1-15 Pazenko, T. Ya., Khalturina, T. I., Kolova, A. F., Rubailo I. S., J. Appl. Chem. USSR, 60, (1985) 2383-2387. Philips, V.A., Kolbe, J. L; Colliod Interface Science. 4, (1976) 169-176. Pouet, M. F., Grasmick, A., Water Sci. Technol., 31, No. 3-4, (1995) 275-283. Russell, R, R., Energy Progress, 8, (1988) 205-208. Szynkarczuk, J., Kan, J., Hassan, A.T.T., Donini, J. C., Clays and Minerals, 42, (1994) 667-673 Vik, E. A., Carlson, D. A., Eikum, A. S., Gjessing,E.T., Water Res., 18, (1984) 1355-1360 Yang, G. C.C Environmental Progress, 21, No.1,(2002) 57-62 楊萬發，“水及廢水處理化學”，茂昌圖書有限公司 王建榮，林慶福，林必窕，“半導體平坦化技術”，全華科技圖書股份有限公司(1999) 台北 張有義，郭蘭生，“膠體及介面化學入門”，高立圖書有限公司 (2002) 台北 顏溪成，劉奕宏，“以電混凝法處理化學機械研磨廢液與研磨液中顆粒凝聚行為之特性研究”，台大化工所碩士學位論文，(2005) | |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/29401 | - |
| dc.description.abstract | 本實驗主要對於化學機械研磨液奈米顆粒之去除可以分為五個部份來討論:
第一部分為奈米顆粒的表面性質分析與凝聚理論的關係；第二部份為不同研磨廢液之混凝效率研究；第三部份為建立數學模型；第四部份為電混凝模型參數之探討；第五部份為DLVO理論探討電混凝程序之行為及印證數學模型參數。 實驗結果發現，對於兩種不同研磨液而言，其介達電位會隨著溶液之pH值而改變，是因為離子強度的原因，造成其電壓縮而改變其表面性質，亦改變了其粒子間之排斥能 。而在電混凝之處理效率上，此程序對兩種不同之研磨液之移除效率都非常良好，氧化層研磨液之電混凝通電流為1A時，在9~10分鐘幾乎就全移除顆粒，而金屬層則通電流0.45A，在相同時間亦可達相同的效果。 對於數學模型的建立，可以預測隨著電混凝的時間，顆粒濃度的變化，亦可從模型參數中得到通電時間之最低限值，即可達臨界凝聚濃度，金屬從大概約10.69mg/L，而氧化層大概為26.83mg/L，當釋鐵離子越過此臨界濃度，凝聚的機制便啟動，吾人亦由基本之凝聚理論求出理論臨界濃度，與數學模型比較之，可得知其值相去不遠，故推論對這模型之建立應可期應用在其他研磨液或廢水處理上。 | zh_TW |
| dc.description.abstract | This thesis on removing nano-particles from CMP wastewater by electrocoagulation process has mainly studied in five parts. The relationship between surface properties analyzing of nano-particles and the theory of coagulation was investigated in first part study. Efficiency of electrocoagulaion in different types of CMP was studied in second part. The mathematic model was built in third part. The parameters of the model in electrocoagulation process was investigated in the forth part. The behavior of particles in EC process and the parameters of model was investigated by DLVO theory in the fifth part.
According to the experiment results of the two slurries, it was found that the zetapotential had changed by the pH value because of the strength of ion in solution. And it would lead to both the properties of surface and the repulsive energy between particles changed by electropressed. The efficiency of the particle abatement by EC treatment on two kinds of CMP slurry was perfect. As the operation current of EC treatment on oxide CMP slurry was 1A, the particles had almost been removed after 9~10 minutes EC time. The same result would be achieved in the same EC time by 0.45A operation current of mental CMP slurry treatment. According to the establishing of the model, the change of particle’s concentration along with EC time could be predict. And the lowest limited EC time could be found. It also mean that the concentration of Fe3+ were achieved c.c.c ( Critical Coagulation Concentration), then the mechanism of coagulaion would be started. And c.c.c of metal slurry was 10.69mg/L, and oxide slurry was 26.83mg/L. The theoretical c.c.c also could be found by DLVO theory. The value was closed to modeling one. So it could expect that the model could be applied to other slurry or wastewater treatment. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-13T01:06:11Z (GMT). No. of bitstreams: 1 ntu-96-R94524003-1.pdf: 1913128 bytes, checksum: fb4923585fbfcbd2fc01008a74a2acb3 (MD5) Previous issue date: 2007 | en |
| dc.description.tableofcontents | 摘要……………………………………………………………………Ⅰ
英文摘要………………………………………………………………Ⅱ 目錄……………………………………………………………………Ⅲ 圖表目錄………………………………………………………………Ⅴ 第一章 緒論…………………………………………………………1 1-1 IC產業水資源議題…………………………………………1 1-2 化學機械研磨探討…………………………………………1 1-3 化學機械研磨液介紹………………………………………4 1-4 工業發展水資源危機及環境議題…………………………6 1-5 研究目的與動機……………………………………………8 第二章 文獻回顧……………………………………………………9 2-1電混凝技術的介紹及應用……………………………………9 2-2電混凝技術在IC產業的應用…………………………………14 2-3電混凝系統動力學之研究……………………………………17 第三章 理論分析與技術介紹 ………………………………………20 3-1 混凝機制與技術 ……………………………………………20 奈米粉體及團聚理論 ………………………………………20 膠體化學及凝聚理論 ………………………………………23 電混凝技術及高級氧化處理程序介紹 ……………………25 3-2 電雙層及DLVO理論 …………………………………………26 電雙層理論. .....................................26 電雙層厚度計算. .................................30 DLVO theory .....................................33 3-3 儀器分析原理級應用 ………………………………………36 zetapotential 量測原理 …………………………………36 顆粒粒徑量測原理 …………………………………………39 濁度量測原理介紹 …………………………………………40 第四章 實驗方法與設備………………………………………………41 4-1 電混凝實驗項目與步驟:……………………………………41 4-2 實驗裝置 ……………………………………………………44 4-3 實驗藥品 ……………………………………………………44 第五章 結果與討論……………………………………………………46 5-1 化學機械研磨液顆粒粒徑與介達電位 ……………………46 5-2 凝聚理論(DLVO)之應用與印證 ……………………………49 各種研磨液不同pH下之DLVO曲線圖 ...................49 研磨液DLVO曲線圖與等電點印證 ....................61 5-3 研磨液電混凝研究 ................................66 研磨液濃度與濁度之關係 .........................66 電混凝處理之效率 ..............................68 5-4 電混凝程序之modeling ……………………………………71 DLVO與model之關係印證……………………………………78 第六章 結論 .........................................81 6-1 研究總結 ……………………………………………………81 凝聚理論與研磨液中奈米顆粒之穩定性探討 ……………81 電混凝程序對研磨液之探討 ………………………………81 6-2 未來研究方向及展望...............................82 符號說明.................................................83 參考文獻.................................................84 | |
| dc.language.iso | zh-TW | |
| dc.subject | 廢水處理 | zh_TW |
| dc.subject | 混凝理論 | zh_TW |
| dc.subject | 化學機械研磨廢液 | zh_TW |
| dc.subject | 鐵離子 | zh_TW |
| dc.subject | 電混凝 | zh_TW |
| dc.subject | wastewater treatment | en |
| dc.subject | DLVO | en |
| dc.subject | electrocoagulation | en |
| dc.subject | CMP wastewater | en |
| dc.subject | Fe ion | en |
| dc.title | CMP廢水電混凝中鐵離子效應之研究 | zh_TW |
| dc.title | The Effect of Fe ion on Electrocoagulation
for CMP Wastewater Treatment | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 95-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 徐治平(Jyh-Ping Hsu),林祥泰(Shiang-Tai Lin),周偉龍(Wei-Long Chou) | |
| dc.subject.keyword | 電混凝,化學機械研磨廢液,混凝理論,廢水處理,鐵離子, | zh_TW |
| dc.subject.keyword | electrocoagulation,CMP wastewater,DLVO,Fe ion,wastewater treatment, | en |
| dc.relation.page | 86 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2007-07-24 | |
| dc.contributor.author-college | 工學院 | zh_TW |
| dc.contributor.author-dept | 化學工程學研究所 | zh_TW |
| 顯示於系所單位： | 化學工程學系 | |
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