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http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/25001完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 陳永耀 | |
| dc.contributor.author | Kuan-Ju Chu | en |
| dc.contributor.author | 朱冠儒 | zh_TW |
| dc.date.accessioned | 2021-06-08T05:59:58Z | - |
| dc.date.copyright | 2007-07-31 | |
| dc.date.issued | 2007 | |
| dc.date.submitted | 2007-07-29 | |
| dc.identifier.citation | Bibliography
[1] J. W. Goodman, Introduction to Fourier Optics, 2nd ed. McGraw Hill, 1996 [2] Born and Wolf, Principle of Optics, 7th ed Cambridge, 1999 [3] Hecht, Optics, 4th ed Addison Wesley, 2002 [4] Min Gu, Advanced Optical Imaging Theory, Springer, 2000 [5] B. Richards and E. Wolf, Electromagnetic diffraction in optical systems. II. Structure of the image field in an aplanatic system, Proc. R. Soc. London Ser. A 253, 358–379, 1959 [6] M. Mansuripur, Distribution of light at and near the focus of high numerical aperture objectives, J. Opt. Soc. Am A 3, 2086–2093, 1986 [7] M. Yeung, Photolithography simulation on non-planar substrate, in Optical/Laser Microlithography III, V. Pol, ed., Proc. Soc. Photo-Opt. Instrum. Eng. 1264, 309–321, 1990 [8] C. Yaun and A. Strojwas, Modeling optical microscope images of integrated-circuit structures, J. Opt. Soc. Am. A 8, 778–790, 1991 [9] D. G. Flagello and T. Milster, Three-dimensional modeling of high numerical aperture imaging in thin films, in Design, Modeling, and Control of Laser Beam Optics, Y. Kohanzadeh, G. N. Laurence, J. G. McCoy, and H. Weichel, eds., Proc. Soc. Photo-Opt. Instrum. Eng. 1625, 246–261, 1992 [10] D. G. Flagello and A. E. Rosenbluth, Vector diffraction analysis of phase-mask imaging in photoresist films, in Optical/ Laser Microlithography VI, J. D. Cuthbert, ed., Proc. Soc. Photo-Opt. Instrum. Eng. 1927, 395–412, 1993 [11] E. Wolf, “Electromagnetic diffraction in optical systems. I. An integral representation of the image field,” Proc. R. Soc. London Ser. A 253, 349–357 ,1959 [12] D. G. Flagello, T. Milster and A. E. Rosenbluth, Theory of high-NA imaging in homogeneous thin films, Vol. 13, J. Opt. Soc. Am. A 53-63, 1996 [13] D. G. Flagello and T. Milster , three-dimensional modeling of high numerical aperture imaging in thin films, SPIE Vol. Design, Modeling, and Control of Laser Beam Optics, 246-261, 1992 [14] B. W. Smitht, D. G. F1agello, J. R. Summat, L. F. Fullert, Comparison of scalar and vector diffraction modeling for deep-UV lithography, SPIE Vol. 1927 Optical/Laser Microlithography VI, 847-857, 1993 [15] M. S. Yeung, Modeling high numerical aperture optical lithography, SPIE Vol. 922 Optical /Laser Microlithography, 149-167, 1988 [16] H. H. Hopkins, The concept of partial coherence in optics, Proc. R. Soc. London, Ser. A 208, 263–277, 1951 [17] M. S. Yeung, D. Lee, R. Lee and A.R. Neureuther, Extension of the Hopkins theory of partially coherent imaging to include thin-film interference effects, SPIE Vol. 1927 Optical/Laser Microlithography VI, 453-463, 1993 [18] H.H. Hopkins, 'On the Diffraction Theory of Optical Images' ,Proc. Roy. Soc. A217, 408-432, 1953 [19] B. J. Lin, lecture notes on Microlithography Theory and Practice, Department of electrical engineering, National Taiwan University, spring, 2006 [20] A. K. K. Wang, Optical Imaging in Projection Microlithography, SPIE--The International Society for Optical Engineering, 2005 [21] A. K. K. Wang, Resolution Enhancement Techniques in Optical Lithography, SPIE--The International Society for Optical Engineering, 2001 | |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/25001 | - |
| dc.description.abstract | 微電子元件的發展，以矽晶為主的電子元件隨著摩爾定律(Moore’s law)所預測的，尺寸不斷地縮小，所以必須要有更好的透鏡解析度，傳統的微影術模型建立在純量的夫涅爾近似(Fresnel approximations)，這個近似只有在低數值孔徑的系統中成立，一旦在高數值孔徑的環境中，此夫涅爾近似將不再成立。
我們成功地整理出在高數值孔徑的微影系統中的影像模型方程式，此方程式是以向量模式推導，不再是傳統的純量模式推導，我們從和這相關的文獻中，重新整理這些文獻中有用的方程式，清楚地呈現在這篇論文中，我們設計各種不同的光罩，來比較在純量模式和向量模式中，不同條件下的差異，我們可以很清楚地發現，隨著數值孔徑不斷地增加，純量模式和向量模式的結果差異，將會越來越大，這即意味著，當我們在高數值孔徑微影系統中計算空間影像(aerial image)，我們必須採用向量模式。 在本篇論文中，我們將在第ㄧ章中介紹ㄧ些微影術的基礎知識，並在第二章中介紹純量繞射理論，在第三章中講解在同調和部份同調的光源條件下，純量模式的影像模型建立，在第四章推導向量模式的影像模型公式，第五章將比較純量模式和向量模式的空間影像差異，並在最後的第六章中，做一個本篇論文的結論。 | zh_TW |
| dc.description.abstract | In the field of microlithography the demand for highly integrated electronic circuits has motivated investigation into better lens resolution. Traditional models used in microlithography are based on scalar image formation under the Fresnel approximations. This approximation holds in the low system but it breaks down when the exit pupil diameter is of the same order as the distance from pupil to image (high ), i.e. .
We successfully find vector imaging model in a high numerical aperture microlithography system. We survey papers about image modeling, and clearly reorganize the useful formulates from these papers. And we design different kinds of photo masks to compare the aerial image of the scalar imaging model and of the vector imaging model. We can clearly find that the intensity of the scalar model is much different from the intensity of the vector model when (high NA). So we should adopt the vector model when we need to calculate the aerial image in a high microlithography projection system. In this thesis, we introduce some basic knowledge of optical lithography in chapter 1 and foundations of scalar diffraction theory in chapter 2. Then, scalar imaging with coherent illumination and partially coherent illumination is introduced in chapter3. The formulation about vector imaging model in a high numerical aperture microlithography system is derived in chapter 4. Simulation result and some comparisons will be shown in chapter 5. Finally conclusion will be made in chapter 6. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-08T05:59:58Z (GMT). No. of bitstreams: 1 ntu-96-R94921065-1.pdf: 2081801 bytes, checksum: d427026b443308a190c4ebcc9dd3e270 (MD5) Previous issue date: 2007 | en |
| dc.description.tableofcontents | Table of Contents
Abstract i Chapter1 Introduction 1 1.1 Optical Microlithography 1 1.2 Rayleigh Equation 2 1.3 Moore's Law 3 1.4 Optical Proximity Correction (OPC) 3 1.5 Motivation 6 Chapter2 Foundations of Scalar Diffraction Theory 8 2.1 Scalar Wave Equation 8 2.2 The Helmholtz Equation 10 2.3 Green’s Theorem 12 2.4 The Integral Theorem of Helmholtz and Kirchhoff 12 2.5 Sommerfeld Radiation Condition 17 2.6 First Rayleigh-Sommerfeld Solution 20 2.7 The Huygens-Fresnel Principle 23 2.8 The Huygens-Fresnel Principle in Rectangular Coordinates 25 2.9 The Fresnel Approximation 27 2.10 The Fraunhofer Approximation 30 Chapter3 Scalar Imaging with Coherent Illumination and Partially Coherent Illumination 32 3.1 Coherent Illumination 32 3.2 The Van Cittert-Zernike Theorem 40 3.3 Hopkins’ Formula 44 3.4 Propagation of Mutual Intensity 47 3.5 Transmission of Mutual Intensity Through an Optical System 50 3.6 Image of Transilluminated Objects 54 Chapter4 Vector Imaging with Partially Coherent Illumination 59 4.1 Vector Imaging 59 Chapter5 Testing and Simulation Result 68 Chapter6 Conclusions 93 | |
| dc.language.iso | en | |
| dc.subject | 影像模型 | zh_TW |
| dc.subject | 空間影像 | zh_TW |
| dc.subject | 高數值孔徑 | zh_TW |
| dc.subject | 微影術 | zh_TW |
| dc.subject | image modeling | en |
| dc.subject | microlithography | en |
| dc.subject | aerial image | en |
| dc.subject | high NA | en |
| dc.title | 在高數值孔徑微影系統中之成像模型建立 | zh_TW |
| dc.title | Image Modeling for a High Numerical Aperture Microlithography System | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 95-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 洪昌黎,顏家鈺,蔡坤諭 | |
| dc.subject.keyword | 微影術,高數值孔徑,空間影像,影像模型, | zh_TW |
| dc.subject.keyword | microlithography,high NA,aerial image,image modeling, | en |
| dc.relation.page | 95 | |
| dc.rights.note | 未授權 | |
| dc.date.accepted | 2007-07-31 | |
| dc.contributor.author-college | 電機資訊學院 | zh_TW |
| dc.contributor.author-dept | 電機工程學研究所 | zh_TW |
| 顯示於系所單位： | 電機工程學系 | |
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| ntu-96-1.pdf 未授權公開取用 | 2.03 MB | Adobe PDF |
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