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http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/15799完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 陳永芳 (Yang-Fang Chen) | |
| dc.contributor.author | Min-Ju Kuo | en |
| dc.contributor.author | 郭旻儒 | zh_TW |
| dc.date.accessioned | 2021-06-07T17:52:23Z | - |
| dc.date.copyright | 2020-08-25 | |
| dc.date.issued | 2020 | |
| dc.date.submitted | 2020-08-03 | |
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| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/15799 | - |
| dc.description.abstract | 近來，常規抗生素治療對許多抗藥性細菌的出現無效的現象越來越多，導致了新型有效殺菌技術的發展。具有高同調性，高方向性，單色和高強度等特點的紫外雷射是理想的殺菌光源。然而，雷射受到其固有的不利因素限制，例如高方向性，需要精細的製造以及雷射光斑。在這裡，深紫外光隨機雷射（DUV-RL）是通過將AlGaN多層量子阱（MQW）和 鋁納米粒子用作增益介質和等離子體散射中心來實現的。我們為首次隨機雷射殺菌提供了驗證，並且通過在微生物革蘭氏陰性細菌（大腸桿菌）上照射此光源來檢查深紫外光隨機雷射處理的結果。為了進一步利用DUV-RL處理的功能，本研究證明了該處理的一般性以及使用不同角度照射下的隨機雷射殺菌效率。最重要的是，期望在消毒場所應用隨機雷射系統能成功滿足當前雷射治療的空白，並為滅菌提供另一種選擇。
| zh_TW |
| dc.description.abstract | Recently, the ineffectiveness of conventional antibiotic treatments against the emergence of multidrug-resistant bacteria induces the development of novel effective disinfection technologies. Ultraviolet lasers, with several features, including high coherence, high directionality, monochromatic, and high intensity were the ideal candidate light source for disinfection; however, lasers are restricted by its inherent detriments such as high directionality, meticulous manufacturing, and the laser speckles. Here, the deep-ultraviolet random laser (DUV-RL) is realized by applying AlGaN Multiple Quantum wells (MQWs) and aluminum nanoparticles as the gain medium and plasmonic scattering centers. We provide proof of concept for the first random laser disinfection, and the results of this DUV-RL treatment are examined by implement this light source on model microbial strain-gram negative bacteria (Escherichia coli). To further exploit the functionality of the DUV-RL treatment, the generality of the treatment, and the disinfection efficiency of random laser treatment with different angle illumination are demonstrated in this study. Above all, it is expected that the success of applying random laser systems on disinfection arena can fulfill the empty piece of current laser treatment and offers another choice to inactivate the bacteria. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-07T17:52:23Z (GMT). No. of bitstreams: 1 U0001-0208202021433200.pdf: 2819914 bytes, checksum: 6b7671d45be2947d9d31ef94f3541fc1 (MD5) Previous issue date: 2020 | en |
| dc.description.tableofcontents | CONTENTS 口試委員審定書 I 誌謝 II 中文摘要 III ABSTRACT IV CONTENTS V LIST OF FIGURES VII Chapter 1 Introduction 1 Reference 4 Chapter 2 Theoretical background 9 2.1 Escherichia coli 9 2.1.1 The Growth Curve of E. coli 9 2.1.2 Pathogenic characteristics of E.coli 11 2.2 Photoluminescence(PL) 13 2.3 Random laser mechanism 14 2.3.1 Non-coherent and coherent random laser 14 2.3.2 Spectral emission properties 17 2.4 Random Laser application 19 2.5 Surface Plasmon Resonance 20 Reference 22 Chapter 3 Experimental Details 25 3.1 Deep-ultraviolet Random Laser construction 25 3.2 Scanning Electron Microscopy (SEM) 27 3.3 Random Laser Measurement 30 3.4 The stages of E.coli cultivation 32 3.5 Deep-ultraviolet Random Laser Disinfection 33 Chapter 4 Results and Discussions 35 4.1 Deep-ultraviolet Random Laser Characteristics 35 4.2 Disinfection ratio of the DUV-RL treatment 38 4.3 Angle-Free Disinfection of DUV-RL 39 Chapter 5 Conclusion 41 LIST OF FIGURES Figure 2.1 Schematic diagram of the growth curve of Escherichia coli. 10 Figure 2.2 Schematic diagram of the electron transition that generates photon emission. 13 Figure 2.3 Working principle of lasing in traditional cavity and random media (a) conventional laser cavity; (b) random laser cavity illustrating the incoherent feedback (red arrows) and coherent feedback (green arrows); (c) illustration of spectral outputs of a conventional laser and a random laser; where the spikes free correspond to incoherent feedback, whereas the coherent feedback is recognized by its spiky signature. [11] 16 Figure 2.4 Intensity versus pumping energy. 17 Figure 2.5 Spectra of random laser detected in different angles. 18 Figure 2.6 Intensity and FWHM of random laser detected in different angles. 18 Figure 2.7 Schematic diagram of localized surface plasmon resonance of metal spheres. [25] 21 Figure 2.8 Field lines of wave-tinging vector near small sphere with/without localized plasmon resonance. [25] 21 Figure 3.1 Structure and preparation of deep-ultraviolet random laser. (a) Schematic of the deep-ultraviolet cavity-free laser. (b) Cross-sectional SEM image of deep-ultraviolet cavity-free laser. (c) SEM image of Al nanoparticles. 26 Figure 3.2 Schematic illustration of tube furnace to anneal. 26 Figure 3.3 Picture of tube furnace. 27 Figure 3.4 Schematic diagram of a scanning electron microscopy (SEM). 29 Figure 3.5 Picture of a scanning electron microscopy (SEM). 29 Figure 3.6 Schematic diagram of random laser instrument setup. 31 Figure 3.7 Picture of instrument for the measurement of random lasing. 31 Figure 3.8 Schematic diagram of E.coli cultivation. 32 Figure 3.9 Schematic diagram of DUV-RL treatment on biofilm. 33 Figure 3.10 Schematic diagram of DUV-RL treatment on biofilm at different angle. 34 Figure 3.11 Schematic diagram of DUV-RL treatment on suspension. 34 Figure 4.1. Schematic of Random Laser Disinfection. 35 Figure 4.2 Lasing spectra of the DUV-RL. (a) Evolutions of emission spectra with increasing excitation intensity for the device. (b) Excitation intensity dependences of the emission intensity showing threshold behaviors for the device. (c) Lasing spectra at pumping energy density 59.6 mJ/cm2. The inset in panel shows close-up images of the lasing peaks. (d) Full width at half-maximum as a function of pumping energy density. 37 Figure 4.3 Effects of the Random Laser disinfection ability. Photographic images of (a) biofilm and (b) suspension showing the culture growth of E. coli bacteria after exposure to (i) 0, (ii) 17.28 mJ/ cm2. Total coliforms with RL treatment on (c) biofilm and (d) suspension counterpart. 38 Figure 4.4 The DUV-RL treatment with different angle illumination. (a) The emission spectra and (b) threshold and (c) the full width at half-maximum of the DUV-RL under a broad angle observation. (d)The disinfection rate of the DUV-RL treatment with different angular illumination. 40 | |
| dc.language.iso | en | |
| dc.subject | 殺菌 | zh_TW |
| dc.subject | 紫外光 | zh_TW |
| dc.subject | 隨機雷射 | zh_TW |
| dc.subject | 細菌 | zh_TW |
| dc.subject | 大腸桿菌 | zh_TW |
| dc.subject | Escherichia coli | en |
| dc.subject | ultraviolet light | en |
| dc.subject | random laser | en |
| dc.subject | bacteria | en |
| dc.subject | disinfection | en |
| dc.title | 深紫外光隨機雷射殺菌
| zh_TW |
| dc.title | Deep Ultra-Violet Random Laser Disinfection | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 108-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 謝雅萍(Ya-Ping Hsieh),許芳琪(Fang-Chi Hsu) | |
| dc.subject.keyword | 紫外光,隨機雷射,細菌,大腸桿菌,殺菌, | zh_TW |
| dc.subject.keyword | ultraviolet light,random laser,bacteria,Escherichia coli,disinfection, | en |
| dc.relation.page | 41 | |
| dc.identifier.doi | 10.6342/NTU202002230 | |
| dc.rights.note | 未授權 | |
| dc.date.accepted | 2020-08-04 | |
| dc.contributor.author-college | 理學院 | zh_TW |
| dc.contributor.author-dept | 應用物理研究所 | zh_TW |
| 顯示於系所單位： | 應用物理研究所 | |
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