請用此 Handle URI 來引用此文件:
http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/19012
完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 廖尉斯(Wei-Ssu Liao) | |
dc.contributor.author | Tzu-Yu Lin | en |
dc.contributor.author | 林子羽 | zh_TW |
dc.date.accessioned | 2021-06-08T01:42:20Z | - |
dc.date.copyright | 2016-11-02 | |
dc.date.issued | 2016 | |
dc.date.submitted | 2016-08-17 | |
dc.identifier.citation | 1. Jacobs, H. O.; Whitesides, G. M., “Submicrometer patterning of charge in thin-film electrets.” Science 2001, 291, 1763.
2. Park, I.; Ko, S. H.; Pan, H.; Grigoropoulos, C. P.; Pisano, A. P.; Fréchet, J. M. J.; Lee, E. S.; Jeong, J. H., “Nanoscale patterning and electronics on flexible substrate by direct nanoimprinting of metallic nanoparticles.” Adv. Mater. 2008, 20, 489. 3. Ditlbacher, H.; Krenn, J. R.; Schider, G.; Leitner, A.; Aussenegg, F. R., “Two-dimensional optics with surface plasmon polaritons.” Appl. Phys. Lett. 2002, 81, 1762. 4. Ctistis, G.; Papaioannou, E.; Patoka, P.; Gutek, J.; Fumagalli, P.; Giersig, M., “Optical and magnetic properties of hexagonal arrays of subwavelength holes in optically thin cobalt films.” Nano Lett. 2009, 9, 1. 5. Xu, Q.; Bao, J.; Rioux, R. M.; Perez-Castillejos, R.; Capasso, F.; Whitesides, G. M., “Fabrication of large-area patterned nanostructures for optical applications by nanoskiving.” Nano Lett. 2007, 7, 2800. 6. Tee, S. Y.; Teng, C. P.; Ye, E., “Metal nanostructures for non-enzymatic glucose sensing.” Mater. Sci. Eng. C 2016, ASAP. 7. Wadell, C.; Syrenova, S.; Langhammer, C., “Plasmonic hydrogen sensing with nanostructured metal hydrides.” ACS Nano 2014, 8, 11925. 8. Biswas, A.; Bayer, I. S.; Biris, A. S.; Wang, T.; Dervishi, E.; Faupel, F., “Advances in top–down and bottom–up surface nanofabrication: Techniques, applications & future prospects.” Adv. Colloid Interfac. 2012, 170, 2. 9. Liddle, J. A.; Gallatin, G. M., “Lithography, metrology and nanomanufacturing.” Nanoscale 2011, 3, 2679. 10. Kim, H.; Lee, H.-B.-R.; Maeng, W. J., “Applications of atomic layer deposition to nanofabrication and emerging nanodevices.” Thin Solid Films 2009, 517, 2563. 11. George, S. M., “Atomic layer deposition: An overview.” Chem. Rev. 2010, 110, 111. 12. Kim, H.; Pippel, E.; Gösele, U.; Knez, M., “Titania nanostructures fabricated by atomic layer deposition using spherical protein cages.” Langmuir 2009, 25, 13284. 13. Pham, T. A.; Song, F.; Nguyen, M.-T.; Stohr, M., “Self-assembly of pyrene derivatives on au(111): Substituent effects on intermolecular interactions.” Chem. Commun. 2014, 50, 14089. 14. Palmer, L. C.; Stupp, S. I., “Molecular self-assembly into one-dimensional nanostructures.” Acc. Chem. Res. 2008, 41, 1674. 15. DiBenedetto, S. A.; Facchetti, A.; Ratner, M. A.; Marks, T. J., “Molecular self-assembled monolayers and multilayers for organic and unconventional inorganic thin-film transistor applications.” Adv. Mater. 2009, 21, 1407. 16. Mailly, D., “Nanofabrication techniques.” Eur. Phys. J. 2009, 172, 333. 17. Yaman, M.; Khudiyev, T.; Ozgur, E.; Kanik, M.; Aktas, O.; Ozgur, E. O.; Deniz, H.; Korkut, E.; Bayindir, M., “Arrays of indefinitely long uniform nanowires and nanotubes.” Nat. Mater. 2011, 10, 494. 18. French, R. H.; Tran, H. V., “Immersion lithography: Photomask and wafer-level materials.” Ann. Rev. Mater. Res. 2009, 39, 93. 19. C. W. Gwyn, R. S., D. Sweeney, and D. Attwood, “Extreme ultraviolet lithography.” J. Vac. Sci. Technol. B 1998, 16, 3142. 20. Grigorescu, A. E.; Hagen, C. W., “Resists for sub-20-nm electron beam lithography with a focus on hsq: State of the art.” Nanotechnology 2009, 20, 292001. 21. Chou, S. Y.; Krauss, P. R.; Renstrom, P. J., “Imprint lithography with 25-nanometer resolution.” Science 1996, 272, 85. 22. Ginger, D. S.; Zhang, H.; Mirkin, C. A., “The evolution of dip-pen nanolithography.” Angew. Chem. Int. Ed. 2004, 43, 30. 23. Schmid, G. M.; Miller, M.; Brooks, C.; Khusnatdinov, N.; LaBrake, D.; Resnick, D. J.; Sreenivasan, S. V.; Gauzner, G.; Lee, K.; Kuo, D.; Weller, D.; Yang, X., “Step and flash imprint lithography for manufacturing patterned media.” J. Vac. Sci. Technol. B 2009, 27, 573. 24. Liang, X.; Morton, K. J.; Austin, R. H.; Chou, S. Y., “Single sub-20 nm wide, centimeter-long nanofluidic channel fabricated by novel nanoimprint mold fabrication and direct imprinting.” Nano Lett. 2007, 7, 3774. 25. Guo; Teng; Yang, H., “Overpressure contact printing.” Nano Lett. 2004, 4, 1657. 26. McLellan, J. M.; Geissler, M.; Xia, Y., “Edge spreading lithography and its application to the fabrication of mesoscopic gold and silver rings.” J. Am. Chem. Soc. 2004, 126, 10830. 27. Xu, H.; Goedel, W. A., “Mesoscopic rings by controlled wetting of particle imprinted templates.” Angew. Chem. Int. Ed. 2003, 42, 4696. 28. Zhu, F. Q.; Fan, D.; Zhu, X.; Zhu, J. G.; Cammarata, R. C.; Chien, C. L., “Ultrahigh-density arrays of ferromagnetic nanorings on macroscopic areas.” Adv. Mater. 2004, 16, 2155. 29. Hulteen, J. C.; Treichel, D. A.; Smith, M. T.; Duval, M. L.; Jensen, T. R.; Van Duyne, R. P., “Nanosphere lithography: Size-tunable silver nanoparticle and surface cluster arrays.” J. Phys. Chem. B 1999, 103, 3854. 30. Kosiorek, A.; Kandulski, W.; Glaczynska, H.; Giersig, M., “Fabrication of nanoscale rings, dots, and rods by combining shadow nanosphere lithography and annealed polystyrene nanosphere masks.” Small 2005, 1, 439. 31. Dudem, B.; Ko, Y. H.; Leem, J. W.; Lee, S. H.; Yu, J. S., “Highly transparent and flexible triboelectric nanogenerators with subwavelength-architectured polydimethylsiloxane by a nanoporous anodic aluminum oxide template.” ACS Appl. Mater. Interfaces 2015, 7, 20520. 32. Liao, W. S.; Yang, T.; Castellana, E. T.; Kataoka, S.; Cremer, P. S., “A rapid prototyping approach to ag nanoparticle fabrication in the 10–100 nm range.” Adv. Mater. 2006, 18, 2240. 33. Mínguez-Bacho, I.; Rodríguez-López, S.; Climent-Font, A.; Fichou, D.; Vázquez, M.; Hernández-Vélez, M., “Variation of the refractive index by means of sulfate anion incorporation into nanoporous anodic aluminum oxide films.” Microporous Mesoporous Mater. 2016, 225, 192. 34. Wang, Z. K.; Lim, H. S.; Liu, H. Y.; Ng, S. C.; Kuok, M. H.; Tay, L. L.; Lockwood, D. J.; Cottam, M. G.; Hobbs, K. L.; Larson, P. R.; Keay, J. C.; Lian, G. D.; Johnson, M. B., “Spin waves in nickel nanorings of large aspect ratio.” Phys. Rev. Lett. 2005, 94, 137208. 35. Martin, C. R., “Nanomaterials: A membrane-based synthetic approach.” Science 1994, 266, 1961. 36. Pearson, D. H.; Tonucci, R. J.; Bussmann, K. M.; Bolden, E. A., “Parallel patterning of mesoscopic ring arrays using nanochannel glass replica masks.” Adv. Mater. 1999, 11, 769. 37. Ji, R.; Lee, W.; Scholz, R.; Gösele, U.; Nielsch, K., “Templated fabrication of nanowire and nanoring arrays based on interference lithography and electrochemical deposition.” Adv. Mater. 2006, 18, 2593. 38. Hulteen, J. C.; Van Duyne, R. P., “Nanosphere lithography: A materials general fabrication process for periodic particle array surfaces.” J. Vac. Sci. Technol. A 1995, 13, 1553. 39. Tseng, C. M.; Lu, Y. Y.; El-Aasser, M. S.; Vanderhoff, J. W., “Uniform polymer particles by dispersion polymerization in alcohol.” J. Polym. Sci. A Polym. Chem. 1986, 24, 2995. 40. Klein, S. M.; Manoharan, V. N.; Pine, D. J.; Lange, F. F., “Preparation of monodisperse pmma microspheres in nonpolar solvents by dispersion polymerization with a macromonomeric stabilizer.” Colloid Polym. Sci. 2003, 282, 7. 41. Yang, S.-M.; Jang, S. G.; Choi, D.-G.; Kim, S.; Yu, H. K., “Nanomachining by colloidal lithography.” Small 2006, 2, 458. 42. Fredriksson, H.; Alaverdyan, Y.; Dmitriev, A.; Langhammer, C.; Sutherland, D. S.; Zäch, M.; Kasemo, B., “Hole–mask colloidal lithography.” Adv. Mater. 2007, 19, 4297. 43. Boström, M.; Williams, D. R. M.; Ninham, B. W., “Specific ion effects: Why dlvo theory fails for biology and colloid systems.” Phys. Rev. Lett. 2001, 87, 168103. 44. Russel, W. B., D. A. Saville,; Schowalter., W. R., Colloidal dispersions. Cambridge University Press: 1989. 45. Dimitrov, A. S.; Nagayama, K., “Continuous convective assembling of fine particles into two-dimensional arrays on solid surfaces.” Langmuir 1996, 12, 1303. 46. Horozov, T. S.; Aveyard, R.; Clint, J. H.; Binks, B. P., “Order−disorder transition in monolayers of modified monodisperse silica particles at the octane−water interface.” Langmuir 2003, 19, 2822. 47. Aveyard, R.; Clint, J. H.; Nees, D.; Paunov, V. N., “Compression and structure of monolayers of charged latex particles at air/water and octane/water interfaces.” Langmuir 2000, 16, 1969. 48. Wickman, H. H.; Korley, J. N., “Colloid crystal self-organization and dynamics at the air/water interface.” Nature 1998, 393, 445. 49. Hayward, R. C.; Saville, D. A.; Aksay, I. A., “Electrophoretic assembly of colloidal crystals with optically tunable micropatterns.” Nature 2000, 404, 56. 50. Solomentsev, Y.; Böhmer, M.; Anderson, J. L., “Particle clustering and pattern formation during electrophoretic deposition: A hydrodynamic model.” Langmuir 1997, 13, 6058. 51. Aizenberg, J.; Braun, P. V.; Wiltzius, P., “Patterned colloidal deposition controlled by electrostatic and capillary forces.” Phys. Rev. Lett. 2000, 84, 2997. 52. Fan, F.; Stebe, K. J., “Assembly of colloidal particles by evaporation on surfaces with patterned hydrophobicity.” Langmuir 2004, 20, 3062. 53. Ozin, G. A.; Yang, S. M., “The race for the photonic chip: Colloidal crystal assembly in silicon wafers.” Adv. Funct. Mater. 2001, 11, 95. 54. Xia, Y.; Yin, Y.; Lu, Y.; McLellan, J., “Template-assisted self-assembly of spherical colloids into complex and controllable structures.” Adv. Funct. Mater. 2003, 13, 907. 55. Wang, D.; Möhwald, H., “Rapid fabrication of binary colloidal crystals by stepwise spin-coating.” Adv. Mater. 2004, 16, 244. 56. Choi, D. G.; Jang, S. G.; Kim, S.; Lee, E.; Han, C. S.; Yang, S. M., “Multifaceted and nanobored particle arrays sculpted using colloidal lithography.” Adv. Funct. Mater. 2006, 16, 33. 57. Deegan, R. D.; Bakajin, O.; Dupont, T. F.; Huber, G.; Nagel, S. R.; Witten, T. A., “Capillary flow as the cause of ring stains from dried liquid drops.” Nature 1997, 389, 827. 58. Hu, H.; Larson, R. G., “Marangoni effect reverses coffee-ring depositions.” J. Phys. Chem. B 2006, 110, 7090. 59. Li, Y.; Lv, C.; Li, Z.; Quere, D.; Zheng, Q., “From coffee rings to coffee eyes.” Soft Matter 2015, 11, 4669. 60. Eral, H. B.; Augustine, D. M.; Duits, M. H. G.; Mugele, F., “Suppressing the coffee stain effect: How to control colloidal self-assembly in evaporating drops using electrowetting.” Soft Matter 2011, 7, 4954. 61. Deegan, R. D., “Pattern formation in drying drops.” Phys. Rev. E 2000, 61, 475. 62. Weon, B. M.; Je, J. H., “Self-pinning by colloids confined at a contact line.” Phys. Rev. Lett. 2013, 110, 028303. 63. Bonn, D.; Eggers, J.; Indekeu, J.; Meunier, J.; Rolley, E., “Wetting and spreading.” Rev. Mod. Phys. 2009, 81, 739. 64. de Gennes, P. G., “Wetting: Statics and dynamics.” Rev. Mod. Phys. 1985, 57, 827. 65. Liao, W.-S.; Chen, X.; Chen, J.; Cremer, P. S., “Templating water stains for nanolithography.” Nano Lett. 2007, 7, 2452. 66. Rosen, M. J.; Kunjappu, J. T., Surfactants and interfacial phenomena. 4th ed.; Wiley: 2012. 67. Forney, C. F.; Brandl, D. G., “Control of humidity in small controlled- environment chambers using glycerol-water solutions.” HortTechnology 1992, 2, 52. 68. Yunker, P. J.; Still, T.; Lohr, M. A.; Yodh, A. G., “Suppression of the coffee-ring effect by shape-dependent capillary interactions.” Nature 2011, 476, 308. 69. Deegan, R. D., “Pattern formation in drying drops.” Phys. Rev. E 2000, 61. 70. Deegan, R. D.; Bakajin, O.; Dupont, T. F.; Huber, G.; Nagel, S. R.; Witten, T. A., “Contact line deposits in an evaporating drop.” Phys. Rev. E 2000, 62, 756. | |
dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/19012 | - |
dc.description.abstract | 本篇論文主要有系統地探究水痕奈米微影技術。使用液體中溶劑自然揮發的特性,結合自主裝排列的現象與乾燥過程中咖啡圈效應、來達到高度有序性之週期的結構。這樣的非典型的奈米圖樣製程技術具有簡單、好控制且便宜等特性,可以大量且快速的製造,不需要耗費過多的製程與資源。
我們將水痕奈米微影技術由丙酮拓展至界面活性劑的系統以提升此技術之實用性,利用常見的物質即可達到表面的奈米製程,並有系統的討論這項技術會影響的關鍵因素。控制界面活性劑的濃度與環境相對濕度可以製造出不同的表面奈米結構,例如奈米環、奈米標靶、奈米洞。利用改變不同模板大小的奈米球,可創造出更多不同間距的奈米圖樣。 在特定的條件控制之下,可一步驟形成了雙圈的表面結構。利用實驗現象說明內圈與外圈各別的生成機構,並證明出外圈的生成與水痕的關係。使用而外添加分子的方式,在同樣的濕度環境之下來改變乾燥速率,控制出不同間距的雙圈結果。並且利用多重步驟來製作出雙圈、三圈等奈米結構。 這項技術可以輕易製作出奈米尺度的有序週期結構。期望此結構可被轉換至金屬表面,並以表面電漿共振的現象或是運用奈米結構特有的光學、電學的特性,將其拓展到更多不同的領域。 | zh_TW |
dc.description.abstract | In this research, colloidal lithography was used to rapidly prototype hexagonal packed nanostructure arrays on polymer films. We systematically discussed the fabrication of nanostructures by combining water stains with colloidal lithography. Various features including rings, targets and holes were fabricated by controlling surfactant concentration, nonvolatile additive, colloidal particle size, and relative humidity. With increasing detergent concentration, the resulting feature changes from ring, target to hole. Structure diameters also increased as templating nanoparticle sizes were increased. The results demonstrate that this strategy is potent in fabricating uniform nanostructures rapidly with unique optical properties. | en |
dc.description.provenance | Made available in DSpace on 2021-06-08T01:42:20Z (GMT). No. of bitstreams: 1 ntu-105-R03223171-1.pdf: 74619535 bytes, checksum: 314b12a39d23ad784b7cc3da1f2e2cb5 (MD5) Previous issue date: 2016 | en |
dc.description.tableofcontents | 誌謝 i
中文摘要 ii Abstract iii 目錄 iv 圖目錄 vi 表目錄 viii 第一章、 緒論 1 1.1. 前言 1 1.2. 膠體微影技術 6 1.3. 水痕奈米微影技術 9 第二章、 利用水痕奈米微影技術製造奈米結構 14 2.1. 簡介 14 2.2. 儀器裝置 15 2.3. 實驗試藥 16 2.4. 實驗步驟 17 2.4.1. 改變自主裝模板溶液中奈米球濃度對於自主裝排列之探討 17 2.4.1.1. 高分子聚合物層製備 17 2.4.1.2. 清洗聚苯乙烯奈米球的懸浮液 17 2.4.1.3. 配置不同濃度之奈米球混合溶液 17 2.4.1.4. 相對濕度控制溶液配置 18 2.4.1.5. 將自主裝模板溶液放置於高分子表面之上 18 2.4.2. 界面活性劑濃度、環境溼度對於表面奈米結構之探討 19 2.4.2.1. 配置自主裝模板溶液 19 2.4.2.2. 移除自主裝模板 20 2.4.3. 改變自主裝模板奈米球大小對於表面奈米結構之探討 20 2.4.4. 奈米雙環結構形成實驗 21 2.4.4.1. 奈米雙環結構中內圈大小實驗 21 2.4.4.2. 奈米雙環結構中外圈大小實驗 22 2.4.5. 不同界面活性劑對於表面結構形成之結果討論 22 2.4.6. 添加丙三醇對於表面奈米結構之探討 22 2.4.7. 多次重複步驟製做同心圓之奈米結構 23 第三章、 實驗結果分析 25 3.1. 改變自主裝模板溶液中奈米球濃度對於自主裝排列之結果討論 25 3.2. 界面活性劑濃度、環境相對溼度對於表面奈米結構之結果討論 27 3.3. 改變不同大小之模板對於表面奈米結構之結果討論 32 3.4. 奈米雙環結構形成原因討論 33 3.4.1. 奈米雙環結構中內圈大小實驗結果 33 3.4.2. 奈米雙環結構中外圈大小實驗結果 34 3.5. 不同界面活性劑對於表面結構形成之結果討論 37 3.6. 添加丙三醇對於雙環結構之影響 38 3.7. 製作高度有序性之奈米結構製程 42 3.8. 多次重複步驟製做同心圓之奈米結構 43 第四章、 結論 45 第五章、 參考文獻 46 | |
dc.language.iso | zh-TW | |
dc.title | 控制水痕乾燥製作有序性之奈米結構 | zh_TW |
dc.title | Fabricating Nanostructure Arrays with Well‑Controlled Water Stains | en |
dc.type | Thesis | |
dc.date.schoolyear | 104-2 | |
dc.description.degree | 碩士 | |
dc.contributor.oralexamcommittee | 李介仁(Jie-Ren Li),陳浩銘(Hao-Ming Chen),羅世強(Shyh-Chyang Luo) | |
dc.subject.keyword | 奈米結構,有序性結構,界面活性劑,奈米製程,膠體, | zh_TW |
dc.subject.keyword | nanostructure,nanohole array,surfactant,nanofabrication,colloidal, | en |
dc.relation.page | 51 | |
dc.identifier.doi | 10.6342/NTU201602025 | |
dc.rights.note | 未授權 | |
dc.date.accepted | 2016-08-18 | |
dc.contributor.author-college | 理學院 | zh_TW |
dc.contributor.author-dept | 化學研究所 | zh_TW |
顯示於系所單位: | 化學系 |
文件中的檔案:
檔案 | 大小 | 格式 | |
---|---|---|---|
ntu-105-1.pdf 目前未授權公開取用 | 72.87 MB | Adobe PDF |
系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。