請用此 Handle URI 來引用此文件：
http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/27793完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 蔡坤諭(Kuen-Yu Tsai) | |
| dc.contributor.author | Ken-Hsien Hsieh | en |
| dc.contributor.author | 謝艮軒 | zh_TW |
| dc.date.accessioned | 2021-06-12T18:20:53Z | - |
| dc.date.available | 2009-08-28 | |
| dc.date.copyright | 2007-08-28 | |
| dc.date.issued | 2007 | |
| dc.date.submitted | 2007-08-22 | |
| dc.identifier.citation | [1] Bill Wilson, 'Photolithography,' Connexions, June 20, 2003, http://cnx.org/content/m11367/1.1/.
[2] G. Moore, “Cramming more components onto integrated circuits: Electronics,” vol. 38, no. 8, Apr. 1965. [3] Hong Xiao, Introduction to Semiconductor Manufacturing Technology, Prentice Hall, 2001. [4] Phillip Ware, “Removing The Mask,” oe magazine pp. 26-27, march 2002. [5] Burn J. Lin, Immersion lithography and its impact on semiconductor manufacturing, accepted for publication in J. Microlith., Microfab., Microsyst., vol. 3, 2004. [6] Park JY, Lera JD, Choi HJ, Buh GH, Kang CJ, Jung JH, Choi SS, Jeon D, Kuk Y, ” Characterization of two by two electron-beam microcolumn array aligned with field emission array,” Journal of Vacuum Science & Technology B, Vol.16, No.2, 826-828, 1998. [7] B.J. Kampherbeek, “MAPPER Technology Developments,” Maskless Workshop, January 17-19, 2005. [8] Jon Orloff, Handbook of charged particle optics, CRC Press, 1997. [9] Matthew N. O. Sadiku, Numerical Techniques in Electromagnetics second edition, CRC Press, 2000. [10] Dennis G. Zill, Michael R. Cullen, Differential Equations with Boundary-Value Problems fifth edition, Brooks/Cole, 2000. [11] P. W. Hawkes and E.Kasper, Principles of Electron Optics, Volume 1 Basic Geomtrical Optics, Academic Press, 1996. [12] P. W. Hawkes and E.Kasper, Principles of Electron Optics, Volume 2 Applied Geometrical Optics, Academic Press, 1996. [13] Weisstein, Eric W. 'Cubic Spline.' From MathWorld--A Wolfram Web Resource. http://mathworld.wolfram.com/CubicSpline.html [14] NIST SEMATECH, Engineering Statistics Handbook, at http://www.itl.nist.gov/div898/handbook/pmd/pmd.htm [15] DWO Heddle, Electrostatic Lens Systems 1st Edition, Adam Hilger, 1991. [16] Ximen Hiye, Aberration Theory in Electron and Ion Optics, Academic Press, 1986. [17] H N H Brunt and F H Read, “Aberrations in electrostatic lenses,” Journal of Physics E: Scientific Instruments, Volume 8, 1975. [18] COMSOL Multiphysics, Version 3.3, user manual, command reference | |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/27793 | - |
| dc.description.abstract | 對於22奈米世代之IC製造技術，多重電子束微影術被公認為極具潛力的發展中技術之一，利用多束電子束同時運作可大量增加系統之產能；在此類系統中，微型靜電場透鏡常被大量使用，系統之成像品質則受透鏡系統設計優劣所影響，然而目前市售之電子光學系統設計軟體不僅量少且相當昂貴。此論文旨在開發一適用二維與三維靜電透鏡模擬與分析之環境，並將之應用於次世代之多電子束微影系統設計上。此模擬軟體中之靜電場計算使用COMSOL Multiphysics所提供之有限元素分析法來完成，而電子路徑與成像分析則在MATLAB環境下建構。電子路徑部分可模擬分為基於高斯方程式之理想路徑與基於勞倫茲方程式之真實路徑，成像分析部分則可計算幾何相差與色散相差。除了上述傳統透鏡分析功能外，針對聚焦系統所作之最小聚焦點的找尋與分析功能也被成功建置；並藉由MATLAB強大之內建功能程式，此模擬軟體之分析功能將有高度之擴充性與彈性。論文末尾章節介紹發展中之多電子束直寫微影系統——MPML2，並將此軟體應用於其初代靜電透鏡系統之設計上。 | zh_TW |
| dc.description.abstract | Multiple Electron beam lithography is one of the promising technologies for 22nm-node integrated circuit (IC) fabrications. For the purpose of improving system throughput, large amount of beams should be driven at one time, and miniature electrostatic elements are widely utilized in these systems. Electrostatic lens governs the imaging properties of the electron optical systems (EOS), while tools for EOS design or analysis are rare and expensive. In this thesis, a simulator capable of 2D and 3D electrostatic lens simulation is implemented for the application to the next generation e-beam direct-write system design. In this simulator, lens field is evaluated via finite element method (FEM) with the core of COMSOL Multiphysics, while the other parts are developed under MATLAB environment. Electron trajectories governed by Lorentz’s equation can be calculated. Some problems rising from the numerical computation are dealt with and solved, so that acceptable accuracy is obtained. The primary geometrical and chromatic aberrations are evaluated for rotationally symmetrical lenses. Besides the conventional aberration analysis of e-beam systems, minimum spot size evaluation is also implemented. With the plentiful and powerful functions provided by MATLAB, this simulator becomes highly flexible and expandable. Finally, this simulator is applied to e-beam direct-write system design and analysis for preliminary lens design of MPML2. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-12T18:20:53Z (GMT). No. of bitstreams: 1 ntu-96-R94921012-1.pdf: 1262682 bytes, checksum: 69a43c07f27d2b46df7619d4a10c9cb3 (MD5) Previous issue date: 2007 | en |
| dc.description.tableofcontents | Abstract i
中文摘要 ii Statement of Contributions iii 誌謝 iv Table of Contents v List of Figures vii List of Table ix Chapter 1 Introduction 1 1.1 Microlithography 1 1.2 Electron Beam Lithography 3 1.3 Multiple E-beam Lithography 5 Chapter 2 Electrostatic Lens 6 2.1 Basic of Electrostatic Lens 6 2.2 Types of Electrostatic Lens 6 2.3 Electron Optics 8 Chapter 3 Field Computation 10 3.1 Introduction to Field Computation 10 3.2 Finite Difference Method 11 3.3 Finite Element Method 13 3.4 Power Series Expansion of Rotationally Symmetric Field 15 Chapter 4 Electron Trajectory Simulation 18 4.1 Theory of Electron Trajectory Simulation 18 4.2 Gaussian Optics 24 4.2.1 Gaussian Trajectory Equation 24 4.2.2 Properties of Gaussian Optics 26 4.2.3 Numerical Computation of Gaussian Trajectory 27 4.2.4 Simulation Result 28 4.3 Direct Ray Tracing with Lorentz’s Equation 30 4.3.1 Direct Interpolation from FEM Data 32 4.3.2 Numerical Techniques in Higher Order Derivative 34 4.4 Verification 38 Chapter 5 Lens Performance Evaluation 40 5.1 Theory of 3rd Order Aberration 40 5.2 Numerical Computation of Aberrations 47 5.3 Minimum Spot Size 50 Chapter 6 Optimization and Application to MPML2 53 6.1 Optimization 53 6.2 MPML2 54 6.3 Preliminary Design of MPML2 54 Chapter 7 Conclusions and Future Work 61 Bibliography 62 | |
| dc.language.iso | en | |
| dc.subject | 無光罩 | zh_TW |
| dc.subject | 電子光學 | zh_TW |
| dc.subject | 微影 | zh_TW |
| dc.subject | 電子束 | zh_TW |
| dc.subject | 靜電 | zh_TW |
| dc.subject | electrostatic | en |
| dc.subject | lithography | en |
| dc.subject | electron optics | en |
| dc.subject | e-beam | en |
| dc.subject | maskless | en |
| dc.title | 靜電透鏡模擬與分析並應用於次世代電子束微影 | zh_TW |
| dc.title | Simulation and Analysis of Electrostatic Lens and Application to Next Generation Electron Beam Direct-write Lithography | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 95-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.coadvisor | 李佳翰(Jia-Han Li) | |
| dc.contributor.oralexamcommittee | 陳永耀(Yung-Yaw Chen),管傑雄(Chieh-Hsiung Kuan),顏家鈺(Jia-Yush Yen),陳俊光(Chun-Kuang Chen) | |
| dc.subject.keyword | 電子束,無光罩,靜電,電子光學,微影, | zh_TW |
| dc.subject.keyword | e-beam,maskless,electrostatic,electron optics,lithography, | en |
| dc.relation.page | 63 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2007-08-23 | |
| dc.contributor.author-college | 電機資訊學院 | zh_TW |
| dc.contributor.author-dept | 電機工程學研究所 | zh_TW |
| 顯示於系所單位： | 電機工程學系 | |
文件中的檔案：
| 檔案 | 大小 | 格式 | |
|---|---|---|---|
| ntu-96-1.pdf 未授權公開取用 | 1.23 MB | Adobe PDF |
系統中的文件，除了特別指名其著作權條款之外，均受到著作權保護，並且保留所有的權利。