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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 管傑雄(Chieh-Hsiung Kuan) | |
| dc.contributor.author | Yan-Chun Liu | en |
| dc.contributor.author | 劉彥醇 | zh_TW |
| dc.date.accessioned | 2021-06-08T01:42:02Z | - |
| dc.date.copyright | 2016-08-26 | |
| dc.date.issued | 2016 | |
| dc.date.submitted | 2016-08-17 | |
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Frat Es, Mustafa Kulakc, and Rasit Turan” An Alternative Metal-Assisted Etching Route for Texturing Silicon Wafers for Solar Cell Applications”, IEEE JOURNAL OF PHOTOVOLTAICS, VOL. 6, NO. 2, MARCH 2016 [26] 田明波與劉德令編譯，薄膜科學與技術手冊(p.1)，機械工業出版社，1991。 [27] Carlsson, Jan-Otto., Processes in interfacial zones during chemical vapour deposition: Aspects of kinetics, mechanisms, adhesion and substrate atom transport, Thin solid films, 130.3, 261-282, 1985. [28] Spear, Karl E., and John P. Dismukes., Synthetic diamond: emerging CVD science and technology. Vol. 25. John Wiley & Sons, 1994. [29] Chen, Changle, and Qianwang Chen., Recent development in diamond synthesis, International Journal of Modern Physics B, 22(4), pp. 309-326, 2008. [30] C. E. Morosanu, Thin Films by Chemical Vapor Deposition, chapter 5, 1990. [31] Sirtl, E., L. P. Hunt, and D. H. Sawyer, High Temperature Reactions in the Silicon‐Hydrogen‐Chlorine System, Journal of the Electrochemical Society,121.7 ,1: 919-925,1974. | |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/19001 | - |
| dc.description.abstract | 本論文為提出一種簡單且適用於量產型單晶矽太陽能電池製程方法，以製造具有表面階層式抗反射層結構之量產型單晶矽太陽能電池。故本實驗在一般商業化太陽能電池製程之中再加入金屬輔助化學蝕刻，蝕刻出具有不同半徑大小、密度以及深度之奈米孔洞，組合成一奈米/微米尺度之階層式紋理結構，增強光捕捉，使全波段反射率降低。於此探討於相同微米級金字塔紋理中，不同半徑大小、密度以及深度之奈米孔洞的表面形貌對光波長400nm到1100nm頻段之反射率、外部量子效率以及轉換效率。
本論文中奈米孔洞的製作，乃是在商業化太陽電池製程之中加入硝酸銀/氫氟酸混合溶液之一步驟金屬輔助化學蝕刻方法，在微米級表面金字塔結構上再蝕刻奈米級孔洞，探討其奈米孔洞與反射率及外部量子效率之關係及轉換效率。 於本實驗中可知使用低成本的一步驟金屬輔助蝕刻方法，製作表面階層式抗反射層結構之單晶矽太陽能電池，有效的降低反射率並提升外部量子效率，以提升太陽能電池之轉換效率。 | zh_TW |
| dc.description.abstract | This thesis is using a simple and suitable for mass production type single crystalline silicon solar cell manufacturing process method to produce the surface hierarchical antireflection.
Therefore ,this thesis propose that using metal-assisted chemical etching to etch different size ,density and depth nanopores on micro-scale pyramid texture to form hierarchical antireflection structure. This nano / micro-scale structure enable incident light absorption effectively and low reflectance in 400 nm to 1000 nm. So base on this concept ,we discuss the different nanopores size,depth and density how to impact the reflectance ,conversion efficiency and external quantum efficiency in 400 nm to 1000 nm , and its morphology. We use AgNO3 and HF,called one step metal-assisted chemical etching, to etch the smaller nanopores on micro-scale pyramid texture. We discuss the relationship between nanopores size and conversion efficiency and external quantum efficiency. Seen in this experiment using a low-cost metal assisted one step etching method, the production of single-crystal silicon solar cell surface hierarchical structure of the anti-reflection layer, effectively reduce the reflectivity and improve the external quantum efficiency, to improve the conversion efficiency of solar cells. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-08T01:42:02Z (GMT). No. of bitstreams: 1 ntu-105-R03943074-1.pdf: 3254498 bytes, checksum: 9955fd9d715c72bfa56b0f69a86225fb (MD5) Previous issue date: 2016 | en |
| dc.description.tableofcontents | 口試委員審定書 I
誌謝 II 中文摘要 III Abstract IV 目錄 VI 圖目錄 VIII 表目錄 XII 第一章 簡介 1 1-1 研究動機 1 1-2 章節概要 3 1-3 文獻回顧 4 第二章 矽太陽能電池特性與討論 4 2-1太陽能電池工作原理 4 2-2 太陽能電池特性與電壓電流量測 6 2-3 矽材料特性與吸收係數 9 2-4 外部量子效率(External quantum efficiency) 10 2-5 光學損耗(Optical loss) 11 2-6 金屬輔助化學蝕刻 12 2-6-1 兩步驟金屬輔助化學蝕刻 13 2-6-2 一步驟金屬輔助化學蝕刻 16 第三章 表面階層式太陽能電池製程與量測系統 19 3-1 表面階層式太陽能電池製程機台 20 3-1-1 POCl3 爐管 20 3-1-2 電漿輔助化學氣相沈積(Plasma-Enhanced Chemical Vapor 21 Deposition,PECVD) 21 3-1-3 網版印刷機 25 3-1-4 燒結爐 26 3-2 表面階層式太陽能電池製程參數與製程步驟 26 3-3 量測系統 30 3-3-1 掃描式電子顯微鏡(Scanning Electron Microscopy) 30 3-3-2 電壓電流量量測 32 3-3-3 UV Visible(Shimadzu Europe-UV-1650PC) 32 3-3-4 外部量子效率 33 第四章 實驗數據與結果討論 35 4-1 金屬輔助化學蝕刻參數與表面形貌關係 35 4-1-1 100面一步驟金屬輔助化學蝕刻 35 4-1-2 111面一步驟金屬輔助化學蝕刻 36 4-1-3 單晶金字塔結構之一步驟金屬輔助化學蝕刻 36 4-2表面形貌對效率之影響 39 4-2-1 硝酸銀濃度對表面階層式單晶太陽能電池之影響 39 4-2-2 蝕刻時間對於表面階層式單晶太陽能電池之影響 44 4-3 電流電壓特性討論 50 第五章 結論與未來展望 52 參考文獻 54 | |
| dc.language.iso | zh-TW | |
| dc.subject | 單晶矽太陽能電池 | zh_TW |
| dc.subject | 金屬輔助化學蝕刻 | zh_TW |
| dc.subject | 光捕捉 | zh_TW |
| dc.subject | 階層式抗反射結構 | zh_TW |
| dc.subject | 量產型 | zh_TW |
| dc.subject | Metal-assisted Chemical etching | en |
| dc.subject | Crystalline Si Solar Cells | en |
| dc.subject | Industrial-scale | en |
| dc.subject | Hierarchical Antireflection Structure | en |
| dc.subject | Light Trapping | en |
| dc.title | 具有表面階層式抗反射層結構之量產型單晶矽太陽能電池 | zh_TW |
| dc.title | Industrial-scale Mono-crystalline Si Solar Cells with Surface Hierarchical Antireflection Structure | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 104-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 孫允武,孫建文,陳啟東,徐大正 | |
| dc.subject.keyword | 量產型,單晶矽太陽能電池,階層式抗反射結構,光捕捉,金屬輔助化學蝕刻, | zh_TW |
| dc.subject.keyword | Industrial-scale,Crystalline Si Solar Cells,Hierarchical Antireflection Structure,Light Trapping,Metal-assisted Chemical etching, | en |
| dc.relation.page | 58 | |
| dc.identifier.doi | 10.6342/NTU201603131 | |
| dc.rights.note | 未授權 | |
| dc.date.accepted | 2016-08-19 | |
| dc.contributor.author-college | 電機資訊學院 | zh_TW |
| dc.contributor.author-dept | 電子工程學研究所 | zh_TW |
| 顯示於系所單位： | 電子工程學研究所 | |
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